Control of solid state dimensional features

    公开(公告)号:US20030066749A1

    公开(公告)日:2003-04-10

    申请号:US10186105

    申请日:2002-06-27

    Abstract: A solid state structure having a surface is provided and is exposed to a flux, F, of incident ions. The conditions of this incident ion exposure are selected based on: 1 null null t null C null ( r , t ) = F null null null Y 1 + D null null 2 null C - C null trap - F null null null C null null null null C , where C is concentration of mobile adatoms at structure surface, r is vector surface position, t is time, Y1 is number of adatoms created per incident ion, D is adatom diffusivity, nulltrap is average lifetime of an adatom before adatom annihilation occurs at a structure surface defect characteristic of solid state structure material, and nullCis cross-section for adatom annihilation by incident ions characteristic of selected ion exposure conditions. Ion exposure condition selection controls sputtering of the structure surface by incident ions to transport, within the structure including the structure surface, material of the structure to a feature location, in response to the ion flux exposure, to produce a feature substantially by locally adding material of the structure to the feature location.

    Method for characterization of nucleic acid molecules
    2.
    发明申请
    Method for characterization of nucleic acid molecules 审中-公开
    核酸分子表征方法

    公开(公告)号:US20030104428A1

    公开(公告)日:2003-06-05

    申请号:US10177062

    申请日:2002-06-21

    Abstract: To probe the characteristics of a target nucleic acid molecule or a population of target nucleic acid molecules, a local cross-sectional area, local charge, or local chemistry of a molecule is modified. The modified nucleic acid is contacted with a substrate that includes a detector that is responsive to the modification in the local cross-sectional area, local charge, or local chemistry of the nucleic acid molecule. The modified nucleic acid molecule traverses a defined and preferably molecular dimensioned volume on the substrate so that nucleotides of the modified nucleic acid molecule interact with the detector in sequential order, whereby data correlating with the cross-sectional area, local charge, or local chemistry of the nucleic acid molecule are obtained. The nucleic acid molecule may be modified in a number of locations along the molecule's length. Because the individual nucleotides of the nucleic acid molecule interact with the detector in sequential order, information regarding the location and composition of a plurality of modified sites along a single molecule can be obtained.

    Abstract translation: 为了探测靶核酸分子或靶核酸分子群的特征,修饰了分子的局部横截面积,局部电荷或局部化学。 经修饰的核酸与包含检测器的底物接触,所述检测器响应于核酸分子的局部横截面积,局部电荷或局部化学物质的修饰。 修饰的核酸分子穿过基底上限定且优选分子尺寸的体积,使得修饰的核酸分子的核苷酸以检测器的顺序相互作用,由此与横截面积,局部电荷或局部化学相关的数据 得到核酸分子。 核酸分子可以沿着分子的长度在多个位置修饰。 因为核酸分子的各个核苷酸以连续的顺序与检测器相互作用,所以可以获得关于沿单个分子的多个修饰位点的位置和组成的信息。

    Controlled fabrication of gaps in electrically conducting structures
    3.
    发明申请
    Controlled fabrication of gaps in electrically conducting structures 有权
    控制导电结构间隙的制造

    公开(公告)号:US20040229386A1

    公开(公告)日:2004-11-18

    申请号:US10767102

    申请日:2004-01-29

    CPC classification number: G01N33/48721 Y10T436/11 Y10T436/12

    Abstract: A method for controlling a gap in an electrically conducting solid state structure provided with a gap. The structure is exposed to a fabrication process environment conditions of which are selected to alter an extent of the gap. During exposure of the structure to the process environment, a voltage bias is applied across the gap. Electron tunneling current across the gap is measured during the process environment exposure and the process environment is controlled during process environment exposure based on tunneling current measurement. A method for controlling the gap between electrically conducting electrodes provided on a support structure. Each electrode has an electrode tip separated from other electrode tips by a gap. The electrodes are exposed to a flux of ions causing transport of material of the electrodes to corresponding electrode tips, locally adding material of the electrodes to electrode tips in the gap.

    Abstract translation: 一种用于控制设置有间隙的导电固态结构中的间隙的方法。 该结构暴露于制造工艺环境条件,其条件被选择以改变间隙的程度。 在将结构暴露于工艺环境期间,跨越间隙施加电压偏置。 在工艺环境暴露期间测量跨越间隙的电子隧道电流,并且基于隧道电流测量在工艺环境暴露期间控制工艺环境。 一种用于控制设置在支撑结构上的导电电极之间的间隙的方法。 每个电极具有通过间隙与其它电极尖端分离的电极头。 电极暴露于离子通量,导致电极的材料传输到相应的电极尖端,将电极的材料局部地添加到间隙中的电极尖端。

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