Method for patterning flexible substrate

    公开(公告)号:US08945821B2

    公开(公告)日:2015-02-03

    申请号:US14487047

    申请日:2014-09-15

    CPC classification number: G03F7/343 G02F1/00 G02F1/133305 G03F7/2016 G03F7/34

    Abstract: The invention provides a method for patterning a flexible substrate. The method for patterning a flexible substrate includes providing a carrier substrate. A release layer is formed on the carrier substrate. A flexible substrate film is formed on the release layer. A plurality of UV blocking mask patterns is formed covering various portions of the flexible substrate film and the release layer. A UV lighting process is performed to expose the flexible substrate film and the release layer not covered by the UV blocking mask patterns, to a UV light. A debonding step is performed so that the various portions of the flexible substrate film directly above the various portions of the release layer, which were not exposed to the UV light, are separated from the carrier substrate.

    Substrate structures applied in flexible devices
    3.
    发明授权
    Substrate structures applied in flexible devices 有权
    衬底结构应用于柔性装置

    公开(公告)号:US09023448B2

    公开(公告)日:2015-05-05

    申请号:US13774104

    申请日:2013-02-22

    Abstract: A substrate structure applied in flexible devices is provided. The substrate structure includes a carrier; a release layer with a first area formed on the carrier, which has a first adhesion force to the carrier; and a flexible substrate with a second area overlying part of the first area of the release layer and contacting the carrier, which has a second adhesion force to the release layer and a third adhesion force to the carrier, wherein the first area is larger than or equal to the second area, the third adhesion force is greater than the first adhesion force, and the first adhesion force is greater than the second adhesion force.

    Abstract translation: 提供了一种应用在柔性器件中的衬底结构。 衬底结构包括载体; 释放层,其具有形成在所述载体上的第一区域,所述第一区域对所述载体具有第一粘附力; 以及柔性基底,其具有覆盖在所述释放层的所述第一区域的一部分上的第二区域并使所述载体接触,所述载体对所述释放层具有第二粘附力和对所述载体的第三粘附力,其中所述第一区域大于或 等于第二区域,第三粘附力大于第一粘附力,并且第一粘附力大于第二粘附力。

    Method for patterning flexible substrate
    4.
    发明授权
    Method for patterning flexible substrate 有权
    图案柔性基板的方法

    公开(公告)号:US08932804B1

    公开(公告)日:2015-01-13

    申请号:US14487037

    申请日:2014-09-15

    CPC classification number: G03F7/343 G02F1/00 G02F1/133305 G03F7/2016 G03F7/34

    Abstract: The invention provides a method for patterning a flexible substrate. The method for patterning a flexible substrate includes providing a carrier substrate. A release layer is formed on the carrier substrate. A flexible substrate film is formed on the release layer. A plurality of UV blocking mask patterns is formed covering various portions of the flexible substrate film and the release layer. A UV lighting process is performed to expose the flexible substrate film and the release layer not covered by the UV blocking mask patterns, to a UV light. A debonding step is performed so that the various portions of the flexible substrate film directly above the various portions of the release layer, which were not exposed to the UV light, are separated from the carrier substrate.

    Abstract translation: 本发明提供了一种用于图案化柔性基板的方法。 图案化柔性基板的方法包括提供载体基板。 在载体基板上形成剥离层。 在剥离层上形成柔性基材膜。 形成多个UV阻挡掩模图案,覆盖柔性基底膜和释放层的各个部分。 执行紫外线照射工艺以将柔性基底膜和未被UV阻挡掩模图案覆盖的剥离层暴露于UV光。 进行剥离步骤,使得柔性基材薄膜的不暴露于紫外光的各个部分的正上方的各个部分与载体基板分离。

    METHOD FOR PATTERNING FLEXIBLE SUBSTRATE
    5.
    发明申请

    公开(公告)号:US20150004548A1

    公开(公告)日:2015-01-01

    申请号:US14487037

    申请日:2014-09-15

    CPC classification number: G03F7/343 G02F1/00 G02F1/133305 G03F7/2016 G03F7/34

    Abstract: The invention provides a method for patterning a flexible substrate. The method for patterning a flexible substrate includes providing a carrier substrate. A release layer is formed on the carrier substrate. A flexible substrate film is formed on the release layer. A plurality of UV blocking mask patterns is formed covering various portions of the flexible substrate film and the release layer. A UV lighting process is performed to expose the flexible substrate film and the release layer not covered by the UV blocking mask patterns, to a UV light. A debonding step is performed so that the various portions of the flexible substrate film directly above the various portions of the release layer, which were not exposed to the UV light, are separated from the carrier substrate.

    METHOD FOR PATTERNING FLEXIBLE SUBSTRATE
    8.
    发明申请
    METHOD FOR PATTERNING FLEXIBLE SUBSTRATE 有权
    用于绘制柔性衬底的方法

    公开(公告)号:US20150004549A1

    公开(公告)日:2015-01-01

    申请号:US14487047

    申请日:2014-09-15

    CPC classification number: G03F7/343 G02F1/00 G02F1/133305 G03F7/2016 G03F7/34

    Abstract: The invention provides a method for patterning a flexible substrate. The method for patterning a flexible substrate includes providing a carrier substrate. A release layer is formed on the carrier substrate. A flexible substrate film is formed on the release layer. A plurality of UV blocking mask patterns is formed covering various portions of the flexible substrate film and the release layer. A UV lighting process is performed to expose the flexible substrate film and the release layer not covered by the UV blocking mask patterns, to a UV light. A debonding step is performed so that the various portions of the flexible substrate film directly above the various portions of the release layer, which were not exposed to the UV light, are separated from the carrier substrate.

    Abstract translation: 本发明提供了一种用于图案化柔性基板的方法。 图案化柔性基板的方法包括提供载体基板。 在载体基板上形成剥离层。 在剥离层上形成柔性基材膜。 形成多个UV阻挡掩模图案,覆盖柔性基底膜和释放层的各个部分。 执行紫外线照射工艺以将柔性基底膜和未被UV阻挡掩模图案覆盖的剥离层暴露于UV光。 进行剥离步骤,使得柔性基材薄膜的不暴露于紫外光的各个部分的正上方的各个部分与载体基板分离。

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