公开(公告)号：KR20200139192A

公开(公告)日：2020-12-11

申请号：KR20207030926

申请日：2019-04-02

Applicant: BASF SE

Inventor： KLIPP ANDREAS ,  BITTNER CHRISTIAN ,  BRAUN SIMON ,  OETTER GUENTER ,  BURK YENI

IPC: H01L21/02 ,  C11D1/02 ,  C11D1/62 ,  C11D1/88

Abstract: 반도체기판의적어도하나의표면의개질및/또는처리에서절단가능한첨가제로서, 바람직하게는절단가능한계면활성제로서의유기화합물의사용이기재되어있다. 더욱이, 반도체기판을제조하는방법이설명되어있는데, 이는적어도하나의표면을유기화합물과, 또는이를포함하는조성물과접촉시켜상기표면을처리또는개질하는단계, 상기유기화합물을단편들의세트로절단하는단계및 상기단편들의세트를접촉표면에서제거하는단계를포함한다. 보다구체적으로, 반도체기판또는중간반도체기판을세정또는린싱하는방법이기재되어있다. 또한, 위에서지적한용도및 방법에적합하고바람직하게는절단가능한계면활성제인화합물이기재되어있다.

公开(公告)号：ES2699223T3

公开(公告)日：2019-02-08

申请号：ES11792023

申请日：2011-06-01

Applicant: BASF SE

Inventor： FERSTL BERTHOLD ,  BRAUN SIMON ,  FESSENBECKER ACHIM

IPC: C11D7/34 ,  C11D7/32 ,  C11D7/36 ,  C11D11/00 ,  H01L21/306 ,  H01L21/461 ,  H01L31/18

Abstract: Una composición acuosa alcalina de grabado y de limpieza que comprende: (A) al menos un hidróxido de amonio cuaternario; preferiblemente seleccionado del grupo que consiste en hidróxido de tetrametilamonio e hidróxido de tetraetilamonio; y (B) al menos un componente seleccionado del grupo que consiste en (b1) ácidos sulfónicos solubles en agua y sus sales solubles en agua de fórmula general I: (R1-SO3-)nXn+ (I), (b2) ácidos fosfónicos solubles en agua y sus sales solubles en agua de fórmula general II: R-PO32-(Xn+)3-n (II), (b3) ésteres de ácido sulfúrico solubles en agua y sus sales solubles en agua de fórmula general III: (RO-SO3-)nXn+ (III), (b4) ésteres de ácido fosfórico solubles en agua y sus sales solubles en agua de fórmula general (IV): RO-PO32-(Xn+)3-n (IV), y (b5) ésteres de ácido fosfórico solubles en agua y sus sales solubles en agua de fórmula general (V): [(RO)2PO2 -]nXn+ (V); en las que el índice n = 1 o 2; la variable X se selecciona del grupo que consiste en hidrógeno, metal alcalino y metal alcalinotérreo; la variable R1 se selecciona del grupo que consiste en restos alifáticos que tienen de 2 a 5 átomos de carbono y al menos un doble enlace olefínicamente insaturado, y restos cicloalifáticos que tienen de 4 a 6 átomos de carbono y al menos un doble enlace olefínicamente insaturado; preferiblemente, por lo que R1 se selecciona de vinilo, prop-1-en-1-ilo, prop-2-en-1-ilo (alilo) y alfa-metil-vinilo; y la variable R se selecciona del grupo que consiste en restos alifáticos que tienen 2 a 5 átomos de carbono y al menos un doble enlace olefínicamente insaturado, restos cicloalifáticos que tienen 4 a 6 átomos de carbono y al menos un doble enlace olefínicamente insaturado, y restos alquilarilo, en los que los restos arilo se seleccionan de benceno y naftaleno, los restos alquilo se seleccionan de metileno, etano-diilo y propano-diilo, y R se selecciona preferiblemente de vinilo, prop-1-en-1-ilo, prop-2-en-1-ilo (alilo), alfa-metil-vinilo y bencilo; y el átomo de fósforo en la fórmula general II está unido directamente y el átomo de azufre en la fórmula general III y el átomo de fósforo en las fórmulas generales IV y V están unidos cada uno a través de un átomo de oxígeno a un átomo de carbono alifático; preferiblemente, por lo que la composición se caracteriza porque su pH es de 8 a 13.

公开(公告)号：MY160091A

公开(公告)日：2017-02-28

申请号：MYPI2012005135

申请日：2011-06-01

Applicant: BASF SE

Inventor： FERSTL BERTHOLD ,  BRAUN SIMON ,  FESSENBECKER ACHIM

IPC: C09K13/00 ,  C09K13/06 ,  C11D7/32 ,  C11D7/34 ,  C11D7/36 ,  C11D11/00 ,  H01L21/306 ,  H01L21/461 ,  H01L31/18

Abstract: AN AQUEOUS ALKALINE ETCHING AND CLEANING COMPOSITION FOR TREATING THE SURFACE OF SILICON SUBSTRATES, THE SAID COMPOSITION COMPRISING: (A) A QUATERNARY AMMONIUM HYDROXIDE; AND (B) A COMPONENT SELECTED FROM THE GROUP CONSISTING OF WATER-SOLUBIE ACIDS AND THEIR WATERE-SOLUBLE SALTS OF THE GENERAL FORMULAS (I) TO (V): (R1-SO3-)nXn+ (I), R-PO32- (Xn+)3-n (II); (RO-SO3-)nXn+ (III), RO-PO32- (Xn+)3-n (IV), and [(RO)2P02-]nXn+ (V); WHEREIN THE n = 1 OR 2; X IS HYDROGEN OR ALKALINE OR ALKALINE-EARTH METAL; THE VARIABLE R1 IS AN OLEFINICALLY UNSATURATED ALIPHATIC OR CYCLOALIPHATIC MOIETY AND R IS R1 OR AN ALKYLARYL MOIETY; THE USE OF THE COMPOSITION FOR TREATING SILICON SUBSTRATES, A METHOD FOR TREATING THE SURFACE OF SILICON SUBSTRATES, AND METHODS FOR MANUFACTURING DEVICES GENERATING ELECTRICITY UPON THE EXPOSURE TO ELECTROMAGNETIC RADIATION.

公开(公告)号：SG10201405908UA

公开(公告)日：2014-11-27

申请号：SG10201405908U

申请日：2010-09-09

Applicant: BASF SE

Inventor： BRAUN SIMON ,  PRÖLSS JULIAN ,  MELNYK IHOR ,  MICHEL MICHAEL ,  MATHIJSSEN STEFAN

公开(公告)号：SG187756A1

公开(公告)日：2013-03-28

申请号：SG2013009360

申请日：2011-08-25

Applicant: BASF SE

Inventor： BRAUN SIMON ,  KLIPP ANDREAS ,  ROEGER-GOEPFERT CORNELIA ,  BITTNER CHRISTIAN ,  SHEN MEICHIN ,  LIN CHENGWEI

Abstract: An aqueous acidic solution and an aqueous acidic etching solution suitable for texturizing the surface of single crystal and polycrystal silicon substrates, hydrofluoric acid; nitric acid; and at least one anionic polyether, which is surface active; a method for texturizing the surface of single crystal and polycrystal silicon substrates comprising the step of (1 ) contacting at least one major surface of a substrate with the said aqueous acidic etching solution; (2) etching the at least one major surface of the substrate for a time and at a temperature sufficient to obtain a surface texturization consisting of recesses and protrusions; and (3) removing the at least one major surface of the substrate from the contact with the aqueous acidic etching solution; and a method for manufacturing photovoltaic cells and solar cells using the said solution and the said texturizing method.

公开(公告)号：SG186108A1

公开(公告)日：2013-01-30

申请号：SG2012087946

申请日：2011-06-01

Applicant: BASF SE

Inventor： FERSTL BERTHOLD ,  BRAUN SIMON ,  FESENBECKER ACHIM

Abstract: An aqueous alkaline etching and cleaning composition for treating the surface of silicon substrates, the said composition comprising: (A) a quaternary ammonium hydroxide; and (B) a component selected from the group consisting of water-soluble acids and their water-soluble salts of the general formulas (I) to (V): (R1-S03-)nXn+ (I), R-P032- (Xn+)3-n (II); (RO-S03-)nXn+ (III), RO-P032- (Xn+)3-n, (IV), and [(RO)2P02-] nXn+ (V); wherein the n = 1 or 2; X is hydrogen or alkaline or alkaline-earth metal; the variable R1 is an olefinically unsaturated aliphatic or cycloaliphatic moiety and R is R1 or an alkylaryl moiety; the use of the composition for treating silicon substrates, a method for treating the surface of silicon substrates, and methods for manufacturing devices generating electricity upon the exposure to electromagnetic radiation.

公开(公告)号：SG178834A1

公开(公告)日：2012-04-27

申请号：SG2012011235

申请日：2010-09-09

Applicant: BASF SE ,  GP SOLAR GMBH

Inventor： BRAUN SIMON ,  PROELS JULIAN ,  MELNYK IHOR ,  MICHEL MICHAEL ,  MATHIJSSEN STEFAN

Abstract: An aqueous acidic etching solution suitable for texturing the surface of single crystal and polycrystal silicon substrates and containing, based on the complete weight of the solution, 3 to 10% by weight of hydrofluoric acid; 10 to 35% by weight of nitric acid; 5 to 40% by weight of sulfuric acid; and 55 to 82% by weight of water; a method for texturing the surface of single crystal and polycrystal silicon substrates comprising the step of (1) contacting at least one major surface of a substrate with the said aqueous acidic etching solution; (2) etching the at least one major surface of the substrate for a time and at a temperature sufficient to obtain a surface texture consisting of recesses and protru- sions; and (3) removing the at least one major surface of the substrate from the contact with the aqueous acidic etching solution; and a method for manufacturing photovoltaic cells and solar cells using the said solution and the said texturing method.

公开(公告)号：EP2611881A4

公开(公告)日：2017-08-30

申请号：EP11821199

申请日：2011-08-25

Applicant: BASF SE

Inventor： BRAUN SIMON ,  KLIPP ANDREAS ,  RÖGER-GÖPFERT CORNELIA ,  BITTNER CHRISTIAN ,  SHEN MEICHIN ,  LIN CHENGWEI

IPC: C09K13/08 ,  H01L21/302

CPC classification number: H01L21/30604 ,  C09K13/08 ,  H01L21/30608 ,  H01L31/022425 ,  H01L31/02363 ,  H01L31/18 ,  Y02E10/50 ,  Y10T428/24355

公开(公告)号：EP2825913A4

公开(公告)日：2016-02-17

申请号：EP13761807

申请日：2013-03-18

Applicant: BASF SE

Inventor： BITTNER CHRISTIAN ,  KLIPP ANDREAS ,  BRAUN SIMON

IPC: G03F7/42 ,  C11D7/50 ,  C11D11/00 ,  H01L21/311

CPC classification number: G03F7/426 ,  C11D7/5004 ,  C11D7/5009 ,  C11D7/5013 ,  C11D7/5022 ,  C11D11/0047 ,  G03F7/425 ,  H01L21/02057 ,  H01L21/0271 ,  H01L21/26513 ,  H01L21/266 ,  H01L21/31133 ,  H01L29/16 ,  H01L29/161 ,  H01L29/66477

Abstract: A photoresist stripping and cleaning composition free from N-alkylpyrrolidones and added quaternary ammonium hydroxides comprising a component (A) which comprises the polar organic solvents N-methylimidazole, dimethylsulfoxide and 1-aminopropane-2-ol.

公开(公告)号：EP2580303A4

公开(公告)日：2016-01-06

申请号：EP11792023

申请日：2011-06-01

Applicant: BASF SE

Inventor： FERSTL BERTHOLD ,  BRAUN SIMON ,  FESSENBECKER ACHIM

IPC: C11D7/34 ,  C11D7/32 ,  C11D7/36 ,  H01L21/306 ,  H01L21/461 ,  H01L31/18

CPC classification number: H01L31/1804 ,  C09K13/00 ,  C09K13/06 ,  C11D7/3209 ,  C11D7/34 ,  C11D7/36 ,  C11D11/0047 ,  H01L21/306 ,  H01L21/30604 ,  Y02E10/547 ,  Y02P70/521

Abstract: An aqueous alkaline etching and cleaning composition for treating the surface of silicon substrates, the said composition comprising: (A) a quaternary ammonium hydroxide; and (B) a component selected from the group consisting of water-soluble acids and their water-soluble salts of the general formulas (I) to (V): (R1—S03-)nXn+ (I), R—P032−(Xn+)3-n (II); (RO—S03-)nXn+ (III), RO—P032−(Xn+)3-n, (IV), and [(RO)2P02−]nXn+ (V); wherein the n=1 or 2; X is hydrogen or alkaline or alkaline-earth metal; the variable R1 is an olefinically unsaturated aliphatic or cycloaliphatic moiety and R is R1 or an alkylaryl moiety; the use of the composition for treating silicon substrates, a method for treating the surface of silicon substrates, and methods for manufacturing devices generating electricity upon the exposure to electromagnetic radiation.