公开(公告)号：DE10009183A1

公开(公告)日：2000-09-28

申请号：DE10009183

申请日：2000-02-26

Applicant: IBM

Inventor： VARANASI PUSHKARA RAO ,  MANISCALCO JOSEPH F ,  LAWSON MARGARET C ,  MEWHERTER ANN MARIE ,  JORDHAMO GEORGE M ,  ALLEN ROBERT D ,  OPITZ JULIANN ,  ITO HIROSHI ,  WALLOW THOMAS I ,  PIETRO RICHARD A DE

IPC: C08F232/00 ,  C08K5/00 ,  C08L45/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/11 ,  G03F7/38 ,  G03F7/40 ,  H01L21/027

Abstract: Photoresist composition comprises: (a) a cyclic olefin polymer, (b) a photosensitive acid generating compound and (c) a hydrophobic additive selected from non-steroidal alicyclic and multi-alicyclic components and a saturated steroid component.

公开(公告)号：AU2021281966A1

公开(公告)日：2022-10-27

申请号：AU2021281966

申请日：2021-04-29

Applicant: IBM

Inventor： MANISCALCO JOSEPH F ,  VAN DER STRATEN OSCAR ,  MOTOYAMA KOICHI ,  LEE CHOONGHYUN ,  KIM SEYOUNG

IPC: H01L45/00 ,  H01L27/24

Abstract: Provided are method of fabricating a dual damascene crossbar array. The method includes forming a bottom electrode layer on a substrate and forming a first memory device on the bottom electrode layer. The method also includes forming a dual damascene structure on the first memory device, wherein the dual damascene structure includes a top electrode layer and a first via, wherein the first via is formed between the first memory device and the top electrode layer. Also provided are embodiments for the dual damascene crossbar and embodiments for disabling memory devices of the dual damascene crossbar array.

公开(公告)号：MY122727A

公开(公告)日：2006-04-29

申请号：MYPI20000522

申请日：2000-02-15

Applicant: IBM

Inventor： VARANASI PUSHKARA RAO ,  MANISCALCO JOSEPH F

IPC: G03F7/213 ,  G03F7/004 ,  G03F7/039 ,  G03F7/30 ,  G03F7/36 ,  G03F7/38

Abstract: ACID-CATALYZED POSITIVE PHOTORESIST COMPOSITIONS WHICH ARE IMAGEABLE WITH 193NM RADIATION AND ARE DEVELOPABLE TO FROM PHOTORESIST STRUCTURE OF HIGH RESOLUTION AND HIGH ETCH RESISTANCE ARE ENABLE BY THE USE OF A COMBINATION OF CYCLIC OLEFIN POLYMER, PHOTOSENSITIVE ACID GENERATOR AND A HYDROPHOBIC NON-STEROIDAL NULTI-ALICYCLIC COMPONENT CONTAINING PLURAL ACID LINKING GROUPS.THE CYCLIC OLEFIN POLYMERS PREFERABLY CONTAIN I) CYCLIC OLEFIN UNITS HAVING POLAR FUNCTIONAL MOIETIES , II) CYCLIC OLEFIN UNITS HAVING ACID LABILE MOIETIES THAT INHIBIT SOLUBILITY IN AQUEOUS ALKALINE SOLUTIONS.