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    Method and system for raman spectroscopy using plasmon heating
    2.
    发明授权
    Method and system for raman spectroscopy using plasmon heating 有权
    使用等离子体加热的拉曼光谱法的方法和系统

    公开(公告)号：US09442072B2

    公开(公告)日：2016-09-13

    申请号：US14539758

    申请日：2014-11-12

    Applicant: CALIFORNIA INSTITUTE OF TECHNOLOGY

    Inventor： David A. Boyd

    IPC: G01N21/65 ,  B82Y15/00

    CPC classification number: G01N21/658 ,  B82Y15/00 ,  Y10S977/932

    Abstract: A method of identifying a sample includes placing the sample in proximity to a plurality of nanoparticles and irradiating the plurality of nanoparticles with laser radiation. A plasmon resonance process results in heating of the plurality of nanoparticles due to the laser irradiation. The method also includes transferring energy from the plurality of nanoparticles to the sample, obtaining a Raman spectrum associated with sample, and identifying the sample based on the Raman spectrum.

    Abstract translation: 识别样品的方法包括将样品置于接近多个纳米颗粒并用激光辐射照射多个纳米颗粒。 等离子体共振过程导致由于激光照射而对多个纳米颗粒进行加热。 该方法还包括将能量从多个纳米颗粒转移到样品，获得与样品相关的拉曼光谱，以及基于拉曼光谱识别样品。

    METHOD AND SYSTEM FOR GRAPHENE FORMATION
    4.
    发明申请
    METHOD AND SYSTEM FOR GRAPHENE FORMATION 审中-公开
    用于石墨形成的方法和系统

    公开(公告)号：US20150368111A1

    公开(公告)日：2015-12-24

    申请号：US14838202

    申请日：2015-08-27

    Applicant: CALIFORNIA INSTITUTE OF TECHNOLOGY

    Inventor： David A. Boyd

    IPC: C01B31/04 ,  H01J37/32 ,  C23C16/52

    CPC classification number: C23C16/26 ,  B01J19/088 ,  B01J19/22 ,  B01J2219/0879 ,  B01J2219/0894 ,  B82Y30/00 ,  B82Y40/00 ,  C01B32/186 ,  C23C16/0245 ,  C23C16/52 ,  C23C16/545 ,  H01J37/32082 ,  H01J37/32449 ,  H01J37/32522 ,  H01J37/32816 ,  H01J2237/335 ,  H01L21/02046 ,  H01L21/02425 ,  H01L21/02527 ,  H01L21/0262 ,  H01L21/02661 ,  H01L29/1606 ,  H01L29/32

    Abstract: A system for graphene production includes a plurality of gas sources, a plurality of mass flow controllers, and a processing chamber. The system also includes a plasma source operable, a vacuum pump, a processor, and a non-transitory computer-readable storage medium including a plurality of computer-readable instructions. The plurality of instructions include instructions that cause the data processor to subject a substrate to a reduced pressure environment, to provide a carrier gas and a carbon source, and to expose at least a portion of the substrate to the carrier gas and the carbon source. The plurality of instructions also include instructions that cause the data processor to perform a surface treatment process on the at least a portion of the substrate and to convert a portion of the carbon source to graphene disposed on the at least a portion of the substrate.

    Abstract translation: 石墨烯生产系统包括多个气源，多个质量流量控制器和处理室。 该系统还包括可操作的等离子体源，真空泵，处理器和包括多个计算机可读指令的非暂时计算机可读存储介质。 多个指令包括使数据处理器使基板经历减压环境，提供载气和碳源，以及将至少一部分基板暴露于载气和碳源的指令。 多个指令还包括使得数据处理器对基板的至少一部分执行表面处理处理并将碳源的一部分转换成设置在基板的至少一部分上的石墨烯的指令。

    METHOD AND SYSTEM FOR GRAPHENE FORMATION
    5.
    发明申请
    METHOD AND SYSTEM FOR GRAPHENE FORMATION 审中-公开
    用于石墨形成的方法和系统

    公开(公告)号：US20150079342A1

    公开(公告)日：2015-03-19

    申请号：US14152751

    申请日：2014-01-10

    Applicant: CALIFORNIA INSTITUTE OF TECHNOLOGY

    Inventor： David A. Boyd ,  Nai-Chang Yeh

    IPC: C23C16/26 ,  C23C16/511 ,  C01B31/04 ,  C23C16/44

    CPC classification number: C23C16/26 ,  C01B32/184 ,  C01B32/186 ,  C23C16/4405 ,  C23C16/511 ,  Y10T428/24355

    Abstract: A method of forming graphene includes placing a substrate in a processing chamber and introducing a cleaning gas including hydrogen and nitrogen into the processing chamber. The method also includes introducing a carbon source into the processing chamber and initiating a microwave plasma in the processing chamber. The method further includes subjecting the substrate to a flow of the cleaning gas and the carbon source for a predetermined period of time to form the graphene.

    Abstract translation: 形成石墨烯的方法包括将基板放置在处理室中并将包括氢和氮的清洁气体引入到处理室中。 该方法还包括将碳源引入处理室并在处理室中启动微波等离子体。 该方法还包括使基板经历预定时间段的清洁气体和碳源的流动以形成石墨烯。

    METHOD AND SYSTEM FOR RAMAN SPECTROSCOPY USING PLASMON HEATING
    6.
    发明申请
    METHOD AND SYSTEM FOR RAMAN SPECTROSCOPY USING PLASMON HEATING 有权
    使用PLASMON加热的拉曼光谱的方法和系统

    公开(公告)号：US20150204793A1

    公开(公告)日：2015-07-23

    申请号：US14539758

    申请日：2014-11-12

    Applicant: CALIFORNIA INSTITUTE OF TECHNOLOGY

    Inventor： David A. Boyd

    IPC: G01N21/65

    CPC classification number: G01N21/658 ,  B82Y15/00 ,  Y10S977/932

    Abstract: A method of identifying a sample includes placing the sample in proximity to a plurality of nanoparticles and irradiating the plurality of nanoparticles with laser radiation. A plasmon resonance process results in heating of the plurality of nanoparticles due to the laser irradiation. The method also includes transferring energy from the plurality of nanoparticles to the sample, obtaining a Raman spectrum associated with sample, and identifying the sample based on the Raman spectrum.

    Abstract translation: 识别样品的方法包括将样品置于接近多个纳米颗粒并用激光辐射照射多个纳米颗粒。 等离子体共振过程导致由于激光照射而对多个纳米颗粒进行加热。 该方法还包括将能量从多个纳米颗粒转移到样品，获得与样品相关的拉曼光谱，以及基于拉曼光谱识别样品。

    Graphene structure
    7.
    发明授权
    Graphene structure 有权

    公开(公告)号：US10041168B2

    公开(公告)日：2018-08-07

    申请号：US14152751

    申请日：2014-01-10

    Applicant: CALIFORNIA INSTITUTE OF TECHNOLOGY

    Inventor： David A. Boyd ,  Nai-Chang Yeh

    IPC: C01B31/04 ,  C23C16/26 ,  C23C16/44 ,  C23C16/511 ,  C01B32/184 ,  C01B32/186

    Abstract: A method of forming graphene includes placing a substrate in a processing chamber and introducing a cleaning gas including hydrogen and nitrogen into the processing chamber. The method also includes introducing a carbon source into the processing chamber and initiating a microwave plasma in the processing chamber. The method further includes subjecting the substrate to a flow of the cleaning gas and the carbon source for a predetermined period of time to form the graphene.

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