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公开(公告)号:US09475052B2
公开(公告)日:2016-10-25
申请号:US14408433
申请日:2013-03-04
Inventor: Hiroaki Tachibana , Koji Tsuji
IPC: B01J19/00 , B01L7/00 , F24J1/00 , F28D7/00 , B01L3/00 , C12M1/26 , F28D3/00 , F28D5/00 , C12M3/00 , H01L23/473 , B01J19/24 , B01J37/02
CPC classification number: B01L7/525 , B01J19/0093 , B01J19/2485 , B01J37/0228 , B01J2219/00081 , B01J2219/00783 , B01J2219/00822 , B01J2219/00873 , B01J2219/00876 , B01J2219/00885 , B01L3/5027 , B01L3/502715 , B01L2300/0816 , B01L2300/087 , B01L2300/0883 , B01L2300/1827 , C12M33/00
Abstract: The present invention provides a miniaturized microfluidic device with a heater that has a simple structure without needing adhesion means for improving the heat transfer between the heater block and the device, and which can form the uniform temperature regions. Disclosed is a microfluidic device, including: a substrate; a reaction flow path formed on the substrate; and a temperature adjustment heater for heating the reaction flow path, in which a reaction flow path formation region including the reaction flow path formed therein and a temperature adjustment heater formation region including the temperature adjustment heater formed therein are alternately arranged on the substrate, the reaction flow path is formed to be bent at least one time in the reaction flow path formation region, and the temperature adjustment heater is formed to be bent at least one time in the temperature adjustment heater formation region.
Abstract translation: 本发明提供了具有加热器的微型微流体装置,其具有简单的结构,而不需要用于改善加热器块和装置之间的热传递的粘合装置,并且可以形成均匀的温度区域。 公开了一种微流体装置,包括:基板; 形成在基板上的反应流路; 以及温度调节加热器,用于加热其中形成有反应流路的反应流路形成区域和其中形成有温度调节加热器的温度调节加热器形成区域的反应流路的反应流路交替排列在基板上,反应 流路形成为在反应流路形成区域中弯曲至少一次,并且将温度调节加热器形成为在温度调节加热器形成区域中至少弯曲一次。
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公开(公告)号:US11964294B2
公开(公告)日:2024-04-23
申请号:US17258005
申请日:2019-06-25
Inventor: Mitsuhiko Ueda , Tatsuya Kiriyama , Hiroaki Tachibana , Shogo Shibuya
IPC: A61L9/00 , A61L9/14 , B01J13/04 , B05B5/025 , B05B5/057 , B05B7/06 , B05B7/08 , B05B12/14 , B05B17/06
CPC classification number: B05B5/057 , A61L9/14 , B01J13/046 , B05B5/0255 , B05B7/061 , B05B7/0846 , B05B12/1472 , B05B17/0615 , A61L2209/134 , Y10T428/2984
Abstract: A mist-generating device includes: a droplet generating unit that generates, in a third liquid, a functional droplet including a first liquid that is spherical and a second liquid that covers an entirety of the first liquid and has a volatility lower than a volatility of the first liquid; and a mist-generating unit that generates a multilayer mist obtained by atomizing the third liquid containing the functional droplet.
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公开(公告)号:US20150190811A1
公开(公告)日:2015-07-09
申请号:US14408433
申请日:2013-03-04
Inventor: Hiroaki Tachibana , Koji Tsuji
CPC classification number: B01L7/525 , B01J19/0093 , B01J19/2485 , B01J37/0228 , B01J2219/00081 , B01J2219/00783 , B01J2219/00822 , B01J2219/00873 , B01J2219/00876 , B01J2219/00885 , B01L3/5027 , B01L3/502715 , B01L2300/0816 , B01L2300/087 , B01L2300/0883 , B01L2300/1827 , C12M33/00
Abstract: The present invention provides a miniaturized microfluidic device with a heater that has a simple structure without needing adhesion means for improving the heat transfer between the heater block and the device, and which can form the uniform temperature regions. Disclosed is a microfluidic device, including: a substrate; a reaction flow path formed on the substrate; and a temperature adjustment heater for heating the reaction flow path, in which a reaction flow path formation region including the reaction flow path formed therein and a temperature adjustment heater formation region including the temperature adjustment heater formed therein are alternately arranged on the substrate, the reaction flow path is formed to be bent at least one time in the reaction flow path formation region, and the temperature adjustment heater is formed to be bent at least one time in the temperature adjustment heater formation region.
Abstract translation: 本发明提供了具有加热器的微型微流体装置,其具有简单的结构,而不需要用于改善加热器块和装置之间的热传递的粘合装置,并且可以形成均匀的温度区域。 公开了一种微流体装置,包括:基板; 形成在基板上的反应流路; 以及温度调节加热器,用于加热其中形成有反应流路的反应流路形成区域和其中形成有温度调节加热器的温度调节加热器形成区域的反应流路的反应流路交替排列在基板上,反应 流路形成为在反应流路形成区域中弯曲至少一次,并且在温度调节加热器形成区域中形成至少一次弯曲温度调节加热器。
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