-
公开(公告)号：US20220415678A1
公开(公告)日：2022-12-29
申请号：US17811047
申请日：2022-07-06
Applicant: ASML Netherlands B.V.
Inventor： Jeroen Gerard GOSEN , Te-Yu CHEN , Dennis Herman, Caspar VAN BANNING , Edwin Cornelis KADIJK , Martijn Petrus, Christianus VAN HEUMEN , Erheng WANG , Johannes Andreas, Henricus, Maria JACOBS
Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved load lock unit is disclosed. An improved load lock system may comprise a plurality of supporting structures configured to support a wafer and a conditioning plate including a heat transfer element configured to adjust a temperature of the wafer. The load lock system may further comprise a gas vent configured to provide a gas between the conditioning plate and the wafer and a controller configured to assist with the control of the heat transfer element.
-
公开(公告)号：US20240274400A1
公开(公告)日：2024-08-15
申请号：US18643379
申请日：2024-04-23
Applicant: ASML Netherlands B.V.
Inventor： Marcus Adrianus VAN DE KERKHOF , Jing ZHANG , Martijn Petrus Christianus VAN HEUMEN , Patriek Adrianus Alphonsus Maria BRUURS , Erheng WANG , Vineet SHARMA , Makfir SEFA , Shao-Wei FU , Simone Maria SCOLARI , Johannes Andreas Henricus Maria JACOBS
CPC classification number: H01J37/20 , F16L11/04 , F16L11/12 , B01D19/0068 , H01J2237/2001 , H01L21/67288
Abstract: Apparatuses, systems, and methods for transferring fluid to a stage in a charged particle beam system are disclosed. In some embodiments, a stage may be configured to secure a wafer; a chamber may be configured to house the stage; and a tube may be provided within the chamber to transfer fluid between the stage and outside of the chamber. The tube may include a first tubular layer of first material, wherein the first material is a flexible polymer; and a second tubular layer of second material, wherein the second material is configured to reduce permeation of fluid or gas through the tube. In some embodiments, a system may include a degasser system outside of the chamber, where the degasser system may be configured to remove gases from the transfer fluid before the transfer fluid enters the tube.
-
公开(公告)号：US20200027763A1
公开(公告)日：2020-01-23
申请号：US16514843
申请日：2019-07-17
Applicant: ASML Netherlands B.V.
Inventor： Jeroen Gerard GOSEN , Te-Yu CHEN , Dennis Herman, Caspar VAN BANNING , Edwin Cornelis KADIJK , Martijn Petrus, Christianus VAN HEUMEN , Erheng WANG , Johannes Andreas, Henricus, Maria JACOBS
Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved load lock unit is disclosed. An improved load lock system may comprise a plurality of supporting structures configured to support a wafer and a conditioning plate including a heat transfer element configured to adjust a temperature of the wafer. The load lock system may further comprise a gas vent configured to provide a gas between the conditioning plate and the wafer and a controller configured to assist with the control of the heat transfer element.
-
Patent Agency Ranking
公开(公告)号：US20240258138A1
公开(公告)日：2024-08-01
申请号：US18423199
申请日：2024-01-25
Applicant: ASML Netherlands B.V.
Inventor： Jeroen Gerard GOSEN , Te-Yu CHEN , Dennis Herman, Caspar VAN BANNING , Edwin Cornelis KADIJK , Martijn Petrus, Christianus VAN HEUMEN , Erheng WANG , Johannes Andreas, Henricus, Maria JACOBS
CPC classification number: H01L21/67201 , G03F7/70841 , G03F7/70858 , H01L21/67098
Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved load lock unit is disclosed. An improved load lock system may comprise a plurality of supporting structures configured to support a wafer and a conditioning plate including a heat transfer element configured to adjust a temperature of the wafer. The load lock system may further comprise a gas vent configured to provide a gas between the conditioning plate and the wafer and a controller configured to assist with the control of the heat transfer element.
-
公开(公告)号：US20210257181A1
公开(公告)日：2021-08-19
申请号：US17179165
申请日：2021-02-18
Applicant: ASML Netherlands B.V.
Inventor： Marcus Adrianus VAN DE KERKHOF , Jing ZHANG , Martijn Petrus Christianus VAN HEUMEN , Patriek Adrianus Alphonsus Maria BRUURS , Erheng WANG , Vineet SHARMA , Makfir SEFA , Shao-Wei FU , Simone Maria SCOLARI , Johannes Andreas Henricus Maria JACOBS
Abstract: Apparatuses, systems, and methods for transferring fluid to a stage in a charged particle beam system are disclosed. In some embodiments, a stage may be configured to secure a wafer; a chamber may be configured to house the stage; and a tube may be provided within the chamber to transfer fluid between the stage and outside of the chamber. The tube may include a first tubular layer of first material, wherein the first material is a flexible polymer; and a second tubular layer of second material, wherein the second material is configured to reduce permeation of fluid or gas through the tube. In some embodiments, a system may include a degasser system outside of the chamber, where the degasser system may be configured to remove gases from the transfer fluid before the transfer fluid enters the tube.
-
6.发明申请公开(公告)号：US20250012855A1
公开(公告)日：2025-01-09
申请号：US18712464
申请日：2022-10-28
Applicant: ASML Netherlands B.V.
Inventor： Dongchi YU , Erheng WANG , Jun-li LIN , Shao-Wei FU , Yi-Chen LIN
IPC: G01R31/28 , G01R31/307
Abstract: Systems and structures for venting and flow conditioning operations in charged particle beam systems. In some embodiments, a system may include a chamber configured to provide a vacuum environment; a vent valve; and a mass flow controller coupled to the chamber on a first side of the mass flow controller and to the vent valve on a second side of the mass flow controller.
-
公开(公告)号：US20240014053A1
公开(公告)日：2024-01-11
申请号：US18021537
申请日：2021-08-16
Applicant: ASML Netherlands B.V.
Inventor： Dongchi YU , Erheng WANG
IPC: H01L21/67 , H01J37/32 , H01L21/677
CPC classification number: H01L21/67201 , H01J37/32449 , H01L21/67742 , H01J37/32981
Abstract: A load-lock system may include a chamber enclosing a supporting structure configured to support a wafer; a gas vent arranged at a ceiling of the chamber and configured to vent gas into the chamber with a flow rate of at least twenty normal liters per minute; and a plate fixed to the ceiling between the gas vent and the wafer.
-
公开(公告)号：US20230332669A1
公开(公告)日：2023-10-19
申请号：US18025636
申请日：2021-09-28
Applicant: ASML NETHERLANDS B.V.
Inventor： Erheng WANG , Adrianus Marinus VERDONCK , Adjan Gerrard Pieter Ivo SCHEERHOORN , Xu WANG , Jianzi SUI , Chin-Fa TU , Martijn Petrus Christianus VAN HEUMEN
IPC: F16F15/04
CPC classification number: F16F15/04 , F16F2230/0005 , F16F2230/0023 , F16F2230/007 , F16F2230/22
Abstract: A vacuum system configured to mitigate damage or risk associated with a pump malfunction (e.g., an imbalance, a catastrophic failure, etc.). An exemplary vacuum pump includes a housing; a vibration isolator coupled to the vacuum pump housing and configured to isolate vibrations generated by the vacuum pump during operation; and a stop structure disposed between the vacuum pump housing and an adjacent fixture. The stop structure configured to prevent displacement of the vacuum pump housing relative to the fixture above a threshold amount, wherein the displacement of the vacuum pump housing is configured to be within the threshold amount during normal operation. The vacuum system may further include a collar configured to limit an axial displacement of the pump.
-
-
-
-
-
-
-
Search Results
8
records
(took 0.015 seconds)
