公开(公告)号：US11550082B2

公开(公告)日：2023-01-10

申请号：US16471360

申请日：2017-12-21

Applicant: MAX-PLANCK-GESELLSCHAFT ZUR FÖRDERUNG DER WISSENSCHAFTEN E.V. ,  MEDIA LARIO S.R.L.

Inventor： Masahiro Teshima ,  Razmik Mirzoyan ,  Guiseppe Valsecchi ,  Robert Banham

IPC: G02B5/10 ,  F24S23/70 ,  B32B17/10 ,  G02B5/08

Abstract: A mirror includes a carrier, a reflecting layer disposed above a main face of the carrier, and a transparent layer disposed above the reflective layer. The carrier includes a base body, and the base body includes one or more of a material comprising a density in a range from 0.1 to 1.0 g/cm3, a porous material, a foamed material, a material comprising a structure containing closed cells, a material comprising a honeycomb structure, or a structure containing carbon fibers.

公开(公告)号：US20220331836A1

公开(公告)日：2022-10-20

申请号：US17634472

申请日：2020-08-13

Applicant: ISTITUTO NAZIONALE DI ASTROFISICA ,  POLITECNICO DI MILANO ,  MEDIA LARIO S.R.L.

Inventor： Giovanni PARESCHI ,  Marta MAria CIVITANI ,  Giorgia SIRONI ,  Giuseppe VALSECCHI ,  Luca MAGAGNIN ,  Eugenio GIBERTINI

IPC: B05D5/06 ,  G21K1/06 ,  B05D7/24 ,  B05D3/06

Abstract: A method for applying a carbon-based reflective overcoating on a grazing incidence optical unit comprising a substrate and a coating of a high-density material chosen from the group comprising gold, platinum, iridium, palladium, rhodium, ruthenium, chrome and nickel or a low-density material such as carbon or B4C; the method comprises the step of treating the optical unit with a solution or gaseous phase containing at least one polymer precursor material to create the overcoating through absorption of the polymer material on the coating.

公开(公告)号：US20170233281A1

公开(公告)日：2017-08-17

申请号：US15519122

申请日：2015-10-12

Applicant: MEDIA LARIO S.R.L.

Inventor： Robert David BANHAM ,  Giuseppe VALSECCHI ,  Oberto CITTERIO

IPC: C03B23/035 ,  C03C27/04 ,  G02B5/10 ,  B29D11/00

Abstract: A process for forming an article having at least one precision surface is disclosed. The process includes providing a thin sheet in contact with a surface of a mandrel. The process then includes establishing a pressure differential between opposite sides of the thin sheet using a collapsible enclosure so that the thin sheet is drawn onto the mandrel surface, thereby causing the thin sheet to substantially conform to the shape of the mandrel surface. The shaped thin sheet is then secured to a support member to define the article. The article is then removed from the mandrel. The front surface of the thin sheet defines the precision surface of the article. A process for forming a dual-sided precision article is also disclosed, along with an adaptive optical system and method that employs the precision article.

公开(公告)号：US20160007435A1

公开(公告)日：2016-01-07

申请号：US14325193

申请日：2014-07-07

Applicant: Media Lario S.R.L.

Inventor： Raymond Merrill, JR. ,  Natale Ceglio ,  Daniel Stearns

IPC: H05G2/00

CPC classification number: H05G2/008 ,  G03F7/2039 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/7055 ,  G03F7/70916 ,  H05G2/003 ,  H05G2/005

Abstract: Systems and methods for synchronous operation of debris-mitigation devices (DMDs) in an EUV radiation source that emits EUV radiation and debris particles are disclosed. The methods include establishing a select relative angular orientation between the first and second DMDs that provides a maximum amount of transmission of EUV radiation between respective first and second rotatable vanes of the first and second DMDs. The methods also include rotating the first and second sets of vanes to capture at least some of the debris particles while substantially maintaining the select relative angular orientation. The systems employ DMD drive units, and an optical-based encoder disc in one of the DMD drive units measures and controls the rotational speed of the rotatable DMD vanes. Systems and methods for optimally aligning the DMDs are also disclosed.

Abstract translation: 公开了在发射EUV辐射和碎屑颗粒的EUV辐射源中同步操作碎片减轻装置（DMD）的系统和方法。 所述方法包括在第一和第二DMD之间建立选择的相对角度取向，其提供在第一和第二DMD的相应的第一和第二可旋转叶片之间的EUV辐射的最大传输量。 所述方法还包括旋转第一组叶片和第二组叶片以捕获碎片颗粒中的至少一些，同时基本保持选择的相对角度取向。 该系统采用DMD驱动单元，并且其中一个DMD驱动单元中的基于光学的编码器盘测量并控制可旋转的DMD叶片的旋转速度。 还公开了用于最佳对准DMD的系统和方法。

公开(公告)号：US20140043595A1

公开(公告)日：2014-02-13

申请号：US14056654

申请日：2013-10-17

Applicant: Media Lario, S.R.L.

Inventor： Natale M. Ceglio ,  Gopal Vasudevan

IPC: G03F7/20 ,  G02B5/08

CPC classification number: G03F7/70008 ,  G02B5/0891 ,  G02B5/10 ,  G02B5/208 ,  G02B27/0927 ,  G02B27/0983 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70175

Abstract: A collector system for extreme ultraviolet (EUV) radiation includes a collector mirror and a radiation-collection enhancement device (RCED) arranged adjacent an aperture member of an illuminator. The collector mirror directs EUV radiation from an EUV radiation source towards the aperture member. The RCED redirects a portion of the EUV radiation that would not otherwise pass through the aperture of the aperture member or that would not have an optimum angular distribution, to pass through the aperture and to have an improved angular distribution better suited to input specifications of an illuminator. This provides the illuminator with greater amount of useable EUV radiation than would otherwise be available from the collector mirror alone, thereby enhancing the performing of an EUV lithography system that uses such a collector system with a RCED.

公开(公告)号：US07322708B2

公开(公告)日：2008-01-29

申请号：US10496935

申请日：2002-11-27

Applicant: Carlos Alberto Valenzuela ,  Miriam Noemi Valenzuela

Inventor： Carlos Alberto Valenzuela ,  Miriam Noemi Valenzuela

IPC: G02B5/08

CPC classification number: G02B7/182

Abstract: The invention relates to a mirror (1), for use in optical imaging systems, whereby the mirror is connected at the edge thereof to a reinforcing element (3), at least partly surrounding the mirror and the reinforcing element also fixes the relative position of the mirror with regard to a further optical element (4). Positioning means (5) are arranged on the reinforcing element, cooperating with positioning means (7), arranged on further optical elements. The optical imaging system in particular concerns a telescope for optical transmission techniques.

Abstract translation: 本发明涉及一种用于光学成像系统的反射镜（1），其中反射镜在其边缘处连接到至少部分地围绕反射镜的加强元件（3），并且加强元件还将相对位置 关于另一光学元件（4）的镜子。 定位装置（5）布置在加强元件上，与定位装置（7）配合，布置在另外的光学元件上。 光学成像系统特别涉及用于光学传输技术的望远镜。

公开(公告)号：US12138656B2

公开(公告)日：2024-11-12

申请号：US17634472

申请日：2020-08-13

Applicant: ISTITUTO NAZIONALE DI ASTROFISICA ,  POLITECNICO DI MILANO ,  MEDIA LARIO S.R.L.

Inventor： Giovanni Pareschi ,  Marta Maria Civitani ,  Giorgia Sironi ,  Giuseppe Valsecchi ,  Luca Magagnin ,  Eugenio Gibertini

IPC: B05D5/06 ,  B05D3/06 ,  B05D7/24 ,  G21K1/06

Abstract: A method for applying a carbon-based reflective overcoating on a grazing incidence optical unit comprising a substrate and a coating of a high-density material chosen from the group comprising gold, platinum, iridium, palladium, rhodium, ruthenium, chrome and nickel or a low-density material such as carbon or B4C; the method comprises the step of treating the optical unit with a solution or gaseous phase containing at least one polymer precursor material to create the overcoating through absorption of the polymer material on the coating.

公开(公告)号：US09057962B2

公开(公告)日：2015-06-16

申请号：US13691804

申请日：2012-12-02

Applicant: Natale M. Ceglio ,  Giovanni Nocerino ,  Fabio Zocchi

Inventor： Natale M. Ceglio ,  Giovanni Nocerino ,  Fabio Zocchi

IPC: G03F7/20 ,  G21K1/06

CPC classification number: G03F7/70033 ,  G03F7/2004 ,  G21K1/067 ,  G21K2201/064

Abstract: A source-collector module for an extreme ultraviolet (EUV) lithography system, the module including a laser-produced plasma (LPP) that generates EUV radiation and a grazing-incidence collector (GIC) mirror arranged relative thereto and having an input end and an output end. The LPP is formed using an LPP target system wherein a pulsed laser beam travels on-axis through the GIC and is incident upon solid, moveable LPP target. The GIC mirror is arranged relative to the LPP to receive the EUV radiation therefrom at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. An example GIC mirror design is presented that includes a polynomial surface-figure correction to compensate for GIC shell thickness effects, thereby improve far-field imaging performance.

Abstract translation: 一种用于极紫外（EUV）光刻系统的源极收集器模块，该模块包括产生EUV辐射的激光产生等离子体（LPP）和相对于其放置的放射入射收集器（GIC）反射镜，并且具有输入端和 输出端。 LPP使用LPP目标系统形成，其中脉冲激光束在轴上行进通过GIC并入射到固体，可移动的LPP靶上。 GIC反射镜相对于LPP布置，以在其输入端接收EUV辐射，并将接收的EUV辐射聚焦在邻近输出端的中间焦点。 提出了一个示例GIC镜面设计，其中包括一个多项式曲面图校正，以补偿GIC外壳厚度效应，从而提高远场成像性能。

公开(公告)号：US08686381B2

公开(公告)日：2014-04-01

申请号：US12803461

申请日：2010-06-28

Applicant: Richard Levesque ,  Natale M. Ceglio ,  Giovanni Nocerino ,  Fabio Zocchi

Inventor： Richard Levesque ,  Natale M. Ceglio ,  Giovanni Nocerino ,  Fabio Zocchi

IPC: H05G2/00

CPC classification number: G21K1/067 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70175 ,  H05G2/005

Abstract: A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates Sn vapor from a Sn vapor source of the target portion. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device may be used to increase the amount of EUV radiation provided to the intermediate focus. An EUV lithography system that utilizes the SOCOMO is also disclosed.

Abstract translation: 用于产生发射EUV辐射的激光产生等离子体（LPP）的源极集电极模块（SOCOMO）以及相对于LPP布置并具有输入端和输出端的掠入射收集器（GIC）反射镜。 使用具有光源部和目标部的LPP靶系统形成LPP，其中来自光源部的脉冲激光束从目标部的Sn蒸气源照射Sn蒸气。 GIC反射镜相对于LPP布置以在其输入端接收EUV辐射，并将接收的EUV辐射聚焦在邻近输出端的中间焦点。 可以使用辐射收集增强装置来增加提供给中间聚焦的EUV辐射的量。 还公开了利用SOCOMO的EUV光刻系统。

公开(公告)号：US08594277B2

公开(公告)日：2013-11-26

申请号：US12735525

申请日：2009-01-28

Applicant: Fabio Zocchi ,  Pietro Binda ,  Enrico Benedetti

Inventor： Fabio Zocchi ,  Pietro Binda ,  Enrico Benedetti

IPC: G21K1/06

CPC classification number: G03F7/70166 ,  G21K1/06 ,  G21K2201/064

Abstract: A collector optical system for EUV and X-ray applications is disclosed, wherein the system includes a plurality of mirrors arranged in a nested configuration that is symmetric about an optical axis. The mirrors have first and second reflective surfaces that provide successive grazing incidence reflections of radiation from a radiation source. The first and second reflective surfaces have a corrective shape that compensates for high spatial frequency variations in the far field intensity distribution of the radiation.

Abstract translation: 公开了一种用于EUV和X射线应用的收集器光学系统，其中所述系统包括以嵌套配置布置的关于光轴对称的多个反射镜。 反射镜具有第一和第二反射表面，其提供来自辐射源的辐射的连续掠入射反射。 第一和第二反射表面具有补偿辐射的远场强度分布中的高空间频率变化的校正形状。