公开(公告)号：AU3303599A

公开(公告)日：1999-09-06

申请号：AU3303599

申请日：1999-02-19

Applicant: GOODRICH CO B F ,  IBM

Inventor： JAYARAMAN SAIKUMAR ,  GOODALL BRIAN L ,  RHODES LARRY F ,  SHICK ROBERT A ,  VICARI RICHARD ,  ALLEN ROBERT D ,  OPITZ JULIANN ,  SOORIYAKUMARAN RATNAM ,  WALLOW THOMAS

IPC: C08F4/80 ,  C08F32/08 ,  C08F232/08 ,  C08G61/06 ,  C08G61/08 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039

Abstract: The invention relates to a cyclic 2,3-addition polymer obtained from a monomer composition consisting of one or more polycyclic monomers having a pendant aromatic substituent, in combination with a monomer selected from the group consisting of one or more polycyclic monomers having a pendant acid labile substituent. The invention further relates to a photoresist composition comprising a photoacid initiator, an optional dissolution inhibitor, and said cyclic 2,3-addition polymer.

公开(公告)号：AT542837T

公开(公告)日：2012-02-15

申请号：AT08170128

申请日：1999-02-19

Applicant: SUMITOMO BAKELITE CO ,  IBM

Inventor： JAYARAMAN SAIKUMAR ,  GOODALL BRIAN L ,  RHODES LARRY F ,  SHICK ROBERT A ,  VICARI RICHARD ,  ALLEN ROBERT D ,  OPITZ JULIANN ,  SOORIYAKUMARAN RATNAM ,  WALLOW THOMAS

IPC: C08F32/08 ,  C08F4/70 ,  C08F4/80 ,  C08F232/08 ,  C08G61/06 ,  C08G61/08 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039

Abstract: The invention relates to a cyclic 2,3-addition polymer obtained from a monomer composition consisting of one or more polycyclic monomers having a pendant aromatic substituent, in combination with a monomer selected from the group consisting of one or more polycyclic monomers having a pendant acid labile substituent. The invention further relates to a photoresist composition comprising a photoacid initiator, an optional dissolution inhibitor, and said cyclic 2,3-addition polymer.

公开(公告)号：HK1035199A1

公开(公告)日：2001-11-16

申请号：HK01105885

申请日：2001-08-21

Applicant: IBM ,  SUMITOMO BAKELITE CO

Inventor： JAYARAMAN SAIKUMAR ,  GOODALL BRIAN L ,  RHODES LARRY F ,  SHICK ROBERT A ,  VICARI RICHARD ,  ALLEN ROBERT D ,  OPITZ JULIANN ,  SOORIYAKUMARAN RATNAM ,  WALLOW THOMAS

IPC: C08F4/80 ,  C08F32/08 ,  C08F232/08 ,  C08G61/06 ,  C08G61/08 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  C08F ,  C08G ,  G03F

Abstract: The invention relates to a cyclic 2,3-addition polymer obtained from a monomer composition consisting of one or more polycyclic monomers having a pendant aromatic substituent, in combination with a monomer selected from the group consisting of one or more polycyclic monomers having a pendant acid labile substituent. The invention further relates to a photoresist composition comprising a photoacid initiator, an optional dissolution inhibitor, and said cyclic 2,3-addition polymer.

公开(公告)号：DE10009183A1

公开(公告)日：2000-09-28

申请号：DE10009183

申请日：2000-02-26

Applicant: IBM

Inventor： VARANASI PUSHKARA RAO ,  MANISCALCO JOSEPH F ,  LAWSON MARGARET C ,  MEWHERTER ANN MARIE ,  JORDHAMO GEORGE M ,  ALLEN ROBERT D ,  OPITZ JULIANN ,  ITO HIROSHI ,  WALLOW THOMAS I ,  PIETRO RICHARD A DE

IPC: C08F232/00 ,  C08K5/00 ,  C08L45/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/11 ,  G03F7/38 ,  G03F7/40 ,  H01L21/027

Abstract: Photoresist composition comprises: (a) a cyclic olefin polymer, (b) a photosensitive acid generating compound and (c) a hydrophobic additive selected from non-steroidal alicyclic and multi-alicyclic components and a saturated steroid component.

公开(公告)号：AU3524800A

公开(公告)日：2000-09-28

申请号：AU3524800

申请日：2000-03-09

Applicant: GOODRICH CO B F ,  IBM

Inventor： JAYARAMAN SAIKUMAR ,  GOODALL BRIAN L ,  VICARI RICHARD ,  LIPIAN JOHN-HENRY ,  ALLEN ROBERT D ,  OPITZ JULIANN ,  WALLOW THOMAS I

IPC: C08G61/08 ,  C08G61/12 ,  G03F7/004 ,  G03F7/039