公开(公告)号：US5712488A

公开(公告)日：1998-01-27

申请号：US725665

申请日：1996-10-01

Applicant: Werner Stickel ,  Christopher Frederick Robinson

Inventor： Werner Stickel ,  Christopher Frederick Robinson

IPC: H01J37/304

CPC classification number: H01J37/3174 ,  H01J37/304 ,  H01J2237/30433 ,  H01J2237/3175

Abstract: A electron beam performance measurement system includes an electron beam generator device for producing an electron beam, a test reticle having a series of openings forming a pattern, a reduction projection imaging device, a reference target having an essentially identical pattern as the test reticle, and a beam current detector. A patterned beam is generated by passing the electron beam through the pattern openings of the test reticle. The patterned beam is reduced and projected by the reduction projection imaging device and the reduced patterned beam is imaged onto a reference target. The reduced patterned beam is then exposed to the reference target, wherein some of the beam may pass through reference target pattern openings. Beam current detector records and measures the amount of beam current that is absorbed on, back-scattered from, or transmitted by the target reference, and determines from the measured beam current the accuracy of the projection system.

Abstract translation: 电子束性能测量系统包括用于产生电子束的电子束发生器装置，具有形成图案的一系列开口的测试掩模版，还原投影成像装置，具有与测试掩模版基本相同的图案的参考靶，以及 光束电流检测器。 通过使电子束通过测试掩模版的图案开口而产生图案化的光束。 图案化的光束被还原投影成像装置减小和投射，并且缩小的图案化光束被成像到参考目标上。 缩小的图案化的光束然后暴露于参考目标，其中一些光束可以通过参考目标图案开口。 光束电流检测器记录并测量由目标基准吸收，反向散射或透射的束电流量，并根据测量的束电流确定投影系统的精度。

公开(公告)号：US5936252A

公开(公告)日：1999-08-10

申请号：US936353

申请日：1997-09-24

Applicant: Werner Stickel ,  Christopher Frederick Robinson

Inventor： Werner Stickel ,  Christopher Frederick Robinson

IPC: H01J37/304

CPC classification number: H01J37/304 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/30433 ,  H01J2237/3175

Abstract: A charged particle beam performance measurement system includes a charged particle beam generator device for producing a charged particle beam, a test reticle having at least two areas of higher transparency than its surroundings that form a pattern, a reduction projection imaging device, a reference target having an essentially identical pattern as the test reticle, and a beam current detector. A patterned beam is generated by passing the charged particle beam through the pattern areas of the test reticle. The patterned beam is reduced and projected by the reduction projection imaging device and the reduced patterned beam is imaged onto a reference target. The reduced patterned beam is then exposed to the reference target, wherein some of the beam may pass through reference target pattern areas. Beam current detector records and measures the amount of beam current that is absorbed on, back-scattered from, or transmitted by the target reference, and determines from the measured beam current the accuracy of the projection system.

Abstract translation: 带电粒子束性能测量系统包括用于产生带电粒子束的带电粒子束发生器装置，具有至少两个比其形成图案的周围具有更高透明度的区域的测试掩模版，还原投影成像装置，具有 与测试掩模版基本相同的图案，以及光束电流检测器。 通过使带电粒子束通过测试掩模版的图案区域来产生图案化的束。 图案化的光束被还原投影成像装置减小和投射，并且缩小的图案化光束被成像到参考目标上。 然后将经缩小的图案化的光束暴露于参考目标，其中一些光束可以通过参考目标图案区域。 光束电流检测器记录并测量由目标基准吸收，反向散射或透射的束电流量，并根据测量的束电流确定投影系统的精度。

公开(公告)号：US5866913A

公开(公告)日：1999-02-02

申请号：US878226

申请日：1997-06-18

Applicant: Christopher Frederick Robinson

Inventor： Christopher Frederick Robinson

IPC: H01J37/30

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/20 ,  G03F1/36

Abstract: A lithographic projection method which comprises projecting radiation along a transmission path and through a lens system and an opaque back focal plane filter for electrons with a transparent aperture for the projected radiation to produce a patterned image and an amount of desired radiation on a target. The transmission path includes a source of radiation of charged particles directed at a target comprising a substrate coated with resist. A pattern-defining mask that contains a plurality of subresolution scattering features thereon to produce the desired degree of scattering of the radiation is placed between the source and the target. The subresolution scattering features vary in density as an direct function of predicted proximity exposure.

Abstract translation: 一种光刻投影方法，其包括沿着透射路径投射辐射，并通过透镜系统和用于具有用于投影辐射的透明孔的电子的不透光后焦平面滤光器来产生图案化图像和目标上所需辐射的量。 传输路径包括指向包含涂覆有抗蚀剂的基底的靶的带电粒子的辐射源。 在源和目标之间设置包含其上的多个分散散射特征以产生期望的辐射散射的图案定义掩模。 分散散射特征作为预测接近度暴露的直接函数在密度上变化。

公开(公告)号：US5763894A

公开(公告)日：1998-06-09

申请号：US788064

申请日：1997-01-23

Applicant: William A. Enichen ,  Christopher Frederick Robinson

Inventor： William A. Enichen ,  Christopher Frederick Robinson

IPC: H01J37/147 ,  H01J37/304 ,  H01J37/305 ,  H01L21/027

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/304 ,  H01J2237/30433 ,  H01J2237/3175

Abstract: A method and system for calibrating a projection electron beam. The electron beam is directed through a first mask pattern and onto a first calibration plate. The electron beam is directed through a second mask pattern and onto a second calibration plate. The first mask pattern and the first calibration plate are used to adjust the orientation of the electron beam, and the second mask pattern and the second calibration plate are used to adjust the magnification of the electron beam.

Abstract translation: 一种用于校准投影电子束的方法和系统。 电子束通过第一掩模图案被引导到第一校准板上。 电子束通过第二掩模图案被引导到第二校准板上。 第一掩模图案和第一校准板用于调整电子束的取向，并且第二掩模图案和第二校准板用于调整电子束的放大率。

公开(公告)号：US5751004A

公开(公告)日：1998-05-12

申请号：US789675

申请日：1997-01-24

Applicant: Christopher Frederick Robinson ,  Werner Stickel

Inventor： Christopher Frederick Robinson ,  Werner Stickel

IPC: G03F7/20 ,  H01J37/00 ,  H01J37/305 ,  H01L21/027 ,  H01J37/09

CPC classification number: H01J37/00 ,  H01J2237/30433 ,  H01J2237/3175

Abstract: A method and system for studying the effect of electron-electron interaction in an electron beam writing system. First and second test reticles are provided that have different open areas. An electron beam is directed through the first test reticle to form a first pattern on a test surface, and the electron beam is then directed through the second test reticle to form a second pattern on a test surface. Because the open areas of the test reticles differ, the current of the electron beam is different when that beam passes through the first test reticle than when that beam passes through the second test reticle. The resolution of the first formed pattern is compared with the resolution of the second formed pattern to assess the effect of the different currents of the electron beam on the resolutions of the formed patterns.

Abstract translation: 一种用于研究电子束写入系统中电子 - 电子相互作用效应的方法和系统。 提供具有不同开放面积的第一和第二测试标线。 电子束被引导通过第一测试掩模版以在测试表面上形成第一图案，然后电子束被引导通过第二测试光罩以在测试表面上形成第二图案。 由于测试光罩的开放区域不同，当光束通过第一测试光罩时，电子束的电流不同于当光束通过第二测试光罩时。 将第一形成图案的分辨率与第二形成图案的分辨率进行比较，以评估电子束的不同电流对形成的图案的分辨率的影响。