Abstract:
PROBLEM TO BE SOLVED: To provide an organic electroluminescence device with a reduced deterioration rate and an enhanced efficiency. SOLUTION: An electroluminescene device comprises a positive electrode, a hole-injection layer, an emission layer including an emitting material, an electron-injection layer, and a negative electrode which are formed sequentially. Furthermore, the emission layer comprises a stabilizing material having an energy-bandgap greater than energy-bandgap of the emitting material. COPYRIGHT: (C)2007,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a method of manufacturing an electronic device having a pattern formed on the surface by deposition materials. SOLUTION: This is related to the method of forming an FET, especially, a high definition color (RGB) display. The forming method of the organic electronic device includes a process in which the deposition materials are heated and pressurized in order to form molten products and a process in which the molten deposition materials are layered on the surface using a phase-change printing technology or spraying technology. The molten deposition materials are coagulated on the surface. COPYRIGHT: (C)2005,JPO&NCIPI
Abstract:
The present invention discloses an electrode structure for electronic and op to- electronic devices. Such a device comprises a first electrode substantially having a conductive layer (204), a nonmetal layer (206) formed on the conductive layer, a fluorocarbon layer (208) formed on the nonmetal layer, a structure (210) formed on the structure. The electrode may further comprise a buffer layer (205) between the conductive layer and the nonmetal layer.
Abstract:
The present invention discloses an electrode structure for electronic and opto-electronic devices. Such a device comprises a first electrode substantially having a conductive layer (204), a nonmetal layer (206) formed on the conductive layer, a fluorocarbon layer (208) formed on the nonmetal layer, a structure (210) formed on the structure. The electrode may further comprise a buffer layer (205) between the conductive layer and the nonmetal layer.
Abstract:
The present invention discloses an electrode structure for electronic and opto-electronic devices. Such a device comprises a first electrode substantially having a conductive layer ( 204 ), a nonmetal layer ( 206 ) formed on the conductive layer, a fluorocarbon layer ( 208 ) formed on the nonmetal layer, a structure ( 210 ) formed on the structure. The electrode may further comprise a buffer layer ( 205 ) between the conductive layer and the nonmetal layer.
Abstract:
An indirectly induced tunnel emitter for a tunneling field effect transistor (TFET) structure includes an outer sheath that at least partially surrounds an elongated core element, the elongated core element formed from a first semiconductor material; an insulator layer disposed between the outer sheath and the core element; the outer sheath disposed at a location corresponding to a source region of the TFET structure; and a source contact that shorts the outer sheath to the core element; wherein the outer sheath is configured to introduce a carrier concentration in the source region of the core element sufficient for tunneling into a channel region of the TFET structure during an on state.