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    Fixation by ion exchange of toxic materials in a glass matrix
    91.
    发明授权
    Fixation by ion exchange of toxic materials in a glass matrix 失效
    通过玻璃基质中有毒物质的离子交换固定

    公开(公告)号：US4469628A

    公开(公告)日：1984-09-04

    申请号：US370437

    申请日：1982-04-21

    Applicant: Catherine J. Simmons ,  Joseph H. Simmons ,  Pedro B. Macedo ,  Theodore A. Litovitz

    Inventor： Catherine J. Simmons ,  Joseph H. Simmons ,  Pedro B. Macedo ,  Theodore A. Litovitz

    IPC: B01D15/00 ,  B01J39/02 ,  B01J39/10 ,  B01J39/14 ,  C02F1/42 ,  G21F9/12 ,  G21F9/16 ,  G21F9/30 ,  C09K3/00 ,  C09K11/04

    CPC classification number: C03C1/002 ,  B01J39/14 ,  C03C1/026 ,  C03C11/005 ,  C03C21/001 ,  C03C23/0095 ,  C03C3/06 ,  C03C3/061 ,  C03C3/089 ,  G21F9/12 ,  G21F9/305 ,  C03C2201/10 ,  C03C2201/20 ,  C03C2201/23 ,  C03C2201/3435 ,  C03C2201/40 ,  C03C2201/50

    Abstract: This invention relates to the immobilization of toxic, e.g., radioactive, materials in a silicate glass or silica gel matrix for extremely long periods of time. Toxic materials, such as radioactive wastes containing radioactive cations, which may be in the form of liquids, or solids dissolved or dispersed in liquids or gases, are incorporated into a glass or silica gel matrix, having alkali metal, Group Ib metal and/or ammonium cations bonded to silicon atoms of said glass or silica gel through divalent oxygen linkages, by a process which involves the ion exchange of said toxic or radioactive cations with said alkali metal, Group Ib metal and/or ammonium cations to bind said toxic or radioactive cations to silicon atoms of said glass or silica gel through said silicon-bonded divalent oxygen linkages. Thereafter, the resulting glass or silica gel now characterized by toxic or radioactive cations bonded to silicon atoms through divalent oxygen linkages can be stored, or packaged in suitable containers, or disposed of as by burial, and/or sintered to collapse the pores thereof.

    Abstract translation: 本发明涉及将硅酸盐玻璃或硅胶基质中的有毒的，例如放射性物质固定在极长时间内。 将含有放射性阳离子的放射性废物（其可以是液体的形式）或溶解或分散在液体或气体中的固体的有毒材料掺入玻璃或硅胶基质中，其具有碱金属，Ib族金属和/或 通过涉及所述有毒或放射性阳离子与所述碱金属，第Ib族金属和/或铵阳离子离子交换以结合所述有毒或放射性的方法的方法，通过二价氧键与所述玻璃或硅胶的硅原子键合的铵阳离子 通过所述硅键合的二价氧键与所述玻璃或硅胶的硅原子的阳离子。 此后，所得到的玻璃或硅胶的特征在于通过二价氧键与硅原子键合的有毒或放射性阳离子，可以储存或包装在合适的容器中，或通过埋置和/或烧结来处理以使其孔隙折叠。

    Thermally stable quartz glass
    92.
    发明授权
    Thermally stable quartz glass 失效
    耐热稳定的石英玻璃

    公开(公告)号：US4104045A

    公开(公告)日：1978-08-01

    申请号：US702835

    申请日：1976-07-06

    Applicant: Manfred Mansmann

    Inventor： Manfred Mansmann

    IPC: C03B37/01 ,  C03C3/06 ,  C03C3/076 ,  C03C13/00 ,  C04B35/622 ,  C03B37/00 ,  C03B32/00 ,  C04B35/64

    CPC classification number: C04B35/6224 ,  C03B37/011 ,  C03C13/00 ,  C03C3/06 ,  C03C2201/40 ,  C03C2203/22

    Abstract: Quartz glass of high thermal stability is produced from a SiO.sub.2 solution or sol which is substantially free of alkali and alkaline earth metal oxides and contains chromium and/or manganese in about 0.05 to 20% by weight of the SiO.sub.2 expressed as Cr.sub.2 O.sub.3 and Mn.sub.2 O.sub.3. The quartz glass upon heating above 1100.degree. C forms cristobalite having an average crystallite size of about 100 to 500 A. Articles therefrom retain their physical and mechanical properties at high temperatures. The materials are suited for producing fibers by the usual methods of spinning from solutions or sols and, as such, or as fibers they are suited for use in reinforcement and insulation and in making flameproof textiles.

    Abstract translation: 具有高热稳定性的石英玻璃由基本上不含碱金属和碱土金属氧化物的SiO 2溶液或溶胶制成，并且含有以Cr2O3和Mn2O3表示的约0.05至20重量％的铬和/或锰。 在1100℃以上加热的石英玻璃形成平均微晶尺寸为约100至500的方石石。其制品在高温下保持其物理和机械性能。 这些材料适用于通过从溶液或溶胶中旋转的通常方法，或者作为适合用于加强和绝缘以及制造防火织物的纤维来生产纤维。

    Method for reproducing quartz glass jig
    95.
    发明专利
    Method for reproducing quartz glass jig 有权

    公开(公告)号：JP5001524B2

    公开(公告)日：2012-08-15

    申请号：JP2005132925

    申请日：2005-04-28

    Applicant: 信越石英株式会社

    Inventor： 龍弘 佐藤 ,  逸男 荒木 ,  朗 藤ノ木

    IPC: C03B32/00 ,  C03B20/00 ,  H01L21/3065

    CPC classification number: C03B32/00 ,  C03B23/20 ,  C03C3/06 ,  C03C23/007 ,  C03C23/0075 ,  C03C2201/34 ,  C03C2201/40 ,  C03C2201/54

    Abstract: To provide a technique with which a quartz glass jig and a doped quartz glass jig are regenerated by completely removing the impurities which are attached to the surface and the impurities which have diffused into the interior from quartz glass jigs which have been used in semiconductor production processes and then carrying out working repair and removing the contamination from the working processes as well. After use, the impurities are removed from the aforementioned quartz glass jigs in the said purification treatment process which includes a purification treatment process in which the quartz glass jigs are subjected to a purification treatment in a gaseous atmosphere which includes a halogen element at a temperature within the region above a prescribed temperature.

    F-doped quartz glass and process of making same
    97.
    发明专利
    F-doped quartz glass and process of making same 有权
    F-DOPED QUARTZ玻璃及其制造方法

    公开(公告)号：JP2008156206A

    公开(公告)日：2008-07-10

    申请号：JP2007225718

    申请日：2007-08-31

    Applicant: Corning Inc ,  コーニング インコーポレイテッド

    Inventor： MOORE LISA A ,  SMITH CHARLENE M

    IPC: C03C3/06 ,  C03B8/04 ,  C03B20/00 ,  G02B1/02

    CPC classification number: C03B19/1461 ,  C03B19/12 ,  C03B19/14 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/061 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/22 ,  C03C2201/40 ,  C03C2201/50 ,  Y02P40/57

    Abstract: PROBLEM TO BE SOLVED: To provide an F-doped quartz glass material used in the lithographic application operating at a shorter wavelength than about 300 nm, which shows a lower polarization-induced birefringence or preferably, does not show the polarization-induced birefringence substantially even after being subjected to 10 million pulses of linearly polarized pulsed laser beam at 157 nm having a fluence of 250 μJ×cm -2 ×pulse -1 and a pulse length of 30 ns. SOLUTION: The F-doped synthetic quartz glass material contains, by weight, less than 50 ppm of Cl, less than 50 ppb of Na, less than 50 ppb in total of transition metals, and 0.1-5,000 ppm of fluorine. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：为了提供在光刻应用中使用的F掺杂的石英玻璃材料，其操作在比约300nm更短的波长，其表现出较低的偏振引起的双折射，或者优选地，不显示极化诱导的 即使在经受了1000万脉冲的线性偏振脉冲激光束（157nm）的照射条件下，双折射基本上具有250μJ×cm -2 SPF脉冲 -1 的脉冲，脉冲 长度为30 ns。 解决方案：掺杂F的合成石英玻璃材料含有小于50ppm的Cl，小于50ppb的Na，小于50ppb的过渡金属和0.1-5,000ppm的氟。 版权所有（C）2008，JPO＆INPIT

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