公开(公告)号：JP2000298350A

公开(公告)日：2000-10-24

申请号：JP2000065165

申请日：2000-03-09

Applicant: IBM

Inventor： VARANASI PUSHKARA RAO ,  ALLEN ROBERT D ,  TOMAS I WOROU ,  JULIAN OPITZ ,  DEPIETRO RICHARD A ,  MARGARET C LAWSON ,  ANN MARIE MYUUHAATAA ,  JOSEPH F MANISCALCO ,  MAHAMUUDO EMU HOJISUTE ,  JORDHAMO GEORGE M ,  ITO HIROSHI

IPC: C08F232/00 ,  C08K5/00 ,  C08L45/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/11 ,  G03F7/38 ,  G03F7/40 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To obtain a photoresist composition using an acid as a catalyst, capable of forming an image with radiation of 193 nm and capable of forming a photoresist structure having high resolution and high etching resistance by development. SOLUTION: The photoresist composition comprises a combination of a cyclic olefin polymer, a photosensitive acid-generating agent and a substantially transparent bulky hydrophobic additive. The cyclic olefin polymer contains a cyclic olefin unit having a polar functional group which promotes dissolution in an aqueous alkali solution and the cyclic olefin unit having an acid-labile group which inhibits the dissolution in the aqueous alkali solution. The hydrophobic additive is selected from the group comprising a saturated steroid compound, a non-steroid cycloaliphatic compound and a non-steroid polycycloaliphatic compound having an acid-labile bond.

公开(公告)号：DE10009183A1

公开(公告)日：2000-09-28

申请号：DE10009183

申请日：2000-02-26

Applicant: IBM

Inventor： VARANASI PUSHKARA RAO ,  MANISCALCO JOSEPH F ,  LAWSON MARGARET C ,  MEWHERTER ANN MARIE ,  JORDHAMO GEORGE M ,  ALLEN ROBERT D ,  OPITZ JULIANN ,  ITO HIROSHI ,  WALLOW THOMAS I ,  PIETRO RICHARD A DE

IPC: C08F232/00 ,  C08K5/00 ,  C08L45/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/11 ,  G03F7/38 ,  G03F7/40 ,  H01L21/027

Abstract: Photoresist composition comprises: (a) a cyclic olefin polymer, (b) a photosensitive acid generating compound and (c) a hydrophobic additive selected from non-steroidal alicyclic and multi-alicyclic components and a saturated steroid component.