公开(公告)号：EP1851589A4

公开(公告)日：2009-08-19

申请号：EP06735757

申请日：2006-02-22

Applicant: IBM

Inventor： ALLEN ROBERT DAVID ,  BROCK PHILLIP JOE ,  GIL DARIO ,  HINSBERG WILLIAM DINAN ,  LARSON CARL ERIC ,  SUNDBERG LINDA KARIN ,  WALLRAFF GREGORY MICHAEL

IPC: G03C1/00

CPC classification number: G03F7/11 ,  G03F7/0046 ,  G03F7/2041 ,  Y10S430/108 ,  Y10S430/111

Abstract: A topcoat material for applying on top of a photoresist material is disclosed. The topcoat material comprises at least one solvent and a polymer which has a dissolution rate of at least 3000 A/second in aqueous alkaline developer. The polymer contains a hexafluoroalcohol monomer unit comprising one of the following two structures: (I) wherein n is an integer. The topcoat material may be used in lithography processes, wherein the topcoat material is applied on a photoresist layer. The topcoat material is 10 preferably insoluble in water, and is therefore particularly useful in immersion lithography techniques using water as the imaging medium.

公开(公告)号：WO2006091648A2

公开(公告)日：2006-08-31

申请号：PCT/US2006006225

申请日：2006-02-22

Applicant: IBM ,  ALLEN ROBERT DAVID ,  BROCK PHILLIP JOE ,  GIL DARIO ,  HINSBERG WILLIAM DINAN ,  LARSON CARL ERIC ,  SUNDBERG LINDA KARIN ,  WALLRAFF GREGORY MICHAEL

Inventor： ALLEN ROBERT DAVID ,  BROCK PHILLIP JOE ,  GIL DARIO ,  HINSBERG WILLIAM DINAN ,  LARSON CARL ERIC ,  SUNDBERG LINDA KARIN ,  WALLRAFF GREGORY MICHAEL

IPC: G03C1/76

CPC classification number: G03F7/11 ,  G03F7/0046 ,  G03F7/2041 ,  Y10S430/108 ,  Y10S430/111

Abstract: A topcoat material for applying on top of a photoresist material is disclosed. The topcoat material comprises at least one solvent and a polymer which has a dissolution rate of at least 3000 A/second in aqueous alkaline developer. The polymer contains a hexafluoroalcohol monomer unit comprising one of the following two structures: (I) wherein n is an integer. The topcoat material may be used in lithography processes, wherein the topcoat material is applied on a photoresist layer. The topcoat material is 10 preferably insoluble in water, and is therefore particularly useful in immersion lithography techniques using water as the imaging medium.

Abstract translation: 公开了一种用于施加在光致抗蚀剂材料上的面漆材料。 面漆材料包含至少一种溶剂和在含水碱性显影剂中具有至少3000A /秒的溶解速率的聚合物。 聚合物含有包含以下两种结构之一的六氟醇单体单元：（I）其中n是整数。 面漆材料可以用于光刻工艺中，其中将顶涂层材料施加在光致抗蚀剂层上。 面漆材料10优选不溶于水，因此特别适用于使用水作为成像介质的浸没式光刻技术。

公开(公告)号：DE69003146T2

公开(公告)日：1994-04-21

申请号：DE69003146

申请日：1990-03-05

Applicant: IBM

Inventor： BETTERTON KATHLEEN MARY ,  HINSBERG WILLIAM DINAN ,  NGUYEN HUU TINH ,  TANG WING TSANG ,  TWIEG ROBERT JAMES

IPC: G02F1/13 ,  C07C327/28 ,  C07C327/32 ,  C09K19/20 ,  C09K19/28 ,  C09K19/32

公开(公告)号：DE602006015428D1

公开(公告)日：2010-08-26

申请号：DE602006015428

申请日：2006-02-22

Applicant: IBM

Inventor： ALLEN ROBERT DAVID ,  BROCK PHILLIP JOE ,  GIL DARIO ,  HINSBERG WILLIAM DINAN ,  LARSON CARL ERIC ,  SUNDBERG LINDA KARIN ,  WALLRAFF GREGORY MICHAEL

IPC: G03C1/76 ,  G03F7/20

公开(公告)号：DE69003146D1

公开(公告)日：1993-10-14

申请号：DE69003146

申请日：1990-03-05

Applicant: IBM

Inventor： BETTERTON KATHLEEN MARY ,  HINSBERG WILLIAM DINAN ,  NGUYEN HUU TINH ,  TANG WING TSANG ,  TWIEG ROBERT JAMES

IPC: G02F1/13 ,  C07C327/28 ,  C07C327/32 ,  C09K19/20 ,  C09K19/28 ,  C09K19/32