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公开(公告)号：US11635170B2
公开(公告)日：2023-04-25
申请号：US16764308
申请日：2018-11-16
Applicant: RASIRC, Inc.
Inventor： Richard D. Blethen , Jeffrey J. Spiegelman , Russell J. Holmes , Daniel Alvarez, Jr. , Jian Yang , Ericca Lynne Speed
Abstract: Provided herein are methods, systems, and devices incorporating use of materials to store, ship, and deliver process gases to micro-electronics fabrication processes and other critical process applications.
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Patent Agency Ranking
公开(公告)号：US11634816B2
公开(公告)日：2023-04-25
申请号：US16890875
申请日：2020-06-02
Applicant: RASIRC, Inc.
Inventor： Richard D. Blethen , Jeffrey J. Spiegelman , Russell J. Holmes , Daniel Alvarez, Jr. , Jian Yang , Ericca Lynne Speed
Abstract: Provided herein are methods, systems, and devices incorporating use of materials to store, ship, and deliver process gases to micro-electronics fabrication processes and other critical process applications.
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公开(公告)号：US20190309411A1
公开(公告)日：2019-10-10
申请号：US16393123
申请日：2019-04-24
Applicant: RASIRC, Inc.
Inventor： Jeffrey J. Spiegelman , Daniel Alvarez, JR. , Jian Yang , Russell J. Holmes , Edward Heinlein , Christopher Ramos , Jeremiah Trammel
IPC: C23C16/02 , C01B21/068 , C01B21/076 , C23C16/34 , C23C16/455
Abstract: A method and chemical delivery system are provided for low temperature atomic layer deposition. Thus, methods of forming nitrogen-containing thin films by atomic layer deposition using a substantially water free hydrazine gas and plasma treatment are provided.
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公开(公告)号：US20200291520A1
公开(公告)日：2020-09-17
申请号：US16890875
申请日：2020-06-02
Applicant: RASIRC, Inc.
Inventor： Richard D. Blethen , Jeffrey J. Spiegelman , Russell J. Holmes , Daniel Alvarez, Jr. , Jian Yang , Ericca Lynne Speed
IPC: C23C16/455 , C09K13/00 , F17C11/00
Abstract: Provided herein are methods, systems, and devices incorporating use of materials to store, ship, and deliver process gases to micro-electronics fabrication processes and other critical process applications.
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公开(公告)号：US11634815B2
公开(公告)日：2023-04-25
申请号：US16880184
申请日：2020-05-21
Applicant: RASIRC, Inc.
Inventor： Richard D. Blethen , Jeffrey J. Spiegelman , Russell J. Holmes , Daniel Alvarez, Jr. , Jian Yang , Ericca Lynne Speed
Abstract: Provided herein are methods, systems, and devices incorporating use of materials to store, ship, and deliver process gases to micro-electronics fabrication processes and other critical process applications.
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公开(公告)号：US20200291517A1
公开(公告)日：2020-09-17
申请号：US16880184
申请日：2020-05-21
Applicant: RASIRC, Inc.
Inventor： Richard D. Blethen , Jeffrey J. Spiegelman , Russell J. Holmes , Daniel Alvarez, JR. , Jian Yang , Ericca Lynne Speed
IPC: C23C16/455 , C08K5/14 , C08L71/02 , C08L27/18 , C09K13/00
Abstract: Provided herein are methods, systems, and devices incorporating use of materials to store, ship, and deliver process gases to micro-electronics fabrication processes and other critical process applications.
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