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公开(公告)号：US09296606B2
公开(公告)日：2016-03-29
申请号：US14172894
申请日：2014-02-04
Applicant: INVENSENSE, INC.
Inventor： Kirt Reed Williams , Matthew Julian Thompson , Joseph Seeger
CPC classification number: B81B3/0051 , B81B2201/0221 , B81B2201/0235 , B81B2201/0271 , B81C1/00666 , G01K1/00 , G01N3/20 , G01P15/125 , G01P2015/0828
Abstract: A method and system for a MEMS device is disclosed. The MEMS device includes a free layer, with a first portion and a second portion. The MEMS device also includes a underlying substrate, the free layer movably positioned relative to the underlying substrate. The first portion and second portion of the free layer are coupled through at least one stem. A sense material is disposed over portions of the second portion of the free layer. Stress in the sense material and second portion of the free layer does not cause substantial deflection of the first portion.
Abstract translation: 公开了一种用于MEMS器件的方法和系统。 MEMS器件包括具有第一部分和第二部分的自由层。 MEMS器件还包括下面的衬底，自由层相对于下面的衬底可移动地定位。 自由层的第一部分和第二部分通过至少一个杆连接。 感测材料设置在自由层的第二部分的部分上。 感应材料和自由层的第二部分的应力不会引起第一部分的实质的偏转。
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公开(公告)号：US10466268B2
公开(公告)日：2019-11-05
申请号：US15916105
申请日：2018-03-08
Applicant: InvenSense, Inc.
Inventor： Matthew Julian Thompson , Kirt Reed Williams
IPC: G01P15/125 , B81B7/00 , G01P15/08
Abstract: A MEMS sensor that comprises a sensing reference plane, at least one anchor coupled to the sensing reference plane, wherein the sensing reference plane is divided by a first and a second axis forming four quadrants on the sensing reference plane, at least one proof mass coupled to the at least one anchor, wherein one of the at least one proof mass moves under an external excitation, and a pattern of sensing elements on the sensing reference plane to detect motion normal of the at least one proof mass relative to the sensing reference plane, wherein the pattern of sensing elements comprises at least three sensing elements in each of the four quadrants.
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公开(公告)号：US09952252B2
公开(公告)日：2018-04-24
申请号：US14714149
申请日：2015-05-15
Applicant: InvenSense, Inc.
Inventor： Matthew Julian Thompson , Kirt Reed Williams
IPC: G01P15/125 , B81B7/00 , G01P15/08
CPC classification number: G01P15/125 , B81B7/0016 , B81B2203/0307 , G01P2015/0831
Abstract: A system and method for reducing offset in a MEMS sensor are disclosed. In a first aspect, the system is a MEMS sensor that comprises a sensing reference plane, at least one anchor coupled to the sensing reference plane, at least one proof mass coupled to the at least one anchor, wherein one of the at least one proof mass moves under an external excitation, a pattern of sensing elements coupled between the sensing reference plane and the at least one proof mass to detect motion normal to the sensing reference plane, wherein the pattern of sensing elements shares at least three axes of polarity anti-symmetry, and a signal processing circuit to combine the pattern of sensing elements thereby providing an output proportional to the external excitation. In a second aspect, the sensing reference plane is divided by two axes forming four quadrants on the sensing reference plane.
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公开(公告)号：US09738511B2
公开(公告)日：2017-08-22
申请号：US14225275
申请日：2014-03-25
Applicant: InvenSense, Inc.
Inventor： Jongwoo Shin , Kirt Reed Williams , Cerina Zhang , Kuolung (Dino) Lei
CPC classification number: B81C1/00103 , B81C2201/0112 , B81C2201/0132 , B81C2201/0133
Abstract: A MEMS (microelectromechanical systems) structure comprises a MEMS wafer. A MEMS wafer includes a cap with cavities bonded to a structural layer through a dielectric layer disposed between the cap and the structural layer. Unique configurations of MEMS devices and methods of providing such are set forth which provide for, in part, creating rounded, scalloped or chamfered MEMS profiles by shaping the etch mask photoresist reflow, by using a multi-step deep reactive ion etch (DRIE) with different etch characteristics, or by etching after DRIE.
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