公开(公告)号：US10808331B2

公开(公告)日：2020-10-20

申请号：US15867878

申请日：2018-01-11

Applicant: CHIPBOND TECHNOLOGY CORPORATION

Inventor： Cheng-Hung Shih ,  Tsuo-Yun Chu ,  Xin-Wei Lo ,  Nian-Cih Yang

IPC: C25D21/04 ,  C25D17/00 ,  C25D21/10 ,  C25D17/06 ,  C25D5/08

Abstract: An electroplating system for depositing a plating material on an object includes a pressure device and an anode element. The pressure device includes a lid having first and second through holes and a base having a chamber, conduction holes and third through holes located in the chamber. Each of the conduction tubes includes a conduction hole connecting to one of the third through holes. The lid covers the chamber, the first through holes communicate with the chamber for spraying an electroplating solution toward the object and the second through holes reveal the conduction holes. A passage of electric force line is formed in the connected holes and the third through holes filled with the electroplating solution, and the anode element is located outside the passage of electric force line. The electroplating system can prevent defective plating and enhance plating efficiency.

公开(公告)号：US20190186037A1

公开(公告)日：2019-06-20

申请号：US15867878

申请日：2018-01-11

Applicant: CHIPBOND TECHNOLOGY CORPORATION

Inventor： Cheng-Hung Shih ,  Tsuo-Yun Chu ,  Xin-Wei Lo ,  Nian-Cih Yang

IPC: C25D21/04 ,  C25D17/06 ,  C25D5/08

Abstract: An electroplating system for depositing a plating material on an object includes a pressure device and an anode element. The pressure device includes a lid having first and second through holes and a base having a chamber, conduction holes and third through holes located in the chamber. Each of the conduction tubes includes a conduction hole connecting to one of the third through holes. The lid covers the chamber, the first through holes communicate with the chamber for spraying an electroplating solution toward the object and the second through holes reveal the conduction holes. A passage of electric force line is formed in the connected holes and the third through holes filled with the electroplating solution, and the anode element is located outside the passage of electric force line. The electroplating system can prevent defective plating and enhance plating efficiency.

公开(公告)号：US11148864B1

公开(公告)日：2021-10-19

申请号：US17169653

申请日：2021-02-08

Applicant: CHIPBOND TECHNOLOGY CORPORATION

Inventor： Cheng-Hung Shih ,  Tsuo-Yun Chu

IPC: B65D81/05 ,  B65D25/10 ,  B65D85/38

Abstract: The present invention discloses a storage container for electronic devices, especially for wafer frames. The storage container includes a body and a stop rod that is provided to open or close a pick-and-place path in the body. The pick-and-place path is open to allow the wafer frames placed in the body to be taken out when a recess of the stop rod is located in the pick-and-place path. On the contrary, the pick-and-place path is closed when a blocking part of the stop rod is located in the pick-and-place path so as to protect the wafer frames placed in the body from falling out from the storage container.