公开(公告)号：US10197385B2

公开(公告)日：2019-02-05

申请号：US15608361

申请日：2017-05-30

Applicant: Applied Materials, Inc.

Inventor： Somesh Khandelwal ,  Garry K. Kwong ,  Kevin Griffin ,  Joseph Yudovsky

IPC: G01D5/34 ,  C23C16/52 ,  G01B11/14 ,  H01L21/67 ,  H01L21/68 ,  C23C16/455 ,  H01L21/687

Abstract: Apparatus and methods for measuring the proximity between two components using a hardstop, an actuator and an emitter/detector passing light through a passage in the actuator are disclosed. The passage provides attenuation to the light which changes as the gap between the components changes allowing the measurement and control of the gap. Methods of determining the topology of the components using the apparatus are also described.

公开(公告)号：US20170076917A1

公开(公告)日：2017-03-16

申请号：US15260876

申请日：2016-09-09

Applicant: Applied Materials, Inc.

Inventor： Joseph Yudovsky ,  John C. Forster ,  Kallol Bera ,  Somesh Khandelwal ,  Mandyam Sriram ,  Keiichi Tanaka ,  Kenji Takeshita ,  Nobuhiro Sakamoto ,  Takumi Yanagawa

IPC: H01J37/32 ,  C23C16/458 ,  C23C16/455

CPC classification number: H01J37/32623 ,  C23C16/45536 ,  C23C16/45544 ,  C23C16/45551 ,  C23C16/4584 ,  H01J37/32082 ,  H01J37/3244 ,  H01J37/32651 ,  H01J37/32752

Abstract: A plasma source assembly for use with a processing chamber includes a blocker plate with at least one elongate slot through the blocker plate. The elongate slots can be have different lengths and angles relative to sides of the blocker plate.

Abstract translation: 与处理室一起使用的等离子体源组件包括具有通过阻挡板的至少一个细长槽的阻挡板。 细长槽可以相对于阻挡板的侧面具有不同的长度和角度。

公开(公告)号：US10196741B2

公开(公告)日：2019-02-05

申请号：US14471884

申请日：2014-08-28

Applicant: Applied Materials, Inc.

Inventor： Kevin Griffin ,  Abraham Ravid ,  Alex Minkovich ,  Somesh Khandelwal ,  Joseph Yudovsky ,  Todd Egan

IPC: B05C1/08 ,  B05C11/10 ,  C23C16/458 ,  C23C16/455 ,  C23C16/52 ,  G01D5/24

Abstract: Apparatus and methods of dimension control and monitoring between a processes fixture and a susceptor, and position determination of wafers are described.

公开(公告)号：US20170261312A1

公开(公告)日：2017-09-14

申请号：US15608361

申请日：2017-05-30

Applicant: Applied Materials, Inc.

Inventor： Somesh Khandelwal ,  Garry K. Kwong ,  Kevin Griffin ,  Joseph Yudovsky

IPC: G01B11/14 ,  H01L21/687 ,  H01L21/67 ,  H01L21/68 ,  C23C16/455 ,  G01D5/34

CPC classification number: G01B11/14 ,  C23C16/455 ,  C23C16/45551 ,  C23C16/52 ,  G01D5/34 ,  H01L21/67259 ,  H01L21/681 ,  H01L21/68764

Abstract: Apparatus and methods for measuring the proximity between two components using a hardstop, an actuator and an emitter/detector passing light through a passage in the actuator are disclosed. The passage provides attenuation to the light which changes as the gap between the components changes allowing the measurement and control of the gap. Methods of determining the topology of the components using the apparatus are also described.

公开(公告)号：US09663859B2

公开(公告)日：2017-05-30

申请号：US15001672

申请日：2016-01-20

Applicant: Applied Materials, Inc.

Inventor： Somesh Khandelwal ,  Garry K. Kwong ,  Kevin Griffin ,  Joseph Yudovsky

IPC: C23C16/52 ,  C23C16/54 ,  H01L21/67 ,  C23C16/455 ,  G01D5/34 ,  G01B11/14

CPC classification number: G01B11/14 ,  C23C16/455 ,  C23C16/45551 ,  C23C16/52 ,  G01D5/34 ,  H01L21/67259 ,  H01L21/681 ,  H01L21/68764

Abstract: Apparatus and methods for measuring the proximity between two components using a hardstop, an actuator and an emitter/detector passing light through a passage in the actuator are disclosed. The passage provides attenuation to the light which changes as the gap between the components changes allowing the measurement and control of the gap. Methods of determining the topology of the components using the apparatus are also described.

公开(公告)号：US20160215396A1

公开(公告)日：2016-07-28

申请号：US15001672

申请日：2016-01-20

Applicant: Applied Materials, Inc.

Inventor： Somesh Khandelwal ,  Garry K. Kwong ,  Kevin Griffin ,  Joseph Yudovsky

IPC: C23C16/52 ,  G01D5/34 ,  G01B11/14 ,  C23C16/455

CPC classification number: G01B11/14 ,  C23C16/455 ,  C23C16/45551 ,  C23C16/52 ,  G01D5/34 ,  H01L21/67259 ,  H01L21/681 ,  H01L21/68764

Abstract: Apparatus and methods for measuring the proximity between two components using a hardstop, an actuator and an emitter/detector passing light through a passage in the actuator are disclosed. The passage provides attenuation to the light which changes as the gap between the components changes allowing the measurement and control of the gap. Methods of determining the topology of the components using the apparatus are also described.

Abstract translation: 公开了一种用于测量两个部件之间的接近度的装置和方法，所述部件使用硬止动件，致动器和使光穿过致动器中的通道的发射器/检测器。 该通道为光线提供衰减，随着组件之间的间隙变化，从而允许间隙的测量和控制。 还描述了使用该装置确定部件的拓扑结构的方法。

公开(公告)号：US20150380221A1

公开(公告)日：2015-12-31

申请号：US14551537

申请日：2014-11-24

Applicant: Applied Materials, Inc.

Inventor： Ren Liu ,  John C. Forster ,  Joseph Yudovsky ,  Somesh Khandelwal ,  Kallol Bera ,  Li-Qun Xia

IPC: H01J37/32 ,  C23C16/56 ,  C23C16/505 ,  C23C16/455

CPC classification number: H01J37/32091 ,  C23C16/45536 ,  C23C16/45551 ,  H01J37/32532 ,  H01J37/32559 ,  H01J37/32605

Abstract: A plasma source assembly for use with a processing chamber includes a blocker plate with a first set of apertures within an inner electrical center of the blocker plate and smaller apertures around the outer peripheral edge. The apertures can decrease gradually in diameter from the electrical center outward to the peripheral edge or can be in discrete increments with the smallest at the outer peripheral edge.

Abstract translation: 与处理室一起使用的等离子体源组件包括阻挡板，其在阻挡板的内部电气中心内具有第一组孔，并且围绕外周边缘具有较小的孔。 孔径可以从电气中心向外逐渐减小到周边边缘，或者可以在外围边缘处具有最小的离散增量。