Abstract:
An inertial sensor with failure threshold includes: a first body (2) and a second body (18), which can move relatively with respect to one another and are constrained by a plurality of elastic elements; and at least one sample element (6) connected between the first body (2) and the second body (18) and shaped so as to be subjected to a stress when the second body (18) is outside of a relative resting position with respect to the first body (2). The sample element (6) has at least one weakened region (9, 10).
Abstract:
Integrated gyroscope (1) including a suspended mass (10); mobile actuation electrodes (11) extending from the suspended mass; and a sensing mass (6) connected to the actuation mass (10) through coupling springs (25). The suspended mass (10) is formed by an external part (10a) and an internal part (10b), electrically separated by an electrical-insulation region (23) having a closed annular shape. The electrical-insulation region (23) is laterally completely surrounded by the external part (10a) and by the internal part (10, 10b). In one embodiment, the suspended mass (10) has the shape of a closed frame delimiting an opening (18), the sensing mass (20) is formed inside the opening (18) and is connected to the internal part (10b), and the mobile actuation electrodes (11) are connected to the external part (10a).
Abstract:
A driving mass (3) of an integrated microelectromechanical structure (1) is moved with a rotary motion about an axis of rotation (z), and a first sensing mass (16a) is connected to the driving mass (3) via elastic supporting elements (20) so as to perform a first detection movement in the presence or a first external stress. The driving mass (3) is anchored to an anchorage (7) arranged along the axis of rotation by elastic anchorage elements (8); an opening (9a) is provided within the driving mass, and the first sensing mass (16a) is arranged within the opening. The elastic supporting and anchorage elements render the first sensing mass (16a) fixed to the driving mass (3) in the rotary driving motion, and substantially decoupled from the driving mass in the detection movement.
Abstract:
A process for the fabrication of an inertial sensor with failure threshold, including the steps of: forming, on top of a substrate (2) of a semiconductor wafer (1), at least one sample element (6) embedded in a sacrificial region (3, 12); forming, on top of the sacrificial region (3, 12), a body (18) connected to the sample element (6); and etching the sacrificial region (3, 12), so as to free the body (18) and the sample element (6).
Abstract:
Micro-electro-mechanical structure formed by a substrate (41) of semiconductor material and a suspended mass (10, 20) extending above the substrate (41) and separated therefrom by an air gap (55). An insulating region (23, 24) of a first electrically insulating material extends through the suspended mass (10, 20) and divides it into at least one first electrically insulated suspended region and one second electrically insulated suspended region (10a, 10b, 20a, 20b). A plug element (46) of a second electrically insulating material different from the first electrically insulating material is formed underneath the insulating region (23, 24) and constitutes a barrier between the insulating region and the air gap (55) for preventing removal of the insulating region during fabrication, when an etching agent is used for removing a sacrificial layer and forming the air gap.
Abstract:
An integrated gyroscope (1), including an acceleration sensor (23) formed by: a driving assembly (16); a sensitive mass (6) extending in at least one first and second directions (X, Y) and being moved by the driving assembly (16) in the first direction (X); and by a capacitive sensing electrode (20), facing the sensitive mass. The acceleration sensor (23) has an rotation axis (A) parallel to the second direction (Y), and the sensitive mass (6) is sensitive to forces acting in a third direction (Z) perpendicular to the other directions. The capacitive sensing electrode (20) is formed by a conductive material region extending underneath the sensitive mass (6) and spaced therefrom by an air gap.
Abstract:
The gyroscope (1) is formed by a driving system (16) including a driving mass (5) having an open concave shape; an accelerometer including a sensing mass (6) and comprising mobile sensing electrodes (18); a linkage (24) connecting the driving mass (5) to the sensing mass (6). The sensing mass is surrounded on three sides by the driving mass and has a peripheral portion not facing the sensing mass. The mobile sensing electrodes (18) extend integral with the sensing mass from the peripheral portion not facing the driving mass (5) and are interleaved with fixed sensing electrodes (19a, 19b). Thereby, there are no passing electrical connections extending below the sensing mass (6). Moreover the linkage includes springs (24) placed equidistant from the center of gravity (G2) of the accelerometer, and the gyroscope (1) is anchored to the substrate with anchoring springs (10) placed equidistant from the center of gravity (G1) of the assembly formed by the driving system (16) and by the accelerometer (23).