公开(公告)号：US20240011151A1

公开(公告)日：2024-01-11

申请号：US18217685

申请日：2023-07-03

Applicant: ASM IP Holding B.V.

Inventor： Yoshio Susa ,  Hirotsugu Sugiura ,  Yoshiyuki Kikuchi

IPC: C23C16/26 ,  C23C16/04 ,  H01L21/311

CPC classification number: C23C16/26 ,  C23C16/045 ,  H01L21/31116

Abstract: A method for forming a carbon film on inner wall surfaces of a plurality of trenches which are formed on a substrate to be processed includes a depositing step of depositing the carbon film on the inner wall surfaces of the trenches of the substrate to be processed by supplying a mixed gas containing a carbon precursor gas and a carrier gas and applying a high frequency voltage to the mixed gas to generate plasma, an interval step of stopping the supply of the carbon precursor gas and the application of the high frequency voltage while continuing the supply of the carrier gas, and an etching step of etching a part of the carbon film by continuing to supply the carrier gas and applying a high frequency voltage to the carrier gas to generate plasma, wherein the above steps are repeated in the above order.

公开(公告)号：US20240150894A1

公开(公告)日：2024-05-09

申请号：US18413533

申请日：2024-01-16

Applicant: ASM IP Holding B.V.

Inventor： Toshiharu Watarai ,  Hiroki Arai ,  Toshio Nakanishi ,  Yoshiyuki Kikuchi ,  Ryo Miyama

IPC: C23C16/44 ,  C23C16/455 ,  C23C16/50 ,  H01J37/32

CPC classification number: C23C16/4405 ,  C23C16/4412 ,  C23C16/45591 ,  C23C16/50 ,  H01J37/32834 ,  H01J37/32853 ,  H01J37/32862 ,  H01J37/3288

Abstract: Examples of a cleaning method includes supplying a cleaning gas into an exhaust duct that provides an exhaust flow passage of a gas supplied to an area above a susceptor, the exhaust duct having a shape surrounding the susceptor in plan view, and activating the cleaning gas to clean an inside of the exhaust duct.

公开(公告)号：US20220336204A1

公开(公告)日：2022-10-20

申请号：US17720214

申请日：2022-04-13

Applicant: ASM IP Holding B.V.

Inventor： Ryo Miyama ,  Yoshio Susa ,  Yoshiyuki Kikuchi ,  Hirotsugu Sugiura

IPC: H01L21/02 ,  H01J37/32 ,  C23C16/455 ,  C23C16/26 ,  C23C16/52

Abstract: Methods and systems for forming a structure including multiple carbon layers and structures formed using the methods or systems are disclosed. Exemplary methods include forming a first carbon layer with an initial first flowability and a second carbon layer with an initial second flowability, wherein first flowability is less than second flowability.

公开(公告)号：US20210366712A1

公开(公告)日：2021-11-25

申请号：US17323321

申请日：2021-05-18

Applicant: ASM IP Holding B.V.

Inventor： Yoshio Susa ,  Ryo Miyama ,  Yoshiyuki Kikuchi

IPC: H01L21/033 ,  H01J37/32 ,  C23C16/26 ,  C23C16/56

Abstract: Methods and systems for forming a structure including multiple carbon layers and structures formed using the method or system are disclosed. Exemplary methods include forming a first carbon layer and a second carbon layer, wherein a density and/or other property of the first carbon layer differs from the corresponding property of the second carbon layer.

公开(公告)号：US20210257213A1

公开(公告)日：2021-08-19

申请号：US17172738

申请日：2021-02-10

Applicant: ASM IP Holding B.V.

Inventor： Yoshiyuki Kikuchi ,  Norihiko Ishinohachi

IPC: H01L21/02 ,  B05D1/00

Abstract: Methods and systems for forming a structure including a dielectric material layer on a surface of a substrate and structures and devices formed using the method or system are disclosed. Exemplary methods include providing a substrate within a reaction chamber of a reactor system, providing one or more precursors to the reaction chamber, and providing pulsed plasma power to polymerize the one or more precursors within the reaction chamber.

公开(公告)号：US20210071296A1

公开(公告)日：2021-03-11

申请号：US17010561

申请日：2020-09-02

Applicant: ASM IP Holding B.V.

Inventor： Toshiharu Watarai ,  Hiroki Arai ,  Toshio Nakanishi ,  Yoshiyuki Kikuchi ,  Ryo Miyama

IPC: C23C16/44 ,  C23C16/50

Abstract: Examples of a cleaning method includes supplying a cleaning gas into an exhaust duct that provides an exhaust flow passage of a gas supplied to an area above a susceptor, the exhaust duct having a shape surrounding the susceptor in plan view, and activating the cleaning gas to clean an inside of the exhaust duct.

公开(公告)号：US20250037994A1

公开(公告)日：2025-01-30

申请号：US18782382

申请日：2024-07-24

Applicant: ASM IP Holding B.V.

Inventor： Yoshio Susa ,  Hirotsugu Sugiura ,  Yoshiyuki Kikuchi ,  Abhudaya Mishra ,  Alexey Remnev

IPC: H01L21/02 ,  H01J37/32

Abstract: A method of filling trenches on a surface of a substrate is provided. The method may comprise the steps of: positioning a substrate on a substrate support, the substrate support disposed within a reaction chamber, wherein a pressure of the reaction chamber is less than 200 Pa; flowing a carbon precursor into the reaction chamber continuously; flowing an etching gas into the reaction chamber continuously; generating a plasma in the reaction chamber by applying a first radio frequency (RF) power to one of one or more electrodes of the reaction chamber; and depositing an amorphous carbon layer in the trenches on the substrate.

公开(公告)号：US11705333B2

公开(公告)日：2023-07-18

申请号：US17323321

申请日：2021-05-18

Applicant: ASM IP Holding B.V.

Inventor： Yoshio Susa ,  Ryo Miyama ,  Yoshiyuki Kikuchi

IPC: H01L21/033 ,  H01J37/32 ,  C23C16/56 ,  C23C16/26 ,  H01L21/311 ,  H01L21/3105

CPC classification number: H01L21/0337 ,  C23C16/26 ,  C23C16/56 ,  H01J37/32449 ,  H01J37/32834 ,  H01L21/0332 ,  H01J2237/332 ,  H01L21/31053 ,  H01L21/31122

Abstract: Methods and systems for forming a structure including multiple carbon layers and structures formed using the method or system are disclosed. Exemplary methods include forming a first carbon layer and a second carbon layer, wherein a density and/or other property of the first carbon layer differs from the corresponding property of the second carbon layer.

公开(公告)号：US20220251707A1

公开(公告)日：2022-08-11

申请号：US17591070

申请日：2022-02-02

Applicant: ASM IP Holding B.V.

Inventor： Yoshio Susa ,  Hirotsugu Sugiura ,  Yoshiyuki Kikuchi

IPC: C23C16/513 ,  C23C16/32 ,  C23C16/34 ,  C23C16/40 ,  C23C16/26 ,  C23C16/56

Abstract: Methods and systems for forming a structure and structures formed using the methods or systems are disclosed. Exemplary methods include depositing material on a surface of the substrate and treating the deposited material to form treated material. The methods can be used to fill recesses on a surface of a substrate.

公开(公告)号：US20210238742A1

公开(公告)日：2021-08-05

申请号：US17166660

申请日：2021-02-03

Applicant: ASM IP Holding B.V.

Inventor： Yoshio Susa ,  Ryo Miyama ,  Hirotsugu Sugiura ,  Yoshiyuki Kikuchi

IPC: C23C16/455 ,  C23C16/26

Abstract: Methods and systems for forming a structure including carbon material and structures formed using the method or system are disclosed. Exemplary methods include providing an inert gas to the reaction chamber for plasma ignition, providing a carbon precursor to the reaction chamber, forming a plasma within the reaction chamber to form an initially viscous carbon material on a surface of the substrate, wherein the initially viscous carbon material becomes carbon material, and treating the carbon material with activated species to form treated carbon material.