公开(公告)号：JPH1097989A

公开(公告)日：1998-04-14

申请号：JP27288696

申请日：1996-09-25

Applicant: CANON KK

Inventor： EBINUMA RYUICHI

IPC: G03F7/20 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To make a stage stroke of a masking means smaller without affecting the synchronous scan control between an original plate and a substrate by providing a constitution where acceleration/deceleration of the masking means is not performed during exposure. SOLUTION: Wafer acceleration is started before exposure is started (t1 ), then the acceleration is finished (t2 ). Thereafter a settlement period for settling the vibration at wafer acceleration and that caused by servo-control to a specified scanning speed after acceleration, exposure is started (t3 ). After exposure (t4 ), deceleration is started (t5 ), and then the deceleration is finished (t6 ). The time period from exposure finish (t4 ) till deceleration start (t5 ) is an idle running time, and it is not required for the current shot whose exposure is finished, however, used as a settlement time when next shot is scan-exposed in reverse direction. Thereby the vibration at acceleration/deceleration of a masking means does not affect to exposure, for improved exposure precision.

公开(公告)号：JPH07135169A

公开(公告)日：1995-05-23

申请号：JP2420694

申请日：1994-02-22

Applicant: CANON KK

Inventor： EBINUMA RYUICHI ,  WATANABE YUTAKA

IPC: G03F1/22 ,  G03F7/20 ,  H01L21/027 ,  G03F1/16

Abstract: PURPOSE:To enable X-ray mask to be manufactured with high precision at low cost using an exposure system comprising a plurality of aligners which share a synchrotron radiation light source. CONSTITUTION:Within an X-ray lithography system comprising a plurality of X-ray aligners using an SOR light source device 1 as a common light source, an aligner 5 applicable to the X-ray mask reproduction is connected to at least one beam line 4. This beam line 4 is to be formed longer than wafer exposing beam lines 21-28 while making a smaller divergent angle (i.e., for augmenting the resolving power of exposure transfer).

公开(公告)号：JPH07130626A

公开(公告)日：1995-05-19

申请号：JP27551993

申请日：1993-11-04

Applicant: CANON KK

Inventor： EBINUMA RYUICHI

IPC: G03F7/20 ,  H01L21/027

Abstract: PURPOSE:To obtain always a desirable length and overrun length. CONSTITUTION:In an equipment which projects the pattern of a reticle 11 on a wafer 14 through an optical system 13, by scanning the reticle 11 and a wafer 14 to the exposure light, entrance length and overrun length at the time of scanning the reticle and the wafer are changed according to the scanning speed, by control means 17, 121, 151.

公开(公告)号：JPH0664185A

公开(公告)日：1994-03-08

申请号：JP6216993

申请日：1993-03-22

Applicant: CANON KK

Inventor： EBINUMA RYUICHI ,  HATTORI YOSHIFUMI ,  HITOTSUBASHI HIROO

IPC: B41J2/175

Abstract: PURPOSE:To simplify operation for mounting and demounting an ink tank and prevent erroneous mounting of improper matter, in an ink jet recording device using an ink tank which is detachable for exchanging it. CONSTITUTION:A ratchet member 215, which engages with a prescribed engaging part at an ink tank and allows its insertion and changes its position, is provided in an ink tank storage 20. Also, a spring 217 is provided for preventing a mounting of a matter. When the ink tank having the prescribed engaging part is inserted, the engaging part and the ratchet member 215 engage with each other, so that the ink tank is halted opposing energizing force of the spring 217.

公开(公告)号：JPH0449614A

公开(公告)日：1992-02-19

申请号：JP15869390

申请日：1990-06-19

Applicant: CANON KK

Inventor： EBINUMA RYUICHI

IPC: G03F7/20 ,  H01L21/027 ,  H05G2/00

Abstract: PURPOSE:To enable protection of an apparatus when a leak or a leakage of water occurs, without causing a damage in a window material by detecting a pressure in an exposure chamber, by detecting the leakage of water occurring in a temperature adjusting water channel and by opening a communication valve after a shut-off valve and a pump valve are closed, when a rise in pressure or the leakage of water occurs. CONSTITUTION:A control device 129 always monitors whether a pressure P in an exposure chamber 113 detected by a pressure sensor 120 exceeds a prescribed pressure PO or whether there is a leakage of water detected by a water leakage sensor 127, in an exposure operation. In either case when the pressure P exceeds the prescribed pressure PO due to a failure in load lock in a mask preliminary chamber 116 or a wafer preliminary chamber 109 or a failure in adjustment of the pressure in the exposure chamber 113 or when the leakage of water is detected, a shut-off valve 130 and a pump valve 124 are put in closed states, a communication valve 123 is put in an opened state in succession, and after the exposure chamber 113 is put in system-down, a display device is made to conduct a display that abnormality occurs in the exposure chamber 113.

公开(公告)号：JPH03253018A

公开(公告)日：1991-11-12

申请号：JP4958390

申请日：1990-03-02

Applicant: CANON KK

Inventor： EBINUMA RYUICHI ,  MIZUSAWA NOBUTOSHI ,  KARIYA TAKUO ,  SUDA SHIGEYUKI ,  UZAWA SHUNICHI

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To eliminate the exclusive stages for apertures for preventing respective photointerrupting bodies from shifting in the lateral direction thereby enabling the size of the photointerrupting bodies to be miniaturized by a method wherein the stages for shifting the photointerrupting bodies are used both as the stages for shifting the position slip detecting optical system. CONSTITUTION:Within an X-ray aligner, respective two axle stages for shifting pickups 6a-6d are composed of one axle stages 8a-8d capable of shifting in the lateral direction in parallel with respective sides 2a-2d of an exposure region 2 and the other one axle stages 9a-9d capable of shifting in the longitudinal direction perpendicular to said stages 8a-8d. Next, the shifting direction of the one axle stages 9a-9d is limited in the longitudinal direction only by loading the stages 9a-9d with the stages 8a-8d and then the stages 9a-9d are further loaded with photointerrupting bodies 7a-7d for limiting the exposure region 2. That is, the stages for shifting the pickups 6a-6d can be used both as the stages for shifting the photointerrupting sheets 7a-7d so that the exclusive stages for apertures may be eliminated to prevent the stages 9a-9d and the bodies 7a-7d from shifting in the lateral direction, thereby enabling the title exposure device to be miniaturized.

公开(公告)号：JPH0298121A

公开(公告)日：1990-04-10

申请号：JP24990388

申请日：1988-10-05

Applicant: CANON KK

Inventor： WATANABE YUTAKA ,  EBINUMA RYUICHI ,  MOCHIZUKI NORITAKA ,  UNO SHINICHIRO ,  OZAWA KUNITAKA ,  MIZUSAWA NOBUTOSHI

IPC: G21K5/00 ,  G03F7/20 ,  G21K5/02 ,  H01L21/027 ,  H01L21/30 ,  H05H13/04

Abstract: PURPOSE:To reduce the damage to a mirror by a method wherein a mirror protective shutter is provided on the position nearer to an X-ray source than any mirrors and the shutter is kept open while the X-ray amount required for exposure is to be passed. CONSTITUTION:X-rays 2 having limited scatter angle emitted from an X-ray source 1 enter into a mirror 3. A mirror protective shutter 7 is provided on the X-ray source 1 side of the mirror 3 nearest to the X-ray source and vulnerable to the damage from the X-rays 2. This shutter 7 is kept open while the least X-ray amount required for exposure is to be passed. In order to pass the specified amount of X-ray required for exposure immediately after opening the shutter 7, an exposure adjusting shutter 10 is opened while the shutter 7 is to be closed immediately after the shutter 10 is closed. Through these procedures, the mirror 3 is not irradiated with the X-ray while the shutter 7 is being closed so that the damage to the mirror 3 may be reduced.

公开(公告)号：JPH0290513A

公开(公告)日：1990-03-30

申请号：JP24307688

申请日：1988-09-27

Applicant: CANON KK

Inventor： EBINUMA RYUICHI ,  MIZUSAWA NOBUTOSHI ,  SUZUKI MASAYUKI ,  UNO SHINICHIRO ,  MORI TETSUZO ,  KUROSAWA HIROSHI

IPC: H05H13/04 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To substantially make uniform the quantity of absorption of radioactive rays of the photosensitive material in the region of exposure by a method wherein the speed of shifting of the front and the rear edges of a shutter device for the passage and interruption of radiant rays passing the region to be exposed is controlled. CONSTITUTION:A sensor 104 is provided on a wafer shifting stage 103, the sensor 104 is shifted in X and Y directions, and it measures the intensity of illumination of an optional point in an irradiation region 120. The main shutter (movable aperture) 105, composed of a belt having an aperture, constitutes an exposure shutter together with an auxiliary shutter 106. The main shutter 105 and the auxiliary shutter 106 are controlled respectively by a controller 113. The controller 113 controls the main shutter 105 based on the illuminance of each point in the irradiation region 120 measured using a sensor 104. Also, the auxiliary shutter 106 is opened before starting the exposure control by the main shutter 105, and the auxiliary shutter 106 is controlled in such a manner that it is closed after the opening of the shutter 106 has been finished.

公开(公告)号：JPH0273617A

公开(公告)日：1990-03-13

申请号：JP22471288

申请日：1988-09-09

Applicant: CANON KK

Inventor： MIZUSAWA NOBUTOSHI ,  EBINUMA RYUICHI ,  KARIYA TAKUO ,  SHIMODA ISAMU

IPC: H01L21/30 ,  G03F7/20 ,  H01L21/027

Abstract: PURPOSE:To set the moving region of an alignment unit and a screen size to minimum limits, and to increase the mounting region of other component by setting the length of a direction perpendicular to and parallel to the edge of a blade to a predetermined length in response to maximum/minimum exposure screen angle. CONSTITUTION:The length of a blade BLD in a direction perpendicular to an edge for specifying the screen of the blade is increased slightly larger than (lEX-lmin)/2, where lEX is the direction of a screen sufficiently necessary to radiate at the maximum exposure screen angle, and lmin is the length of the minimum exposure screen angle. The length of the blade BLD of a direction along the edge is slightly increased larger than lmax+lSTG, where lSTG is the distance of an alignment unit AAU for detecting the deviation of an alignment mark on a wafer and an alignment mark AMK on a mask MSK moving in a direction along the edge, and lmax is the maximum exposure screen angle of this aligner. Thus, the moving region and screen size of the unit AAU are minimized to increase the mounting region of other components.

公开(公告)号：JPS63160859A

公开(公告)日：1988-07-04

申请号：JP30793986

申请日：1986-12-25

Applicant: CANON KK

Inventor： MIZUSAWA NOBUTOSHI ,  CHIBA YUJI ,  EBINUMA RYUICHI

IPC: B41J2/01 ,  B41J2/165 ,  B41J2/175 ,  B41J11/14 ,  B41J29/02 ,  B41J29/377 ,  G03G21/16 ,  H04N1/00 ,  H04N1/04

Abstract: PURPOSE:To secure a large working area with respect to a recording head and to facilitate emitting recovery processing, by mounting a holding means for holding a platen in a manner detachable from the position opposed to emitting orifice and a drive means for driving said holding means to detach the platen from the opposed position. CONSTITUTION:Platen members 203A, 203B are respectively connected to shafts 253A, 253B through arms 251A, 251B and are revolvable around said shafts in a direction opening a recording surface. At the time of recording, by holding butt surfaces 204A, 204B to a contact state, the platen members 203A, 203B form a platen 203 prescribing the recording surface of a recording medium due to a recording head 101. At the time of maintenance, a motor 260 is driven to open the platen members 203A, 203B left and right, and a space is secured on the underside of the recording head 101 to make it possible to perform emitting recovery processing such that ink absorbing body is brought into contact with the emitting orifice of the recording head 101 to perform the cleaning thereof or allowed to be approximate and opposed thereto to perform the preparatory emission of said emitting orifice.