Abstract:
A system of electron irradiation includes an electron accelerator and an electron beam focusing device. The electron accelerator emits and accelerates a beam of electrons. The electron beam focusing device is located at a rear end of the electron irradiation and includes a beam restraining rail and 2n+1 sets of magnetic poles. The beam restraining rail forms a beam restraining channel through which the beam of electrons are to pass. The 2n+1 sets of magnetic poles are installed on the beam restraining rail and distributed at different locations of the beam restraining channel. An nth set of magnetic poles thereof are arranged for performing, on the beam of electrons, focusing in a first direction. An (n+1)th set of magnetic poles thereof are arranged for performing, on the beam of electrons, focusing in a second direction. The second direction is perpendicular to the first direction. The n is a positive integer.
Abstract:
An irradiation under-beam device (2) and an irradiation processing production line, which belong to the technical field of irradiation processing and are used to improve the irradiation uniformity of an insulator (1) during irradiation processing. The irradiation under-beam device (2) comprises a frame (21), a rotary clamping member (22), and a supporting device (23). The rotary clamping member (22) is configured to secure a first end of the insulator (1), the rotary clamping member (22) is rotatably connected to the frame (21), and when the rotary clamping member (22) clamps the insulator (1), the axis of rotation of the rotary clamping member (22) relative to the frame (21) coincides with the axis of the insulator (1). The supporting device (23) is arranged on the frame (21), and the supporting device (23) is configured to support and secure a second end of the insulator (1). The irradiation under-beam device (2) is used to secure the insulator (1), so that the insulator (1) can receive radiation from a radiation source (4).
Abstract:
Provided is a device for optimizing a diffusion section of an electron beam, comprising two groups of permanent magnets, a magnetic field formed by the four magnetic poles extending the electron beam in a longitudinal direction, and compressing the electron beam in a transverse direction, so that the electron beam becomes an approximate ellipse; another magnetic field formed by the eight magnetic poles optimizing an edge of a dispersed electron-beam bunch into an approximate rectangle; by controlling the four longitudinal connection mechanisms so that the upper magnetic yoke and the lower magnetic yoke of the first group of permanent magnets move synchronously towards the center thereof thereby longitudinally compressing the electron beam in the shape of an approximate ellipse, and the upper magnetic yoke and the lower magnetic yoke of the second group of permanent magnets move synchronously towards the center thereof thereby longitudinally compressing the electron beam in the shape of an approximate rectangle, and the process of longitudinal compression is repeated until a longitudinal size of the electron-beam bunch is reduced to 80 mm. The invention is capable of reasonably compressing a longitudinal size of an electron-beam bunch after diffusion to approximately 80 mm, which ensures optimum irradiation uniformity and efficiency, and enables the longitudinal size to be within the range of a conventional titanium window,