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    Lithographic device
    1.
    发明专利
    Lithographic device 有权
    LITHOGRAPHIC设备

    公开(公告)号：JP2010003687A

    公开(公告)日：2010-01-07

    申请号：JP2009138240

    申请日：2009-06-09

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： GLUSHKOV DENIS ,  BANINE VADIM YEVGENYEVICH ,  VLADIMIR VITALEVICH IVANOV ,  KOSHELEV KONSTANTIN NIKOLAEVITCH ,  ZUKAKISHVILI GIVI GEORGIEVICH ,  KRIVTSUN VLADIMIR MIHAILOVITCH ,  SIDELNIKOV YURII VICTOROVITCH ,  GIELISSEN KURT ,  YAKUSHEV OLEG

    IPC: H05G2/00 ,  G03F7/20 ,  H01L21/027

    CPC classification number: H05G2/003 ,  G03F7/70033 ,  H05G2/008

    Abstract: PROBLEM TO BE SOLVED: To provide a discharge forming plasma radiation source, and a method of forming radiation using the discharge forming plasma radiation source to reduce the number of formed high-speed (high-energy) ions.
    SOLUTION: The discharge forming plasma radiation source includes a laser beam pulse generator constituted so as to induce a pinch in the plasma of the discharge forming plasma radiation source by providing a laser beam pulse. The laser beam pulse generator is constituted so as to provide the laser beam pulse having larger energy than the most suitable laser beam pulse energy corresponding to the maximum output of the radiation of a prescribed wavelength with respect to prescribed discharge energy.
    COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种放电形成等离子体辐射源，以及使用放电形成等离子体辐射源形成辐射的方法，以减少形成的高速（高能）离子的数量。 解决方案：放电形成等离子体辐射源包括激光束脉冲发生器，其被构造成通过提供激光束脉冲在放电形成等离子体辐射源的等离子体中引起夹紧。 激光束脉冲发生器被构造成提供激光束脉冲，其具有比对应于规定波长的辐射的最大输出相对于规定的放电能量的最合适的激光束脉冲能量更大的能量。 版权所有（C）2010，JPO＆INPIT

    MULTILAYER MIRROR AND LITHOGRAPHIC APPARATUS
    7.
    发明专利
    MULTILAYER MIRROR AND LITHOGRAPHIC APPARATUS 未知

    公开(公告)号：SG174126A1

    公开(公告)日：2011-10-28

    申请号：SG2011055241

    申请日：2010-01-11

    Applicant: ASML NETHERLANDS BV

    Inventor： GLUSHKOV DENIS ,  BANINE VADIM ,  SJMAENOK LEONID ,  SALASCHENKO NIKOLAI ,  CHKHALO NIKOLAY

    Abstract: A multilayer mirror (7) is constructed and arranged to reflect radiation having a wavelength in the range of 2-8 nm. The multilayer mirror has alternating layers (4, 6), the alternating layers comprising a first layer and a second layer, the first and second layers being selected from the group consisting of : U and B4C layers, Th and B4C layers, La and B9C layers, La and B4C layers, U and B9C layers, Th and B9C layers, La and B layers, U and B layers, C and B layers, Th and B layers, U compound and B4C layers, Th compound and B4C layers, La compound and B9C layers, La compound and B4C layers, U compound and a B9C layers, Th compound and a B9C layers, La compound and a B layers, U compound and B layers, and Th compound and a B layers, wherein at least one of the first layers is separated from the second layer by an interlayer (7) disposed between at least one of the first layers and the second layer.

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