Invention Patent
- Patent Title: A target material, a source, an EUV lithographic apparatus and a device manufacturing method using the same.
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Application No.: NL1036614Application Date: 2009-02-23
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Publication No.: NL1036614A1Publication Date: 2009-09-22
- Inventor: KRIVTSUN VLADIMIR MIHAILOVITCH , BANINE VADIM YEVGENYEVICH , BLEEKER ARNO JAN , IVANOV VLADIMIR VITALEVICH , KOSHELEV KONSTANTIN NIKOLAEVICH , MOORS JOHANNES HUBERTUS JOSEPH , CHURILOV SERGEY , GLUSHKOV DENIS
- Applicant: ASML NETHERLANDS BV
- Assignee: ASML NETHERLANDS BV
- Current Assignee: ASML NETHERLANDS BV
- Priority: US6472008 2008-03-21
- Main IPC: H05G2/00
- IPC: H05G2/00 ; G03F7/20
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