中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

17 records (took 0.017 seconds)

    PROCESS FOR FORMING AN ARTICLE WITH A PRECISION SURFACE
    5.
    发明申请
    PROCESS FOR FORMING AN ARTICLE WITH A PRECISION SURFACE 审中-公开

    公开(公告)号：US20170233281A1

    公开(公告)日：2017-08-17

    申请号：US15519122

    申请日：2015-10-12

    Applicant: MEDIA LARIO S.R.L.

    Inventor： Robert David BANHAM ,  Giuseppe VALSECCHI ,  Oberto CITTERIO

    IPC: C03B23/035 ,  C03C27/04 ,  G02B5/10 ,  B29D11/00

    Abstract: A process for forming an article having at least one precision surface is disclosed. The process includes providing a thin sheet in contact with a surface of a mandrel. The process then includes establishing a pressure differential between opposite sides of the thin sheet using a collapsible enclosure so that the thin sheet is drawn onto the mandrel surface, thereby causing the thin sheet to substantially conform to the shape of the mandrel surface. The shaped thin sheet is then secured to a support member to define the article. The article is then removed from the mandrel. The front surface of the thin sheet defines the precision surface of the article. A process for forming a dual-sided precision article is also disclosed, along with an adaptive optical system and method that employs the precision article.

    SYSTEMS AND METHODS FOR SYNCHRONOUS OPERATION OF DEBRIS-MITIGATION DEVICES
    6.
    发明申请
    SYSTEMS AND METHODS FOR SYNCHRONOUS OPERATION OF DEBRIS-MITIGATION DEVICES 有权
    减震装置同步运行的系统和方法

    公开(公告)号：US20160007435A1

    公开(公告)日：2016-01-07

    申请号：US14325193

    申请日：2014-07-07

    Applicant: Media Lario S.R.L.

    Inventor： Raymond Merrill, JR. ,  Natale Ceglio ,  Daniel Stearns

    IPC: H05G2/00

    CPC classification number: H05G2/008 ,  G03F7/2039 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/7055 ,  G03F7/70916 ,  H05G2/003 ,  H05G2/005

    Abstract: Systems and methods for synchronous operation of debris-mitigation devices (DMDs) in an EUV radiation source that emits EUV radiation and debris particles are disclosed. The methods include establishing a select relative angular orientation between the first and second DMDs that provides a maximum amount of transmission of EUV radiation between respective first and second rotatable vanes of the first and second DMDs. The methods also include rotating the first and second sets of vanes to capture at least some of the debris particles while substantially maintaining the select relative angular orientation. The systems employ DMD drive units, and an optical-based encoder disc in one of the DMD drive units measures and controls the rotational speed of the rotatable DMD vanes. Systems and methods for optimally aligning the DMDs are also disclosed.

    Abstract translation: 公开了在发射EUV辐射和碎屑颗粒的EUV辐射源中同步操作碎片减轻装置（DMD）的系统和方法。 所述方法包括在第一和第二DMD之间建立选择的相对角度取向，其提供在第一和第二DMD的相应的第一和第二可旋转叶片之间的EUV辐射的最大传输量。 所述方法还包括旋转第一组叶片和第二组叶片以捕获碎片颗粒中的至少一些，同时基本保持选择的相对角度取向。 该系统采用DMD驱动单元，并且其中一个DMD驱动单元中的基于光学的编码器盘测量并控制可旋转的DMD叶片的旋转速度。 还公开了用于最佳对准DMD的系统和方法。

    EUV collector system with enhanced EUV radiation collection
    7.
    发明申请
    EUV collector system with enhanced EUV radiation collection 有权

    公开(公告)号：US20140043595A1

    公开(公告)日：2014-02-13

    申请号：US14056654

    申请日：2013-10-17

    Applicant: Media Lario, S.R.L.

    Inventor： Natale M. Ceglio ,  Gopal Vasudevan

    IPC: G03F7/20 ,  G02B5/08

    CPC classification number: G03F7/70008 ,  G02B5/0891 ,  G02B5/10 ,  G02B5/208 ,  G02B27/0927 ,  G02B27/0983 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70175

    Abstract: A collector system for extreme ultraviolet (EUV) radiation includes a collector mirror and a radiation-collection enhancement device (RCED) arranged adjacent an aperture member of an illuminator. The collector mirror directs EUV radiation from an EUV radiation source towards the aperture member. The RCED redirects a portion of the EUV radiation that would not otherwise pass through the aperture of the aperture member or that would not have an optimum angular distribution, to pass through the aperture and to have an improved angular distribution better suited to input specifications of an illuminator. This provides the illuminator with greater amount of useable EUV radiation than would otherwise be available from the collector mirror alone, thereby enhancing the performing of an EUV lithography system that uses such a collector system with a RCED.

    Process for manufacturing an athermal low cost telescope based on high precision replication technology, and such telescope
    8.
    发明授权
    Process for manufacturing an athermal low cost telescope based on high precision replication technology, and such telescope 有权

    公开(公告)号：US12292562B2

    公开(公告)日：2025-05-06

    申请号：US17433936

    申请日：2020-02-17

    Applicant: MEDIA LARIO S.R.L.

    Inventor： Robert David Banham ,  Giuseppe Valsecchi ,  Fabio Marioni

    IPC: G02B23/10 ,  G02B5/08

    Abstract: A manufacturing method creates a type of telescope which is athermal, lightweight, optical quality for visible and IR applications. The method includes: a) optical mirrors being made by immersing a master, that is an optical component with a curvature opposite to the mirror required into an electrolytic bath where the applied current transfers metal ions and deposit them on the master, the cathode, as a layer, b) the layer being bonded by an adhesive, solder or any other attachment process to a mechanical reinforcing structure, c) after the hardening of the bond or glue, the thin layer being finally released from the master and having maintained the optical quality of the master. The master or mandrel can be cleaned and reused for repeating this method and manufacturing large series of telescopes.

    Sn vapor EUV LLP source system for EUV lithography
    9.
    发明授权
    Sn vapor EUV LLP source system for EUV lithography 有权
    用于EUV光刻的Sn蒸气EUV LLP源系统

    公开(公告)号：US09585236B2

    公开(公告)日：2017-02-28

    申请号：US14260306

    申请日：2014-04-24

    Applicant: Media Lario S.R.L.

    Inventor： Natale M. Ceglio ,  Daniel Stearns ,  Richard Levesque

    IPC: H05G2/00 ,  G03F7/20

    CPC classification number: H05G2/005 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/006 ,  H05G2/008

    Abstract: A Sn vapor EUV LLP source system for EUV lithography is disclosed. The system generates a Sn vapor column from a supply of Sn liquid. The Sn column has a Sn-atom density of

    Abstract translation: 公开了一种用于EUV光刻的Sn蒸气EUV LLP源系统。 该系统从Sn液体供应产生Sn蒸气柱。 Sn柱的Sn原子密度<1019 atoms / cm3，以声速或接近声速行进。 该系统还具有一个Sn蒸汽冷凝器，其布置成接收Sn蒸气柱并冷凝Sn蒸气以形成再循环的Sn液体。 脉冲激光照射Sn蒸气柱的一部分。 每个脉冲产生电子密度<1019电子/ cm 3的低密度Sn等离子体，从而允许低密度Sn等离子体基本上各向同性地发射EUV辐射。

Patent Agency Ranking