公开(公告)号：US20160358829A1

公开(公告)日：2016-12-08

申请号：US15171240

申请日：2016-06-02

Applicant: Tokyo Electron Limited

Inventor： Masato HAYASHI ,  Kohei NOGUCHI ,  Kenji IIZUKA ,  Naruaki IIDA

IPC: H01L21/66 ,  G03F7/16 ,  B08B3/08 ,  B08B9/032 ,  H01L21/67 ,  G01N21/85

CPC classification number: H01L22/10 ,  G01N21/85 ,  G01N2021/8578 ,  G03F7/16 ,  G03F7/162 ,  H01L21/0273 ,  H01L21/67253

Abstract: An apparatus includes: measurement flow passage portions as part of a respective plurality of supply paths of fluids to be supplied to a substrate, the measurement flow passage portions constituting measurement regions for measurement of foreign matter in the fluids, and being disposed so as to form a row with each other; a light irradiating unit configured to form an optical path in one of the flow passage portions, the light irradiating unit being shared by the plurality of flow passage portions; a moving mechanism configured to move the light irradiating unit relatively along a direction of arrangement of the flow passage portions to form the optical path within the flow passage portion selected among the plurality of flow passage portions; a light receiving unit including a light receiving element, the light receiving element receiving light transmitted by the flow passage portion; and a detecting unit configured to detect foreign matter in the fluid on a basis of a signal output from the light receiving element. Consequently, the number of necessary light irradiating units can be reduced, and the apparatus can be miniaturized.

Abstract translation: 一种装置，包括：作为供给到基板的流体的多个供给路径的一部分的测定流路部，构成测定流体中异物的测定区域的测量流路部， 相互排列; 光照射单元，被配置为在所述流路部分之一中形成光路，所述光照射单元由所述多个流路部分共享; 移动机构，其构造成沿着所述流路部的配置方向相对移动所述光照射单元，以在所述多个流路部中选择的流路部内形成光路; 光接收单元，其包括受光元件，所述光接收元件接收由所述流路部分透射的光; 以及检测单元，被配置为基于从所述光接收元件输出的信号来检测所述流体中的异物。 因此，可以减少必要的光照射单元的数量，并且可以使该装置小型化。

公开(公告)号：US20240402609A1

公开(公告)日：2024-12-05

申请号：US18673751

申请日：2024-05-24

Applicant: Tokyo Electron Limited

Inventor： Kenji IIZUKA ,  Koji USHIMARU ,  Kazuhiko OOSHIMA ,  Kei MIYAZAKI ,  Yuichi TERASHITA ,  Yukinobu OTSUKA ,  Katsuhiro IKEDA ,  Ryohei FUJISE

IPC: G03F7/36 ,  G03F7/00

Abstract: A developing apparatus for developing a substrate having a coating film of a metal-containing resist formed thereon, includes: a heating part configured to support and heat the substrate; a chamber configured to cover the heating part and form a treatment space above the heating part; a gas supplier to which a developing gas containing acid is supplied; and a dispersion mechanism configured to disperse the developing gas supplied to the gas supplier and discharge the developing gas to the treatment space from a plurality of discharge ports formed at positions above the heating part.