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    METHOD OF MEASURING VARIATION, INSPECTION SYSTEM, COMPUTER PROGRAM, AND COMPUTER SYSTEM
    2.
    发明申请
    METHOD OF MEASURING VARIATION, INSPECTION SYSTEM, COMPUTER PROGRAM, AND COMPUTER SYSTEM 审中-公开

    公开(公告)号：US20190391500A1

    公开(公告)日：2019-12-26

    申请号：US16486169

    申请日：2018-02-07

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Antoine Gaston Marie KIERS ,  Scott Anderson MIDDLEBROOKS ,  Jan-Willem GEMMINK

    IPC: G03F7/20 ,  G01N21/956 ,  G01N21/95 ,  G03F7/00

    Abstract: Methods of measuring variation across multiple instances of a pattern on a substrate or substrates after a step in a device manufacturing process are disclosed. In one arrangement, data representing a set of images is received. Each image represents a different instance of the pattern, wherein the pattern includes a plurality of pattern elements. The set of images are registered relative to each other to superimpose the instances of the pattern. The registration includes applying different weightings to two or more of the plurality of pattern elements, wherein the weightings control the extent to which each pattern element contributes to the registration of the set of images and each weighting is based on an expected variation of the pattern element to which the weighting is applied. Variation in the pattern is measured using the registered set of images.

    Method of Determining Focus Corrections, Lithographic Processing Cell and Device Manufacturing Method
    3.
    发明申请
    Method of Determining Focus Corrections, Lithographic Processing Cell and Device Manufacturing Method 有权
    确定焦点校正的方法，光刻处理单元和器件制造方法

    公开(公告)号：US20150085267A1

    公开(公告)日：2015-03-26

    申请号：US14562133

    申请日：2014-12-05

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Arend Johannes KISTEMAN ,  Wim Tjibbo TEL ,  Thomas THEEUWES ,  Antoine Gaston Marie KIERS

    IPC: G03F7/20

    CPC classification number: G03F7/70641 ,  G03F7/70616 ,  G03F7/70625 ,  G03F9/7026

    Abstract: A method of, and associated apparatus for, determining focus corrections for a lithographic projection apparatus. The method comprises exposing a plurality of global correction fields on a test substrate, each comprising a plurality of global correction marks, and each being exposed with a tilted focus offset across it; measuring a focus dependent characteristic for each of the plurality of global correction marks to determine interfield focus variation information; and calculating interfield focus corrections from the interfield focus variation information.

    Abstract translation: 一种用于确定光刻投影装置的聚焦校正的方法和相关联的装置。 该方法包括在测试基板上暴露多个全局校正场，每个全局校正场均包括多个全局校正标记，并且每个全局校正场在其上以倾斜的焦点偏移曝光; 测量所述多个全局校正标记中的每一个的聚焦依赖特性，以确定场间焦点变化信息; 以及从所述场间焦点变化信息计算场间焦点校正。

    METHOD OF MEASURING VARIATION, INSPECTION SYSTEM, COMPUTER PROGRAM, AND COMPUTER SYSTEM
    4.
    发明申请
    METHOD OF MEASURING VARIATION, INSPECTION SYSTEM, COMPUTER PROGRAM, AND COMPUTER SYSTEM 有权

    公开(公告)号：US20220011680A1

    公开(公告)日：2022-01-13

    申请号：US17484081

    申请日：2021-09-24

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Antoine Gaston Marie KIERS ,  Scott Anderson Middlebrooks ,  Jan-Willem Gemmink

    IPC: G03F7/20 ,  G01N21/95 ,  G01N21/956 ,  G03F7/00

    Abstract: Methods of measuring variation across multiple instances of a pattern on a substrate or substrates after a step in a device manufacturing process are disclosed. In one arrangement, data representing a set of images is received. Each image represents a different instance of the pattern. The set of images are registered relative to each other to superimpose the instances of the pattern. Variation in the pattern is measured using the registered set of images. The pattern comprises a plurality of pattern elements and the registration comprises applying different weightings to two or more of the plurality of pattern elements. The weightings control the extent to which each pattern element contributes to the registration of the set of images. Each weighting is based on an expected variation of the pattern element to which the weighting is applied.

    DEEP LEARNING FOR SEMANTIC SEGMENTATION OF PATTERN
    7.
    发明申请
    DEEP LEARNING FOR SEMANTIC SEGMENTATION OF PATTERN 有权

    公开(公告)号：US20210374936A1

    公开(公告)日：2021-12-02

    申请号：US16968966

    申请日：2019-02-15

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Adrianus Cornelis Matheus KOOPMAN ,  Scott Anderson MIDDLEBROOKS ,  Antoine Gaston Marie KIERS ,  Mark John MASLOW

    IPC: G06T7/00 ,  G06K9/62 ,  G06T7/11 ,  G03F7/20 ,  G06N3/08

    Abstract: A method for training a deep learning model of a patterning process. The method includes obtaining (i) training data including an input image of at least a part of a substrate having a plurality of features and including a truth image, (ii) a set of classes, each class corresponding to a feature of the plurality of features of the substrate within the input image, and (iii) a deep learning model configured to receive the training data and the set of classes, generating a predicted image, by modeling and/or simulation with the deep learning model using the input image, assigning a class of the set of classes to a feature within the predicted image based on matching of the feature with a corresponding feature within the truth image, and generating, by modeling and/or simulation, a trained deep learning model by iteratively assigning weights using a loss function.

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