METHOD FOR MANUFACTURING AN ELECTRONIC ASSEMBLY AND AN ELECTRONIC ASSEMBLY

    公开(公告)号:US20190389106A1

    公开(公告)日:2019-12-26

    申请号:US16561213

    申请日:2019-09-05

    Applicant: TactoTek Oy

    Abstract: A method, for manufacturing an electronic assembly, such as an antenna or a capacitive sensing device or a coupled inductor, comprising at least a first electrically conductive element and a second electrically conductive element is presented. The method comprises obtaining said electrically conductive elements, such as patch elements, arranging said electrically conductive elements, such as inside of a cavity defined by a mold structure, at a pre-defined distance from each other for establishing an electromagnetic coupling between said electrically conductive elements, and molding, such as injection molding, a molding material layer at least between said electrically conductive elements, wherein the molding material layer has a thickness between said electrically conductive elements defined by the pre-defined distance. In addition, electronic assemblies, antennas, capacitive sensing devices and coupled inductors are presented.

    INTEGRATED FUNCTIONAL MULTILAYER STRUCTURE AND METHOD OF MANUFACTURE THEREFOR

    公开(公告)号:US20210195731A1

    公开(公告)日:2021-06-24

    申请号:US16724631

    申请日:2019-12-23

    Applicant: TACTOTEK OY

    Abstract: A method of manufacture and an integrated functional multilayer structure, includes a substrate film formed or formable so as to exhibit a selected shape; and a number of functional, preferably including optical, mechanical, optoelectrical, electrical and/or specifically, electronic, elements, such as conductors, insulators, components and/or integrated circuits, provided upon the substrate film in the proximity of the shape; wherein the substrate film has further been provided with a structural tuning element, optionally including an elongated, circumferential or other selected shape, said structural tuning element being configured to locally control induced deformation, optionally including stretching, bending, compression and/or shearing, of the substrate film within said proximity of the shape.

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