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公开(公告)号：US07838856B2
公开(公告)日：2010-11-23
申请号：US12265825
申请日：2008-11-06
Applicant: James M. Pinchot
Inventor： James M. Pinchot
IPC: G21F5/00 , G01N23/201
CPC classification number: G01N23/201 , B22F2998/00 , G21F5/00 , G21K1/00 , G21K1/02 , G21K1/025 , G21K2201/00 , B22F3/008
Abstract: A collimator that formed from a plurality of metal layers that are shaped by use of lithographic techniques in specific shapes. The formed metal layers are stacked and aligned together and then connected together to form the collimator.
Abstract translation: 由通过使用特定形状的光刻技术成形的多个金属层形成的准直器。 形成的金属层被堆叠并对齐在一起，然后连接在一起以形成准直器。
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公开(公告)号：US07268358B2
公开(公告)日：2007-09-11
申请号：US11445850
申请日：2006-06-01
Applicant: Chang-Ming Ma , Eugene S. Fourkal
Inventor： Chang-Ming Ma , Eugene S. Fourkal
CPC classification number: A61N5/1031 , A61N5/1043 , A61N2005/1087 , A61N2005/1088 , G21K5/04 , G21K2201/00
Abstract: Methods of optimizing a laser-accelerated proton radiation dose to a targeted region are disclosed. Disclosed methods include providing a plurality of modulated polyenergetic proton beamlets and irradiating the targeted region with the plurality of modulated beamlets.
Abstract translation: 公开了将目标区域的激光加速质子辐射剂量优化的方法。 公开的方法包括提供多个调制的多能子质子子束并用多个调制子束照射目标区域。
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公开(公告)号：US09305746B2
公开(公告)日：2016-04-05
申请号：US14151151
申请日：2014-01-09
Applicant: TEL Epion Inc.
Inventor： Robert K. Becker , Avrum Freytsis
CPC classification number: H01J37/3002 , G21K2201/00 , H01J37/08 , H01J37/30 , H01J2237/006 , H01J2237/061 , H01J2237/0812 , Y10T29/49769 , Y10T29/49826
Abstract: A method of assembling a nozzle/skimmer module includes coupling a nozzle assembly and skimmer cartridge assembly in a rigid tandem configuration to more accurately control the formation of the Gas Cluster Ion Beam (GCIB). The nozzle/skimmer module is pre-aligned before installation in a production GCIB processing system to more accurately position the GCIB.
Abstract translation: 组装喷嘴/撇渣器模块的方法包括以刚性串联构造联接喷嘴组件和撇渣器组件以更准确地控制气体簇离子束（GCIB）的形成。 喷嘴/撇渣器模块在安装到生产GCIB处理系统之前进行预对准，以更准确地定位GCIB。
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公开(公告)号：US20100178602A1
公开(公告)日：2010-07-15
申请号：US12683158
申请日：2010-01-06
Applicant: Isamu Seto , Yoshio Suzaki , Masamichi Kuwabara
Inventor： Isamu Seto , Yoshio Suzaki , Masamichi Kuwabara
IPC: H01J37/147 , G21K5/04 , G21K1/08 , G03F7/20
CPC classification number: H01J37/3177 , B82Y10/00 , B82Y40/00 , G21K1/025 , G21K1/08 , G21K2201/00
Abstract: A charged particle beam writing apparatus includes an aperture array configured to be capable of forming a plurality of charged particle beams using a plurality of openings, an element array including a plurality of main elements and a plurality of auxiliary elements different from the main elements, and a control unit configured to acquire information associated with a defect of the plurality of main elements and control the element array in accordance with the information, wherein the control unit controls the element array such that only the main elements are used when there is no defect, while when there is a main element having a defect, an auxiliary element is used without using the main element having the defect.
Abstract translation: 带电粒子束写入装置包括孔阵列，其被构造成能够使用多个开口形成多个带电粒子束，元件阵列包括多个主要元件和与主要元件不同的多个辅助元件，以及 控制单元，其被配置为获取与所述多个主要元件的缺陷相关联的信息，并且根据所述信息来控制所述元件阵列，其中所述控制单元控制所述元件阵列，使得当没有缺陷时仅使用所述主要元件， 而当存在具有缺陷的主元件时，使用辅助元件而不使用具有缺陷的主元件。
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公开(公告)号：US20070034812A1
公开(公告)日：2007-02-15
申请号：US11445850
申请日：2006-06-01
Applicant: Chang-Ming Ma , Eugene Fourkal
Inventor： Chang-Ming Ma , Eugene Fourkal
IPC: H01J37/08
CPC classification number: A61N5/1031 , A61N5/1043 , A61N2005/1087 , A61N2005/1088 , G21K5/04 , G21K2201/00
Abstract: Methods of optimizing a laser-accelerated proton radiation dose to a targeted region are disclosed. Disclosed methods include providing a plurality of modulated polyenergetic proton beamlets and irradiating the targeted region with the plurality of modulated beamlets.
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Patent Agency Ranking
公开(公告)号：US09770604B2
公开(公告)日：2017-09-26
申请号：US14574754
申请日：2014-12-18
Applicant: Mitsubishi Electric Corporation
Inventor： Takaaki Iwata
CPC classification number: A61N5/1081 , A61N5/10 , A61N5/1031 , A61N5/1044 , A61N5/1045 , A61N5/1048 , A61N2005/1087 , A61N2005/1095 , G21K1/043 , G21K1/10 , G21K2201/00
Abstract: When IMRT technology for a radiation therapy system utilizing an X-ray or the like is applied to a particle beam therapy system having a conventional wobbler system, it is required to utilize two or more boluses. The present invention solves the problem of excess irradiation in IMRT by a particle beam therapy system. More specifically, the problem of excess irradiation in IMRT by a particle beam therapy system is solved by raising the irradiation flexibility in the depth direction, without utilizing a bolus. A particle beam irradiation apparatus has a scanning irradiation system that performs scanning with a charged particle beam accelerated by an accelerator and is mounted in a rotating gantry for rotating the irradiation direction of the charged particle beam. The particle beam irradiation apparatus comprises a columnar-irradiation-field generation apparatus that generates a columnar irradiation field by enlarging the Bragg peak of the charged particle beam.
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公开(公告)号：US08624205B2
公开(公告)日：2014-01-07
申请号：US12683158
申请日：2010-01-06
Applicant: Isamu Seto , Yoshio Suzaki , Masamichi Kuwabara
Inventor： Isamu Seto , Yoshio Suzaki , Masamichi Kuwabara
IPC: H01J37/147 , G21K5/04 , G21K1/08 , G03F7/20
CPC classification number: H01J37/3177 , B82Y10/00 , B82Y40/00 , G21K1/025 , G21K1/08 , G21K2201/00
Abstract: A charged particle beam writing apparatus includes an aperture array configured to be capable of forming a plurality of charged particle beams using a plurality of openings, an element array including a plurality of main elements and a plurality of auxiliary elements different from the main elements, and a control unit configured to acquire information associated with a defect of the plurality of main elements and control the element array in accordance with the information, wherein the control unit controls the element array such that only the main elements are used when there is no defect, while when there is a main element having a defect, an auxiliary element is used without using the main element having the defect.
Abstract translation: 带电粒子束写入装置包括孔阵列，其被构造成能够使用多个开口形成多个带电粒子束，元件阵列包括多个主要元件和与主要元件不同的多个辅助元件，以及 控制单元，其被配置为获取与所述多个主要元件的缺陷相关联的信息，并且根据所述信息来控制所述元件阵列，其中所述控制单元控制所述元件阵列，使得当没有缺陷时仅使用所述主要元件， 而当存在具有缺陷的主元件时，使用辅助元件而不使用具有缺陷的主元件。
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8.发明授权Apparatus for and method of withdrawing ions in EUV light production apparatus 有权EUV光产生装置中离子离子的设备和方法公开(公告)号：US08492738B2
公开(公告)日：2013-07-23
申请号：US13465108
申请日：2012-05-07
Applicant: Yoshifumi Ueno , Osamu Wakabayashi , Tamotsu Abe , Akira Sumitani , Hideo Hoshino , Akira Endo , Georg Soumagne
Inventor： Yoshifumi Ueno , Osamu Wakabayashi , Tamotsu Abe , Akira Sumitani , Hideo Hoshino , Akira Endo , Georg Soumagne
IPC: H01J1/50
CPC classification number: H05G2/003 , G03F7/70033 , G03F7/70858 , G03F7/70916 , G03F7/70983 , G21K1/093 , G21K2201/00 , H05G2/005 , H05G2/008
Abstract: An ion withdrawal apparatus that withdraws ions emitted from a plasma in an EUV light production apparatus in which a target at an EUV light production point is irradiated with laser light to be made in a plasma state and the target emits EUV light, the ion withdrawal apparatus which includes: a collector mirror that is disposed in a direction opposite to a laser light incidence direction to collect the EUV light and has a hole for the ions to pass therethrough; magnetic line of force production means that produces a magnetic line of force that is parallel or approximately parallel to the laser light incidence direction at or in the vicinity of the EUV light production point; and ion withdrawal means that is disposed on the opposite side of the collector mirror from the EUV light production point and withdraws the ions.
Abstract translation: 一种离子提取装置，其在EUV光产生装置中从在等离子体状态的激光照射EUV光产生点的靶，并且靶射出EUV光的EUV光产生装置中，从等离子体发射的离子， 其包括：收集器反射镜，其设置在与激光入射方向相反的方向上以收集EUV光，并具有用于离子通过的孔; 磁力线产生装置意味着产生在EUV光产生点处或附近平行或近似平行于激光入射方向的磁力线; 以及离开收集反射镜与EUV光产生点相反的一侧的离子提取装置，并且离子退出。
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9.发明申请APPARATUS FOR AND METHOD OF WITHDRAWING IONS IN EUV LIGHT PRODUCTION APPARATUS 有权在EUV光生产设备中放置离子的方法和方法公开(公告)号：US20120217414A1
公开(公告)日：2012-08-30
申请号：US13465108
申请日：2012-05-07
Applicant: Yoshifumi UENO , Osamu WAKABAYASHI , Tamotsu ABE , Akira SUMITANI , Hideo HOSHINO , Akira ENDO , Georg SOUMAGNE
Inventor： Yoshifumi UENO , Osamu WAKABAYASHI , Tamotsu ABE , Akira SUMITANI , Hideo HOSHINO , Akira ENDO , Georg SOUMAGNE
IPC: H01J1/50
CPC classification number: H05G2/003 , G03F7/70033 , G03F7/70858 , G03F7/70916 , G03F7/70983 , G21K1/093 , G21K2201/00 , H05G2/005 , H05G2/008
Abstract: An ion withdrawal apparatus that withdraws ions emitted from a plasma in an EUV light production apparatus in which a target at an EUV light production point is irradiated with laser light to be made in a plasma state and the target emits EUV light, the ion withdrawal apparatus which includes: a collector mirror that is disposed in a direction opposite to a laser light incidence direction to collect the EUV light and has a hole for the ions to pass therethrough; magnetic line of force production means that produces a magnetic line of force that is parallel or approximately parallel to the laser light incidence direction at or in the vicinity of the EUV light production point; and ion withdrawal means that is disposed on the opposite side of the collector mirror from the EUV light production point and withdraws the ions.
Abstract translation: 一种离子提取装置，其在EUV光产生装置中从在等离子体状态的激光照射EUV光产生点的靶，并且靶射出EUV光的EUV光产生装置中，从等离子体发射的离子， 其包括：收集器反射镜，其设置在与激光入射方向相反的方向上以收集EUV光，并具有用于离子通过的孔; 磁力线产生装置意味着产生在EUV光产生点处或附近平行或近似平行于激光入射方向的磁力线; 以及离开收集反射镜与EUV光产生点相反的一侧的离子提取装置，并且离子退出。
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公开(公告)号：US20100207016A1
公开(公告)日：2010-08-19
申请号：US12600825
申请日：2008-05-19
Applicant: Sterling Eduardo McBride , Steven Alan Lipp , Joey John Michalchuk , Dana Z. Anderson , Evan Salim , Matthew Squires
Inventor： Sterling Eduardo McBride , Steven Alan Lipp , Joey John Michalchuk , Dana Z. Anderson , Evan Salim , Matthew Squires
CPC classification number: G21K1/00 , G21K1/093 , G21K2201/00
Abstract: A cold-atom system has multiple vacuum chambers. One vacuum chamber includes an atom source. A fluidic connection is provided between that vacuum chamber and another vacuum chamber. The fluidic connection includes a microchannel formed as a groove in a substantially flat surface and covered by a layer of material.
Abstract translation: 冷原子系统具有多个真空室。 一个真空室包括原子源。 在该真空室和另一个真空室之间提供流体连接。 流体连接包括在基本上平坦的表面中形成为凹槽并被一层材料覆盖的微通道。
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