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公开(公告)号：KR20180039709A
公开(公告)日：2018-04-18
申请号：KR20187007107
申请日：2016-08-09
Applicant: BASF SE
Inventor： REICHARDT ROBERT , SIEBERT MAX , LAN YONGQING , LAUTER MICHAEL , USMAN IBRAHIM SHEIK ANSAR , GOLZARIAN REZA M , WEI TE YU , GUEVENC HACI OSMAN , PROELSS JULIAN , LEUNISSEN LEONARDUS
IPC: C09G1/02 , C09G1/04 , C09K3/14 , H01L21/306
CPC classification number: C09G1/02
Abstract: (i) 코발트및/또는 (ii) 코발트합금및 (iii) TiN 및/또는 TaN 을함유하는기판 (S) 의화학기계연마를위한화학기계연마 (CMP) 조성물 (Q) 의용도로서, 상기 CMP 조성물 (Q) 이하기를포함하는 CMP 조성물 (Q) 의용도: (E) 무기입자, (F) 아미노기및 산기 (Y) 를함유하는하나이상의유기화합물 (상기화합물은 n 개의아미노기및 n+1 개이상의산성프로톤을함유하고, n 은정수≥ 1 이다), (G) 각각의 CMP 조성물의총 중량에대해서, 0.2 wt.% 내지 2.5 wt.% 의양의하나이상의산화제, (H) 수성매질, CMP 조성물 (Q) 은 6 초과 9 미만의 pH 를가진다.
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公开(公告)号：WO2007128821A3
公开(公告)日：2009-02-19
申请号：PCT/EP2007054457
申请日：2007-05-08
Applicant: BASF SE , KLEINE JAEGER FRANK , PROELSS JULIAN , BENOEHR ALEXANDER , BREINER THOMAS
Inventor： KLEINE JAEGER FRANK , PROELSS JULIAN , BENOEHR ALEXANDER , BREINER THOMAS
CPC classification number: C01G1/00 , B82Y30/00 , C01B6/06 , C01B6/243 , C01B35/04 , C01G9/03 , C01G39/06 , C01P2004/51 , C01P2004/64 , C04B35/5805 , C04B35/58092 , C04B35/62665 , C04B2235/3227 , C04B2235/3256 , C04B2235/421 , C09C1/043
Abstract: The invention relates to a method for producing suspensions of nanoparticulate solids. Said method is characterized in that the solids contained in the suspension are provided in the form of nanoparticulate primary particles or tiny aggregates.
Abstract translation: 本发明涉及一种用于生产纳米颗粒状固体，其特征在于，包含在悬浮液中的固体是在纳米微粒的一次粒子或非常小的聚集体的形式的悬浮液的方法。
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公开(公告)号：WO2008125647A3
公开(公告)日：2009-10-15
申请号：PCT/EP2008054465
申请日：2008-04-14
Applicant: BASF SE , BRAMNIK KIRILL , HIBST HARTMUT , PROELSS JULIAN
Inventor： BRAMNIK KIRILL , HIBST HARTMUT , PROELSS JULIAN
IPC: C01G31/00 , H01M4/131 , H01M4/485 , H01M10/052
CPC classification number: C01G31/00 , C01P2002/72 , C01P2006/12 , C01P2006/40 , H01M4/131 , H01M4/485 , H01M10/052 , H01M2300/0082 , H01M2300/0091
Abstract: The present invention relates to a method for the production of lithium-rich metal oxides and lithium-rich metal oxides obtainable using said method. The invention further relates to the use of lithium-rich metal oxides for the production of a cathode for a battery, particularly a lithium ion battery, and a cathode for a lithium ion battery containing lithium-rich metal oxides.
Abstract translation: 本发明涉及一种用于制备富锂的金属氧化物和通过该方法富锂的金属氧化物而得到的方法。 本发明Weiterhinbetrifft使用富锂的金属氧化物的用于制备阴极的用于电池，特别是锂离子电池和锂离子电池的阴极，其含有富锂的金属氧化物。
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公开(公告)号：WO2007128821A9
公开(公告)日：2009-05-07
申请号：PCT/EP2007054457
申请日：2007-05-08
Applicant: BASF SE , KLEINE JAEGER FRANK , PROELSS JULIAN , BENOEHR ALEXANDER , BREINER THOMAS
Inventor： KLEINE JAEGER FRANK , PROELSS JULIAN , BENOEHR ALEXANDER , BREINER THOMAS
CPC classification number: C01G1/00 , B82Y30/00 , C01B6/06 , C01B6/243 , C01B35/04 , C01G9/03 , C01G39/06 , C01P2004/51 , C01P2004/64 , C04B35/5805 , C04B35/58092 , C04B35/62665 , C04B2235/3227 , C04B2235/3256 , C04B2235/421 , C09C1/043
Abstract: The invention relates to a method for producing suspensions of nanoparticulate solids. Said method is characterized in that the solids contained in the suspension are provided in the form of nanoparticulate primary particles or tiny aggregates.
Abstract translation: 本发明涉及制备纳米微粒固体悬浮液的方法，其特征在于，悬浮液中存在的固体为纳米微粒初级微粒或非常小的聚集体的形式。
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公开(公告)号：SG11201804636YA
公开(公告)日：2018-07-30
申请号：SG11201804636Y
申请日：2016-12-20
Applicant: BASF SE
Inventor： DÄSCHLEIN CHRISTIAN , SIEBERT MAX , LAUTER MICHAEL , PRZYBYLSKI PETER , PROELSS JULIAN , KLIPP ANDREAS , GUEVENC HACI OSMAN , LEUNISSEN LEONARDUS , BAUMANN ROELF-PETER , WEI TE YU
IPC: H01L21/321 , C11D3/00 , C11D3/37 , C11D11/00
Abstract: Described is a post chemical-mechanical-polishing (post-CMP) cleaning composition comprising or consisting of: (A) one or more nonionic polymers selected from the group consisting of poly- acrylamides, polyhydroxyethyl(meth)acrylates (PHE(M)A), polyvinylpyrrolidone (PVP), polyvinyl alcohol (PVA), polymers of formula (I), and mixtures thereof, wherein R1 is hydrogen, methyl, ethyl, n-propyl, /so-propyl, n-butyl, iso-butyl, or sec-butyl, R2 is hydrogen or methyl, and n is an integer, (B) poly(acrylic acid) (PAA) or acrylic acid-maleic acid copolymer with a mass average molar mass (Mw) of up to 10,000 g/mol, and (C) water, wherein the pH of the composition is in the range of from 7.0 to 10.5.
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Patent Agency Ranking
公开(公告)号：SG11201704287TA
公开(公告)日：2017-07-28
申请号：SG11201704287T
申请日：2015-12-11
Applicant: BASF SE
Inventor： REICHARDT ROBERT , SIEBERT MAX , LAN YONGQING , LAUTER MICHAEL , USMAN IBRAHIM SHEIK ANSAR , GOLZARIAN REZA , GUEVENC HACI OSMAN , PROELSS JULIAN , LEUNISSEN LEONARDUS
Abstract: Use of a chemical mechanical polishing (CMP) composition (Q) for chemical mechanical polishing of a substrate (S) comprising (i) cobalt and/or (ii) a cobalt alloy, wherein the CMP composition (Q) comprises (A) Inorganic particles (B) a triazine derivative of the general formula (I) wherein R1, R2, R3, R4, R5 and R6 are independently from each other H, methyl, ethyl, propyl, butyl, pentyl, C2-C10-alkylcarboxylic acid, hydroxymethyl, vinyl or allyl (C) at least one amino acid, (D) at least one oxidizer (E) an aqueous medium and wherein the CMP composition (Q) has a pH of from 7 to 10.
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公开(公告)号：SG11201804637UA
公开(公告)日：2018-07-30
申请号：SG11201804637U
申请日：2016-12-20
Applicant: BASF SE
Inventor： DÄSCHLEIN CHRISTIAN , SIEBERT MAX , LAUTER MICHAEL , PRZYBYLSKI PETER , PROELSS JULIAN , KLIPP ANDREAS , GUEVENC HACI OSMAN , LEUNISSEN LEONARDUS , BAUMANN ROELF-PETER , WEI TE YU
IPC: C11D3/37 , C11D11/00 , H01L21/02 , H01L21/321
Abstract: Described is a post chemical-mechanical-polishing (post-CMP) cleaning composition comprising or consisting of: (A) polyethylene glycol (PEG) with a mass average molar mass (Mw) in the range of from 400 to 8,000 g/mol, (B) an anionic polymer selected from the group consisting of poly(acrylic acid) (PAA), acrylic acid-maleic acid copolymers, polyaspartic acid (PASA), polyglutamic acid (PGA), polyvinylphosphonic acid, polyvinylsulfonic acid, poly(styrenesulfonic acid), polycarboxylate ethers (PCE), PEG-phosphorous acids, and copolymers of said polymers, and (C) water, wherein the pH of the composition is in the range of from 7.0 to 10.5.
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公开(公告)号：SG11201810119PA
公开(公告)日：2018-12-28
申请号：SG11201810119P
申请日：2017-05-31
Applicant: BASF SE
Inventor： DAESCHLEIN CHRISTIAN , SIEBERT MAX , LAUTER MICHAEL , LEUNISSEN LEONARDUS , GARCIA ROMERO IVAN , GUEVENC HACI OSMAN , PRZYBYLSKI PETER , PROELSS JULIAN , KLIPP ANDREAS
Abstract: Described is a post chemical-mechanical-polishing (post-CMP) cleaning composition comprising or consisting of: (A) one or more water-soluble nonionic copolymers of the general formula (I) and mixtures thereof, formula (I) wherein R1 and R3 are idependently from each other hydrogen, methyl, ethyl, n-propyl, isopropyl, n-butyl, iso-Butyl, or sec-butyl, R2 is methyl and x and y are an integer,1 (B)poly(acrylic acid) (PAA) oracrylic acid-maleic acid copolymer with a mass average molar mass (Mw) of up to 10,000 g/mol, and (C)water, wherein the pH of the composition is in the range of from 7.0 to 10.5.
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公开(公告)号：SG11201704496RA
公开(公告)日：2017-07-28
申请号：SG11201704496R
申请日：2015-12-22
Applicant: BASF SE
Inventor： REICHARDT ROBERT , SIEBERT MAX , LAN YONGQING , LAUTER MICHAEL , USMAN IBRAHIM SHEIK ANSAR , GOLZARIAN REZA , GUEVENC HACI OSMAN , PROELSS JULIAN , LEUNISSEN LEONARDUS
IPC: C09G1/00
Abstract: A chemical mechanical polishing (CMP) composition (Q) for chemical mechanical polishing of a substrate (S) containing (i) cobalt and/or (ii) a cobalt alloy, wherein the CMP composition (Q) contains: (A) Inorganic particles, (B) a substituted aromatic compound with at least one carboxylic acid function as corrosion inhibitor, (C) at least one amino acid, (D) at least one oxidizer, (E) an aqueous medium, wherein the CMP composition (Q) has a pH of from 7 to 10.
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公开(公告)号：SG11201704280QA
公开(公告)日：2017-07-28
申请号：SG11201704280Q
申请日：2015-12-16
Applicant: BASF SE
Inventor： REICHARDT ROBERT , SIEBERT MAX , LAN YONGQING , LAUTER MICHAEL , USMAN IBRAHIM SHEIK ANSAR , GOLZARIAN REZA , GUEVENC HACI OSMAN , PROELSS JULIAN , LEUNISSEN LEONARDUS
IPC: C09G1/02 , H01L21/304 , H01L21/321
Abstract: Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and / or co-balt alloy comprising substrates Abstract Use of a chemical mechanical polishing (CMP) composition (Q) for chemical mechanical polishing of a substrate (S) comprising (i) cobalt and/or (ii) a cobalt alloy, wherein the CMP composition (Q) comprises (A) Inorganic particles (B) a substituted tetrazole derivative of the general formula (I), wherein R1 is H, hydroxy, alkyl, aryl, alkylaryl, amino, carboxyl, alkylcarboxyl, thio or alkylthio. (C) at least one amino acid (D) at least one oxidizer, (E) an aqueous medium and wherein the CMP composition (Q) has a pH of from 7 to 10.
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