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公开(公告)号:DE69410772T2
公开(公告)日:1999-02-25
申请号:DE69410772
申请日:1994-11-24
Applicant: IBM
Inventor: LUSTIG NAFTALI ELIAHU , SAENGER KATHERINE LYNN , TONG HO-MING
IPC: G01N21/55 , B24B37/013 , B24B49/04 , B24B49/12 , B24D7/12 , G01B11/06 , H01L21/304 , H01L21/66 , B24B37/04
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公开(公告)号:DE69410772D1
公开(公告)日:1998-07-09
申请号:DE69410772
申请日:1994-11-24
Applicant: IBM
Inventor: LUSTIG NAFTALI ELIAHU , SAENGER KATHERINE LYNN , TONG HO-MING
IPC: G01N21/55 , B24B37/013 , B24B49/04 , B24B49/12 , B24D7/12 , G01B11/06 , H01L21/304 , H01L21/66 , B24B37/04
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公开(公告)号:SG70139A1
公开(公告)日:2000-01-25
申请号:SG1998005021
申请日:1998-11-27
Applicant: IBM
IPC: H01L21/223 , H01L21/265 , H01L21/336 , H01L29/417 , H01L21/8249
Abstract: A field effect transistor and method for making the same is described wherein the field effect transistor incorporates a T-shaped gate and source and drain contacts self-aligned with preexisting shallow junction regions. The present invention provides a low resistance gate electrode and self-aligned low resistance source/drain contacts suitable for submicron FET devices, and scalable to smaller device dimensions.
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公开(公告)号:SG72884A1
公开(公告)日:2000-05-23
申请号:SG1998004543
申请日:1998-11-05
Applicant: IBM
Inventor: DUNCOMBE PETER RICHARD , HUMMEL JOHN PATRICK , LAIBOWITZ ROBERT BENJAMIN , NEUMAYER DEBORAH ANN , SAENGER KATHERINE LYNN , SCHROTT ALEJANDRO GABRIEL
IPC: H01L21/8247 , C23C8/12 , H01L21/822 , H01L21/8242 , H01L21/8246 , H01L27/04 , H01L27/10 , H01L27/105 , H01L27/108 , H01L29/788 , H01L29/792
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