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公开(公告)号：US11154792B2
公开(公告)日：2021-10-26
申请号：US15751044
申请日：2016-08-10
Applicant: RASIRC, INC.
Inventor： Jeffrey Spiegelman , Douglas Shepherd , Russell J. Holmes , Zohreh Shamsi
IPC: B01B1/00 , C23C16/448 , A61L2/20 , A61L2/26 , F22B3/02 , H05B1/02 , G03F1/82 , G03F7/42 , H01L21/02
Abstract: Methods for the gas-phase delivery of gases, such as process gases, from the gas phase of a multicomponent source liquid are provided. The methods are generally directed to the generation of process gases having mass flow rates which are proportional to the input power delivered to the multicomponent source liquid containers. The methods may be used to deliver process gases to critical process applications.
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公开(公告)号：US10214420B2
公开(公告)日：2019-02-26
申请号：US15520031
申请日：2015-10-22
Applicant: RASIRC, Inc.
Inventor： Daniel Alvarez, Jr. , Russell J. Holmes , Jeffrey Spiegelman , Edward Heinlein , Christopher Ramos
Abstract: A method and chemical delivery system and device are provided. One method includes contacting a non-aqueous hydrazine solution with a carrier gas and/or vacuum and delivering a gas stream comprising hydrazine to a critical process or application. One chemical delivery system and device includes a non-aqueous hydrazine solution having a vapor phase that is in contact with a carrier gas and/or vacuum. One device includes a chamber for containing a liquid comprising at least one volatile process chemical, such as a non-aqueous hydrazine solution, a hydrogen peroxide solution, or another suitable process chemical, and a head space from which the volatile can be drawn using a carrier gas and/or vacuum. Another method useful in the present invention involves drawing a process chemical from a device as a disclosed herein using a carrier or vacuum and delivering the process chemical to a critical process or application.
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公开(公告)号：US09610550B2
公开(公告)日：2017-04-04
申请号：US14387872
申请日：2013-03-14
Applicant: RASIRC, Inc.
Inventor： Daniel Alvarez, Jr. , Jeffrey Spiegelman , Russell J. Holmes , Edward Heinlein , Zohreh Shamsi
IPC: B01D53/22 , B01F3/02 , C23C16/448 , B01D61/24 , B01D63/02
CPC classification number: B01F3/02 , B01D53/228 , B01D61/246 , B01D63/02 , B01D2258/0216 , C23C16/4481 , Y10T137/0391 , Y10T137/2931
Abstract: A method and chemical delivery system are provided. The method includes providing a vapor phase of a multi-component liquid source. The method further includes contacting a pre-loaded carrier gas with the vapor phase, wherein the pre-loaded carrier gas includes a carrier gas and at least one component of the multi-component liquid source and delivering a gas stream comprising at least one component of the liquid source to a critical process or application, wherein the amount of the component in the carrier gas is sufficient to keep the ratio of components in the multi-component liquid source relatively constant. The chemical delivery system includes a multi-component liquid source having a vapor phase. The system further includes a pre-loaded carrier gas source that is in fluid contact with the vapor phase, wherein the pre-loaded carrier gas includes a carrier gas and at least one component of the liquid source and an apparatus for delivering a gas stream including at least one component of the liquid source, wherein the amount of the component in the pre-loaded carrier gas is sufficient to keep the ratio of components in the multi-component liquid source relatively constant.
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公开(公告)号：US20160348160A1
公开(公告)日：2016-12-01
申请号：US15231355
申请日：2016-08-08
Applicant: RASIRC, Inc.
Inventor： Daniel Alvarez, JR. , Jeffrey J. Spiegelman , Russell J. Holmes , James Hogan
CPC classification number: C12Q1/6848 , A61L2/186 , A61L2/208 , A61L2202/24 , C12Q1/6806 , C12Q2527/125
Abstract: Methods, systems, and devices for decontaminating materials containing biological or biologically derived materials, such as microorganisms or DNA products, are provided. The methods, systems, and devices may be used for decontaminating or sterilizing materials, such as surfaces, including, but not limited to reducing the number of viable microorganisms on surfaces. The methods, systems, and devices may further be used for rendering DNA non-amplifiable in nucleic acid amplification reactions that synthesize DNA amplification products.
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公开(公告)号：US20200291520A1
公开(公告)日：2020-09-17
申请号：US16890875
申请日：2020-06-02
Applicant: RASIRC, Inc.
Inventor： Richard D. Blethen , Jeffrey J. Spiegelman , Russell J. Holmes , Daniel Alvarez, Jr. , Jian Yang , Ericca Lynne Speed
IPC: C23C16/455 , C09K13/00 , F17C11/00
Abstract: Provided herein are methods, systems, and devices incorporating use of materials to store, ship, and deliver process gases to micro-electronics fabrication processes and other critical process applications.
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Patent Agency Ranking
6.发明申请公开(公告)号：US20190247791A1
公开(公告)日：2019-08-15
申请号：US16394380
申请日：2019-04-25
Applicant: RASIRC, Inc.
Inventor： Daniel Alvarez, JR. , Russell J. Holmes , Jeffrey J. Spiegelman , Edward Heinlein , Christopher Ramos
IPC: B01D53/86 , B01J23/889 , B01D53/72 , B01J23/94 , B01J23/00 , B01J38/12 , B01J35/02 , B01J23/46 , B01J23/755 , B01J23/72 , B01D53/30
CPC classification number: B01D53/8696 , B01D53/30 , B01D53/72 , B01D53/8621 , B01D53/8668 , B01D53/8671 , B01D2251/602 , B01D2253/1124 , B01D2255/2073 , B01D2255/20753 , B01D2255/20761 , B01D2257/40 , B01J23/002 , B01J23/468 , B01J23/72 , B01J23/755 , B01J23/8892 , B01J23/94 , B01J35/026 , B01J38/12
Abstract: Provided herein is a device for removing residual hydrogen peroxide or hydrazine from an effluent gas stream which includes a metal oxide scrubber material configured to react with residual process gases under increased temperatures. Also provided are systems and methods of using the same.
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公开(公告)号：US20180229149A1
公开(公告)日：2018-08-16
申请号：US15751044
申请日：2016-08-10
Applicant: RASIRC, INC.
Inventor： Jeffrey Spiegelman , Douglas Shepherd , Russell J. Holmes , Zohreh Shamsi
CPC classification number: B01B1/005 , A61L2/20 , A61L2/208 , A61L2/26 , A61L2202/14 , C23C16/4481 , C23C16/4485 , F22B3/02 , G03F1/82 , G03F7/423 , H01L21/02057 , H01L21/02271 , H05B1/0297
Abstract: Methods for the gas-phase delivery of gases, such as process gases, from the gas phase of a multicomponent source liquid are provided. The methods are generally directed to the generation of process gases having mass flow rates which are proportional to the input power delivered to the multicomponent source liquid containers. The methods may be used to deliver process gases to critical process applications.
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公开(公告)号：US20170369315A1
公开(公告)日：2017-12-28
申请号：US15520031
申请日：2015-10-22
Applicant: RASIRC, Inc.
Inventor： Daniel Alvarez, JR. , Russell J. Holmes , Jeffrey Spiegelman , Edward Heinlein , Christopher Ramos
CPC classification number: C01B21/16 , B01D19/0031 , B01D19/0068 , B01D63/06 , B01D2325/42
Abstract: A method and chemical delivery system and device are provided. One method includes contacting a non-aqueous hydrazine solution with a carrier gas and/or vacuum and delivering a gas stream comprising hydrazine to a critical process or application. One chemical delivery system and device includes a non-aqueous hydrazine solution having a vapor phase that is in contact with a carrier gas and/or vacuum. One device includes a chamber for containing a liquid comprising at least one volatile process chemical, such as a non-aqueous hydrazine solution, a hydrogen peroxide solution, or another suitable process chemical, and a head space from which the volatile can be drawn using a carrier gas and/or vacuum. Another method useful in the present invention involves drawing a process chemical from a device as a disclosed herein using a carrier or vacuum and delivering the process chemical to a critical process or application.
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9.发明申请公开(公告)号：US20170312687A1
公开(公告)日：2017-11-02
申请号：US15582271
申请日：2017-04-28
Applicant: RASIRC, Inc.
Inventor： Daniel Alvarez, JR. , Russell J. Holmes , Jeffrey J. Spiegelman , Edward Heinlein , Christopher Ramos
IPC: B01D53/86 , B01J35/00 , B01J23/889 , B01J23/72 , B01J23/46 , B01J21/04 , B01J35/02 , B01J38/12 , B01J23/755
Abstract: Provided herein is a device for removing residual hydrogen peroxide or hydrazine from an effluent gas stream which includes a metal oxide scrubber material configured to react with residual process gases under increased temperatures. Also provided are systems and methods of using the same.
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公开(公告)号：US11635170B2
公开(公告)日：2023-04-25
申请号：US16764308
申请日：2018-11-16
Applicant: RASIRC, Inc.
Inventor： Richard D. Blethen , Jeffrey J. Spiegelman , Russell J. Holmes , Daniel Alvarez, Jr. , Jian Yang , Ericca Lynne Speed
Abstract: Provided herein are methods, systems, and devices incorporating use of materials to store, ship, and deliver process gases to micro-electronics fabrication processes and other critical process applications.
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