Tunnel field effect devices
    6.
    发明专利

    公开(公告)号:GB2485495A

    公开(公告)日:2012-05-16

    申请号:GB201200880

    申请日:2010-08-30

    Applicant: IBM

    Abstract: An indirectly induced tunnel emitter for a tunneling field effect transistor (TFET) structure includes an outer sheath that at least partially surrounds an elongated core element, the elongated core element formed from a first semiconductor material; an insulator layer disposed between the outer sheath and the core element; the outer sheath disposed at a location corresponding to a source region of the TFET structure; and a source contact that shorts the outer sheath to the core element; wherein the outer sheath is configured to introduce a carrier concentration in the source region of the core element sufficient for tunneling into a channel region of the TFET structure during an on state.

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