公开(公告)号：US20160229691A1

公开(公告)日：2016-08-11

申请号：US15023057

申请日：2014-12-04

Applicant: CSMC TECHNOLOGIES FABI CO., LTD.

Inventor： Errong JING

IPC: B81C1/00

CPC classification number: B81C1/00142 ,  B81C2201/0108 ,  B81C2201/0109 ,  B81C2201/013

Abstract: A method for manufacturing a film support beam includes: providing a substrate having opposed first and second surfaces; coating a sacrificial layer on the first surface of the substrate, and patterning the sacrificial layer; depositing a dielectric film on the sacrificial layer to form a dielectric film layer, and depositing a metal film on the dielectric film layer to form a metal film layer; patterning the metal film layer, and dividing a patterned area of the metal film layer into a metal film pattern of a support beam portion and a metal film pattern of a non-support beam portion, wherein a width of the metal film pattern of the support beam portion is greater than a width of a final support beam pattern, and a width of the metal film pattern of the non-support beam portion is equal to a width of a width of a final non-support beam pattern at the moment; photoetching and etching on the metal film layer and the dielectric film layer to obtain the final support beam pattern, the final non-support beam pattern and a final dielectric film layer, wherein the final dielectric film layer serves as a support film of the final support beam pattern and the final non-support beam pattern; and removing the sacrificial layer.

Abstract translation: 制造薄膜支撑梁的方法包括：提供具有相对的第一和第二表面的基底; 在衬底的第一表面上涂覆牺牲层，并对牺牲层进行构图; 在所述牺牲层上沉积介电膜以形成电介质膜层，并在所述电介质膜层上沉积金属膜以形成金属膜层; 图案化金属膜层，并将金属膜层的图案区域划分成支撑梁部分的金属膜图案和非支撑梁部分的金属膜图案，其中支撑件的金属膜图案的宽度 光束部分大于最终支撑光束图案的宽度，并且非支撑光束部分的金属膜图案的宽度等于此时的最终非支撑光束图案的宽度的宽度; 在金属膜层和电介质膜层上进行光蚀刻和蚀刻，以获得最终的支撑束图案，最终的非支撑束图案和最终的电介质膜层，其中最终的电介质膜层用作最终支撑体的支撑膜 光束图案和最终的非支撑光束图案; 并去除牺牲层。