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    Vacuum compatible X-ray shield
    1.
    发明授权
    Vacuum compatible X-ray shield 有权

    公开(公告)号：US11972920B2

    公开(公告)日：2024-04-30

    申请号：US17533610

    申请日：2021-11-23

    Applicant: FEI Company

    Inventor： Pleun Dona ,  Casper Smit ,  Rients Jan de Groot

    IPC: H01J37/16 ,  B33Y80/00 ,  H01J37/18

    CPC classification number: H01J37/165 ,  H01J37/18 ,  B33Y80/00

    Abstract: Methods and apparatus are disclosed for providing an X-ray shield within an ultra-high vacuum enclosure. A shell is fabricated, leak-tested, filled with an X-ray shielding material, and sealed. An elongated twisted X-ray shield can be deployed within a pump-out channel of an electron microscope or similar equipment. The shield can incorporate lead within a stainless steel shell, with optional low-Z cladding outside the shell. Further variations are disclosed.

    Faraday shield and apparatus for treating substrate
    2.
    发明授权
    Faraday shield and apparatus for treating substrate 有权

    公开(公告)号：US11817291B2

    公开(公告)日：2023-11-14

    申请号：US17321126

    申请日：2021-05-14

    Applicant: PSK INC.

    Inventor： Mu-Kyeom Mun

    IPC: H01J37/16 ,  H01J37/32

    CPC classification number: H01J37/165 ,  H01J37/321

    Abstract: The inventive concept relates to an apparatus for processing a substrate. In an embodiment, the apparatus for processing the substrate includes a plasma chamber, a coil electrode installed around the plasma chamber, and a Faraday shield provided between the coil electrode and the plasma chamber. The Faraday shield includes a cutout having a plurality of slots formed in a vertical direction along a periphery of the plasma chamber, an upper rim provided at the top of the cutout, and a lower rim provided at the bottom of the cutout. The upper rim and the lower rim have a thermal expansion reduction means configured to reduce a difference in thermal deformation between the upper and the lower rim and the cutout.

    VACUUM COMPATIBLE X-RAY SHIELD
    3.
    发明公开
    VACUUM COMPATIBLE X-RAY SHIELD 审中-公开

    公开(公告)号：US20230162942A1

    公开(公告)日：2023-05-25

    申请号：US17533610

    申请日：2021-11-23

    Applicant: FEI Company

    Inventor： Pleun Dona ,  Casper Smit ,  Rients Jan de Groot

    IPC: H01J37/16 ,  H01J37/18 ,  B33Y80/00

    CPC classification number: H01J37/165 ,  H01J37/18 ,  B33Y80/00

    Abstract: Methods and apparatus are disclosed for providing an X-ray shield within an ultra-high vacuum enclosure. A shell is fabricated, leak-tested, filled with an X-ray shielding material, and sealed. An elongated twisted X-ray shield can be deployed within a pump-out channel of an electron microscope or similar equipment. The shield can incorporate lead within a stainless steel shell, with optional low-Z cladding outside the shell. Further variations are disclosed.

    Method of operating an electron-beam apparatus and electron-beam system
    4.
    发明授权
    Method of operating an electron-beam apparatus and electron-beam system 失效
    操作电子束装置和电子束系统的方法

    公开(公告)号：US3727026A

    公开(公告)日：1973-04-10

    申请号：US3727026D

    申请日：1971-02-22

    Applicant: KRAUSS MAFFEI AG

    Inventor： BAUMGARTNER S ,  LIPPACHER W

    IPC: B23K15/06 ,  H01J37/16 ,  B23K15/00

    CPC classification number: H01J37/165 ,  B23K15/06

    Abstract: An electron-beam apparatus, for example, for the electron-beam welding of metal or other workpieces comprises an evacuatable chamber and a duct connecting this chamber with a suction source, e.g. a vacuum pump. To prevent the passage of secondary emissions, e.g. X-rays, through this duct, the invention provides a plurality of baffle members in spaced relation along the duct and swingable into a position generally parallel to the duct axis during evacuation of the chamber to prevent obstruction of the fluid flow thereto. Subsequent to evacuation and during electronbeam welding, however, the baffles, shutters or shielding members extend transversely to the axis to intercept the X-rays.

    Abstract translation: 例如，用于金属或其他工件的电子束焊接的电子束装置包括可抽空室和将该室与吸入源连接的管道，例如， 真空泵。 为了防止二次排放物的通过，例如， X射线通过该管道，沿着管道间隔开地提供多个挡板构件，并且可以在抽空腔室期间摆动到大致平行于管道轴线的位置，以防止流体流动阻塞。 然而，在排气和电子束焊接之后，挡板，挡板或屏蔽件横向于轴线延伸以截取X射线。

    MICROWAVE DRIVEN PLASMA ION SOURCE
    5.
    发明公开
    MICROWAVE DRIVEN PLASMA ION SOURCE 审中-公开

    公开(公告)号：US20230164903A1

    公开(公告)日：2023-05-25

    申请号：US17916205

    申请日：2021-04-01

    Applicant: TOFWERK AG

    Inventor： Martin TANNER

    IPC: H05H1/30 ,  H01J37/16 ,  H01J49/04 ,  H01J37/34

    CPC classification number: H05H1/30 ,  H01J37/165 ,  H01J37/3488 ,  H01J49/0468

    Abstract: The invention relates to a microwave driven plasma ion source (1) for ionising a sample to be ionised to sample ions, the microwave driven plasma ion source (1) including a sample intake (6) for inserting the sample from an outside of the microwave driven plasma ion source (1) into an inside (3) of the microwave driven plasma ion source (1); a microwave generator (10) for generating microwaves for generating a plasma (101) from a plasma gas (100); a plasma torch (20) providing a plasma torch orientation direction (29) having an inside (21) for housing (2) a process of generation of the plasma (101) from the plasma gas (100) and for housing a process of ionising the sample to the sample ions by exposing the sample to the plasma (101), wherein the plasma torch (20) comprises a torch outlet (22) for letting out the plasma (101) and the sample ions from the inside (21) of the plasma torch (20) essentially in the plasma torch orientation direction (29) to an outside of the plasma torch (20), the torch outlet (22) having a torch aperture. Furthermore the microwave driven plasma ion source (1, 201) includes a shielding (4) for shielding off the microwaves from passing from the inside (3) of the microwave driven plasma ion source (1) to the outside of the microwave driven plasma ion source (1), wherein the shielding (4) comprises a shielding outlet (5) for letting out the plasma (101) and the sample ions from the inside (3) of the microwave driven plasma ion source (1) essentially in the plasma torch orientation direction (29) to the outside of the microwave driven plasma ion source (1), the shielding outlet (5) having a shielding aperture. Thereby, the shielding outlet (5) is fluidly coupled to the torch outlet (22) for letting out the plasma (101) and the sample ions from the inside (21) of the plasma torch (20) essentially in the plasma torch orientation direction (29) to the outside of the microwave driven plasma ion source (1), wherein a size of the shielding aperture is less than 150%, preferably less than 125%, particular preferably less than 110% of a size of the torch aperture, wherein both the size of the shielding aperture and the size of the torch aperture are measured in units of area.

    Hall effect enhanced capacitively coupled plasma source
    6.
    发明授权
    Hall effect enhanced capacitively coupled plasma source 有权
    霍尔效应增强了电容耦合等离子体源

    公开(公告)号：US09230780B2

    公开(公告)日：2016-01-05

    申请号：US14199974

    申请日：2014-03-06

    Applicant: Applied Materials, Inc.

    Inventor： Michael S. Cox ,  Rongping Wang ,  Brian T. West ,  Roger M. Johnson ,  Colin John Dickinson

    IPC: C23C16/54 ,  H01J37/32 ,  H01J37/16

    CPC classification number: H01J37/3266 ,  H01J37/165 ,  H01J37/32091 ,  H01J37/321 ,  H01J37/32541 ,  H01J37/32568 ,  H01J37/32596 ,  H01J37/32651 ,  H01J37/32669 ,  H01J37/32844 ,  H01J2237/002 ,  H01J2237/327 ,  H01J2237/332 ,  H01J2237/334 ,  Y02C20/30

    Abstract: Embodiments disclosed herein include a plasma source for abating compounds produced in semiconductor processes. The plasma source has a first plate and a second plate parallel to the first plate. An electrode is disposed between the first and second plates and an outer wall is disposed between the first and second plates surrounding the cylindrical electrode. The plasma source has a first plurality of magnets disposed on the first plate and a second plurality of magnets disposed on the second plate. The magnetic field created by the first and second plurality of magnets is substantially perpendicular to the electric field created between the electrode and the outer wall. In this configuration, a dense plasma is created.

    Abstract translation: 本文公开的实施例包括用于减轻在半导体工艺中产生的化合物的等离子体源。 等离子体源具有平行于第一板的第一板和第二板。 电极设置在第一和第二板之间，外壁设置在围绕圆柱形电极的第一和第二板之间。 等离子体源具有设置在第一板上的第一多个磁体和设置在第二板上的第二多个磁体。 由第一和第二多个磁体产生的磁场基本上垂直于在电极和外壁之间产生的电场。 在该配置中，产生致密等离子体。

    Removing byproducts of physical and chemical reactions in an ion implanter
    8.
    发明申请
    Removing byproducts of physical and chemical reactions in an ion implanter 失效
    在离子注入机中除去物理和化学反应的副产物

    公开(公告)号：US20060131514A1

    公开(公告)日：2006-06-22

    申请号：US11022060

    申请日：2004-12-22

    Applicant: Maria Anc ,  Dale Stone ,  Christopher Reddy

    Inventor： Maria Anc ,  Dale Stone ,  Christopher Reddy

    IPC: H01J37/317

    CPC classification number: H01J37/3171 ,  H01J37/165 ,  H01J2237/0213 ,  H01J2237/022 ,  H01J2237/31705

    Abstract: An ion implanter having a source, a workpiece support and a transport system for delivering ions from the source to an ion implantation chamber that contains the workpiece support. The implanter includes one or more removable inserts mounted to an interior of either the transport system or the ion implantation chamber for collecting material entering either the transport system or the ion implantation chamber due to collisions between ions and the workpiece within the ion implantation chamber during ion processing of the workpiece. A temperature control coupled to the one or more removable inserts for maintaining the temperature of the insert at a controlled temperature to promote formation of a film on said insert during ion treatment due to collisions between ions and said workpiece.

    Abstract translation: 一种离子注入机，其具有源，工件支撑和用于将离子从源输送到包含工件支撑件的离子注入室的输送系统。 注入机包括一个或多个可拆卸的插入件，其安装到输送系统或离子注入室的内部，用于收集进入输送系统或离子注入室的材料，这是由于离子和离子注入室内的工件之间的离子在离子 加工工件。 耦合到一个或多个可移除插入件的温度控制器，用于将插入件的温度保持在受控温度，以促进在离子处理期间由于离子和所述工件之间的碰撞而在所述插入件上形成膜。

    Apparatus wherein ionizing radiation is generated
    9.
    发明申请
    Apparatus wherein ionizing radiation is generated 失效
    产生电离辐射的装置

    公开(公告)号：US20030116722A1

    公开(公告)日：2003-06-26

    申请号：US10314146

    申请日：2002-12-09

    Inventor： Daniel Tobias

    IPC: G21F005/02

    CPC classification number: H01J37/165 ,  H01J5/02 ,  H01J35/16

    Abstract: An apparatus, which generates ionizing radiation, includes a column having a sandwich-like configuration. The column includes one or more tubes and a layer of a cured epoxy-resin mixture containing a heavy metal. The layer of epoxy-resin mixture adheres to the tube or, if the several tubes are provided, the layer adheres to the tubes. In this way, the layer defines a unit with the tube or tubes. The configuration of the apparatus provides a configuration, which is tight against exiting X-ray radiation, also in regions of breakouts and tube transitions.

    Abstract translation: 产生电离辐射的装置包括具有夹心状构造的柱。 该柱包括一个或多个管和一层含有重金属的固化的环氧树脂混合物。 环氧树脂混合物层粘附到管上，或者如果提供几根管，则该层粘附到管上。 以这种方式，层定义了具有管或管的单元。 该设备的配置提供了一种配置，其在出口和管过渡的区域中紧密抵抗X射线辐射。

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