公开(公告)号：US08692217B2

公开(公告)日：2014-04-08

申请号：US13850721

申请日：2013-03-26

Applicant: FEI Company

Inventor： Noel Smith ,  Clive D. Chandler ,  Mark W. Utlaut ,  Paul P. Tesch ,  Dave Tuggle

IPC: H01J37/08 ,  H01J27/02

CPC classification number: H01J37/3007 ,  C23C14/0031 ,  C23C14/221 ,  H01J27/16 ,  H01J37/08 ,  H01J37/305 ,  H01J37/3053 ,  H01J37/3056 ,  H01J37/3178 ,  H01J37/32082 ,  H01J37/3211 ,  H01J2237/006 ,  H01J2237/0817 ,  H01J2237/0827 ,  H01J2237/31 ,  H01J2237/31749

Abstract: The present invention provides a plasma ion beam system that includes multiple gas sources and that can be used for performing multiple operations using different ion species to create or alter submicron features of a work piece. The system preferably uses an inductively coupled, magnetically enhanced ion beam source, suitable in conjunction with probe-forming optics sources to produce ion beams of a wide variety of ions without substantial kinetic energy oscillations induced by the source, thereby permitting formation of a high resolution beam.

Abstract translation: 本发明提供了一种等离子体离子束系统，其包括多个气体源，并且可用于使用不同离子种类进行多个操作以产生或改变工件的亚微米特征。 该系统优选使用电感耦合的磁增强离子束源，其适合与探针形成光学源结合以产生各种离子的离子束，而不会由源引起的实质动能振荡，从而允许形成高分辨率 光束。

公开(公告)号：US20130309421A1

公开(公告)日：2013-11-21

申请号：US13850721

申请日：2013-03-26

Applicant: FEI Company

Inventor： Noel Smith ,  Clive D. Chandler ,  Mark W. Utlaut ,  Paul P. Tesch ,  Dave Tuggle

IPC: H01J37/32 ,  H01J37/305 ,  C23C14/22

CPC classification number: H01J37/3007 ,  C23C14/0031 ,  C23C14/221 ,  H01J27/16 ,  H01J37/08 ,  H01J37/305 ,  H01J37/3053 ,  H01J37/3056 ,  H01J37/3178 ,  H01J37/32082 ,  H01J37/3211 ,  H01J2237/006 ,  H01J2237/0817 ,  H01J2237/0827 ,  H01J2237/31 ,  H01J2237/31749

Abstract: The present invention provides a plasma ion beam system that includes multiple gas sources and that can be used for performing multiple operations using different ion species to create or alter submicron features of a work piece. The system preferably uses an inductively coupled, magnetically enhanced ion beam source, suitable in conjunction with probe-forming optics sources to produce ion beams of a wide variety of ions without substantial kinetic energy oscillations induced by the source, thereby permitting formation of a high resolution beam.