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    SAMPLE SUPPORT BODY AND METHOD FOR MANUFACTURING SAMPLE SUPPORT BODY
    1.
    发明申请
    SAMPLE SUPPORT BODY AND METHOD FOR MANUFACTURING SAMPLE SUPPORT BODY 有权

    公开(公告)号：US20250054743A1

    公开(公告)日：2025-02-13

    申请号：US18722784

    申请日：2022-11-04

    Applicant: HAMAMATSU PHOTONICS K.K.

    Inventor： Masahiro KOTANI ,  Takayuki OHMURA ,  Takamasa IKEDA

    IPC: H01J49/04 ,  B05B5/00

    Abstract: A sample support body is a sample support body used for ionizing components of a sample. The sample support body includes a substrate, a conductive layer, and a plurality of particles. The substrate includes a main surface and a plurality of holes opened in the main surface. The conductive layer is provided on the main surface so that the holes are not blocked. The plurality of particles are provided on a surface of the conductive layer. The absorption rate of the plurality of particles with respect to the energy beam used for ionization is equal to or higher than the absorption rate of the conductive layer with respect to the energy beam.

    SAMPLE SUPPORT, IONIZATION METHOD, AND MASS SPECTROMETRY METHOD
    2.
    发明公开
    SAMPLE SUPPORT, IONIZATION METHOD, AND MASS SPECTROMETRY METHOD 审中-公开

    公开(公告)号：US20230411133A1

    公开(公告)日：2023-12-21

    申请号：US18037346

    申请日：2021-10-14

    Applicant: HAMAMATSU PHOTONICS K.K.

    Inventor： Masahiro KOTANI ,  Takayuki OHMURA ,  Akira TASHIRO

    IPC: H01J49/04

    CPC classification number: H01J49/0409

    Abstract: A sample support body includes a substrate and a porous layer provided on the substrate and having a surface opposite the substrate. The porous layer includes a body layer having a plurality of holes open to a surface of the porous layer. Each of the plurality of holes includes an extension portion extending in a thickness direction of the substrate and an opening widened from an end of the extension portion on a surface side toward the surface. An average value of the depths of the plurality of holes is 3 μm or more and 100 μm or less. A value obtained by dividing the average value of the depths by an average value of the widths of the plurality of holes is 9 or more and 2500 or less.

    SAMPLE SUPPORT, SAMPLE IONIZATION METHOD, AND MASS SPECTROMETRY METHOD
    4.
    发明申请
    SAMPLE SUPPORT, SAMPLE IONIZATION METHOD, AND MASS SPECTROMETRY METHOD 有权

    公开(公告)号：US20220238317A1

    公开(公告)日：2022-07-28

    申请号：US17719121

    申请日：2022-04-12

    Applicant: HAMAMATSU PHOTONICS K.K.

    Inventor： Miu TAKIMOTO ,  Takayuki OHMURA ,  Masahiro KOTANI

    IPC: H01J49/00 ,  H01J49/04

    Abstract: A sample support is a sample support for sample ionization, including: a substrate formed with a plurality of through holes opening to a first surface and a second surface on a side opposite to the first surface; a conductive layer provided not to block the through hole in the first surface; and a frame body provided in a peripheral portion of the substrate to surround an ionization region in which a sample is ionized when viewed in a thickness direction of the substrate, in which a marker for recognizing a position in the ionization region is provided in the frame body.

    SAMPLE SUPPORT, ADAPTER, IONIZATION METHOD AND MASS SPECTROMETRY METHOD
    5.
    发明申请
    SAMPLE SUPPORT, ADAPTER, IONIZATION METHOD AND MASS SPECTROMETRY METHOD 有权

    公开(公告)号：US20220223396A1

    公开(公告)日：2022-07-14

    申请号：US17623767

    申请日：2020-04-01

    Applicant: HAMAMATSU PHOTONICS K.K.

    Inventor： Akira TASHIRO ,  Masahiro KOTANI ,  Takayuki OHMURA

    IPC: H01J49/04 ,  H01J49/00

    Abstract: A sample support is used for ionization of a sample. The sample support includes a film part having a first front surface and a first back surface, the film part being formed with a plurality of through-holes, and a support part defining a measurement region for ionizing the sample with respect to the film part and supporting the film part. The support part includes an inner portion having a second front surface and a second back surface, the film part being fixed to the inner portion, and an outer portion having a third front surface and a third back surface and extending along an outer edge of the inner portion. A difference generated between a position of the first front surface and a position of the third front surface in a thickness direction of the film part is smaller than a thickness of the film part.

    SAMPLE SUPPORT, IONIZATION METHOD, AND MASS SPECTROMETRY METHOD
    6.
    发明申请
    SAMPLE SUPPORT, IONIZATION METHOD, AND MASS SPECTROMETRY METHOD 有权

    公开(公告)号：US20220157588A1

    公开(公告)日：2022-05-19

    申请号：US17439049

    申请日：2019-12-11

    Applicant: HAMAMATSU PHOTONICS K.K.

    Inventor： Masahiro KOTANI ,  Takayuki OHMURA ,  Akira TASHIRO

    IPC: H01J49/04 ,  H01J49/16 ,  G01N27/623 ,  B01L3/02

    Abstract: The sample support includes a substrate having a plurality of through holes opened in a first surface and a second surface, a frame surrounding a measurement region of the substrate and supporting the substrate when viewed in a thickness direction of the substrate, and a protective layer disposed to face the first surface and having a facing portion facing the measurement region. A through hole penetrating in the thickness direction is formed in the facing portion. The through hole of the facing portion includes a narrow portion having a width smaller than an outer diameter of a tip of a pipette tip for dropping a sample solution into the measurement region.

    LASER DESORPTION/IONIZATION METHOD AND MASS SPECTROMETRY METHOD
    7.
    发明申请
    LASER DESORPTION/IONIZATION METHOD AND MASS SPECTROMETRY METHOD 审中-公开

    公开(公告)号：US20200273689A1

    公开(公告)日：2020-08-27

    申请号：US16647493

    申请日：2018-08-03

    Applicant: HAMAMATSU PHOTONICS K.K.

    Inventor： Yasuhide NAITO ,  Takayuki OHMURA ,  Masahiro KOTANI

    IPC: H01J49/04 ,  H01J49/02 ,  H01J49/16

    Abstract: A laser desorption/ionization method includes a first process of preparing a sample support body. The sample support body includes a substrate, an ionization substrate, and a support that supports the ionization substrate with respect to the substrate such that a first surface of the ionization substrate is separated from the substrate. A plurality of through-holes are formed at least in measurement regions of the ionization substrate. A conductive layer is provided on peripheral edges of the through-holes at least on the second surface. Further, the laser desorption/ionization method includes a second process of dropping the sample on the measurement regions of the ionization substrate, and a third process of, after the sample has infiltrated into the ionization substrate, ionizing components of the sample by applying a laser beam to the second surface while applying a voltage to the conductive layer.

    SAMPLE SUPPORT
    10.
    发明申请
    SAMPLE SUPPORT 有权

    公开(公告)号：US20250014881A1

    公开(公告)日：2025-01-09

    申请号：US18709584

    申请日：2022-09-05

    Applicant: HAMAMATSU PHOTONICS K.K.

    Inventor： Takamasa IKEDA ,  Masahiro KOTANI ,  Takayuki OHMURA

    IPC: H01J49/04 ,  H01J9/30 ,  H01J49/00

    Abstract: A sample support includes a substrate including a first surface, and a second surface on a side opposite to the first surface, and including a measurement region in which a porous structure for communicating the first surface and the second surface with each other is formed. A calibration portion including a surface flush with the first surface is formed in the substrate. The water absorbability of the calibration portion is lower than the water absorbability of the measurement region.

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