公开(公告)号：EP0211002A1

公开(公告)日：1987-02-25

申请号：EP86900374.0

申请日：1985-11-25

Applicant: Hughes Aircraft Company

Inventor： KNAUER, Wolfgang

IPC: H01J37 ,  H01L21

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/3007 ,  H01J37/3174 ,  H01J2237/043 ,  H01J2237/31776

Abstract: Une source de particules chargées (14) produit un faisceau (20) qui est aligné sur une première plaque d'ouverture ayant une première ouverture (28). Le faisceau passant au travers est dévié par des plaques de déviation (32, 34, 38 et 40) par rapport à une seconde ouverture (46) dans une seconde plaque d'ouverture (44). L'image (50) de la seconde ouverture (46) est focalisée sur le porte-cible (16) et l'image virtuelle de l'empreinte (58) du faisceau dévié est focalisée sur le porte-cible (16) également. Lorsque ces image se chevauchent, un faisceau modelé (56) passe au travers. Le balayage par les plaques de déviation (52 et 54) du faisceau sur le porte-cible permet de produire par exposition des tracés (62) aux contours nets en positionnant l'image (60a) à l'intérieur de la marge (64) et puis en balayant l'image (50b) pour obtenir par exposition le contour net, et ensuite en captant l'image (60) de manière à balayer le tracé à produire par exposition.

公开(公告)号：KR1020160127636A

公开(公告)日：2016-11-04

申请号：KR1020160024128

申请日：2016-02-29

Applicant: 가부시키가이샤 어드밴티스트

Inventor： 야마다,아키오 ,  세야마,마사히로 ,  나스노,히데키

IPC: G03F7/20 ,  G03F1/20 ,  G03F1/44 ,  G03F1/50

CPC classification number: H01J37/3045 ,  H01J37/20 ,  H01J37/244 ,  H01J37/3177 ,  H01J2237/043 ,  H01J2237/0435 ,  H01J2237/15 ,  H01J2237/2025 ,  H01J2237/20285 ,  H01J2237/30455 ,  H01J2237/31766 ,  H01J2237/31774

Abstract: [과제] 하전입자빔을이용하여, 스테이지의이동오차를저감시켜복잡하고미세한패턴을형성한다. [해결수단] 하전입자빔을발생하는빔 발생부와, 시료를탑재하고, 해당시료를빔 발생부에대하여상대적으로이동시키는스테이지부와, 스테이지부의위치를검출하는검출부와, 스테이지부의검출위치에기초하여, 스테이지부의구동량을예측한예측구동량을생성하는예측부와, 예측구동량에기초하여, 하전입자빔을시료에조사하는조사제어를행하는조사제어부를구비하는노광장치및 노광방법을제공한다.

Abstract translation: 目的：通过减少阶段的运动误差，使用带电粒子束形成复杂和精细的图案。 实现目的的手段：曝光装置，包括产生带电粒子束的光束产生部分; 具有安装在其上的样品（10）的台阶部（110），并使样本相对于束生成部移动; 检测部，其检测所述台部的位置; 预测部（1000），其基于所述舞台部的检测位置生成预测所述舞台部的驱动量而得到的预测驱动量; 以及照射控制部（170），其根据预测的驱动量进行照射带电粒子束的样品的照射控制。 还提供了一种曝光方法。

公开(公告)号：KR1020160007435A

公开(公告)日：2016-01-20

申请号：KR1020150098463

申请日：2015-07-10

Applicant: 아이엠에스 나노패브릭케이션 아게

Inventor： 플라츠굼머엘마

IPC: H01J37/302 ,  H01J37/317 ,  G06F17/50 ,  H01J37/04

CPC classification number: H01J37/3177 ,  G06F17/5072 ,  G06F17/5081 ,  H01J37/045 ,  H01J37/09 ,  H01J37/3026 ,  H01J37/3175 ,  H01J2237/043 ,  H01J2237/3175 ,  H01J2237/31764

Abstract: 가능하게는상이한타입의기준기록툴에매치하도록하전입자멀티빔처리장치에서타겟에소정의패턴을노출시키기위해사용되는노출패턴이계산된다. 이러한소정의패턴(160)은타겟위의이미지에어리어에, 래스터그래픽스와같은, 기준툴에적절한그래픽표현으로서제공된다. 이러한그래픽표현의엘리먼트로부터상기엘리먼트의공칭위치주위에중심이있는화소의그룹으로의맵핑을기술하는컨볼루션커널(162)이사용된다. 이러한컨볼루션커널과의그래픽표현의컨볼루션에의해공칭노출패턴이계산되는데, 상기공칭노출패턴은상기처리장치에의해노출될때 타겟위에공칭선량분포를생성하기에적절하다.

Abstract translation: 带电粒子多光束处理装置可以计算用于将预定图案暴露于目标的曝光图案，以便匹配不同类型的参考记录工具。 预定图案（160）提供适合于参考工具的图形表达，例如目标图像区域中的光栅图形。 卷积核心（162）用于将图形表达式的元素映射到具有围绕元件的标称位置的中心的像素组上。 通过图形表达式和卷积核（162）的卷积计算标称曝光图案，从而当标称曝光图案被处理装置曝光时，产生目标上的标称剂量分布。

公开(公告)号：KR101191943B1

公开(公告)日：2012-10-17

申请号：KR1020077019837

申请日：2006-02-03

Applicant: 베리안 세미콘덕터 이큅먼트 어소시에이츠, 인크.

Inventor： 로우,러셀제이. ,  앤젤,고든씨.

IPC: H01J37/147 ,  H01L21/265

CPC classification number: H01J37/304 ,  H01J37/147 ,  H01J37/3171 ,  H01J2237/043 ,  H01J2237/15 ,  H01J2237/1501 ,  H01J2237/20228 ,  H01J2237/3045 ,  H01J2237/30472

Abstract: 이온 주입기의 분석기 모듈은 이온 빔의 말단 이온 빔 부분이 방출되는 분해 개구에 인접하게 배치된 빔 편향 장치를 포함한다. 빔 편향 장치는 제1 동작 상태에서 실질적으로 0볼트를 갖는 빔 편향 전압의 제1의 값에 응답하여, 소스 이온 빔 부분을 분해 개구로 향하게 하여 말단 이온 빔 부분을 생성시킨다. 빔 편향 전압이 제2 동작 상태에서 더 높은 제2의 값을 가질 때, 빔 편향 장치는 소스 이온 빔 부분을 분해 개구로부터 이탈하는 방향으로 향하게 하여 말단 이온 빔 부분이 소멸된다. 빔 제어 회로는 제2 동작 상태 중에 제2 빔 편향 전압을 제1 빔 편향 전압으로 신속하게 스위칭 하여 제2 동작 상태에서 제1 동작 상태로 전이되도록 동작한다. 주입 중에 발생된 글리치를 복구함에 있어 전술한 특징을 포함하는 주입 방식을 채용하면, 주입되는 웨이퍼의 수율이 향상된다.

公开(公告)号：US20180269034A1

公开(公告)日：2018-09-20

申请号：US15888118

申请日：2018-02-05

Applicant: NuFlare Technology, Inc.

Inventor： Haruyuki NOMURA

IPC: H01J37/317 ,  H01J37/04 ,  H01J37/10 ,  H01J37/09 ,  H01J37/24

CPC classification number: H01J37/3175 ,  H01J37/045 ,  H01J37/09 ,  H01J37/10 ,  H01J37/243 ,  H01J37/3174 ,  H01J2237/043 ,  H01J2237/30433 ,  H01J2237/31776

Abstract: In one embodiment, a charged particle beam writing apparatus includes a current limiting aperture, a blanking deflector switching between beam ON and beam OFF so as to control an irradiation time by deflecting the charged particle beam having passed through the current limiting aperture, a blanking aperture blocking the charged particle beam deflected by the blanking deflector in such a manner that the beam OFF state is entered, and an electron lens disposed between the current limiting aperture and the blanking aperture. A lens value set for the electron lens is substituted into a given function to calculate an offset time. The offset time is added to an irradiation time for writing a pattern to correct the irradiation time. The blanking deflector switches between the beam ON and the beam OFF based on the corrected irradiation time.

公开(公告)号：US10062545B2

公开(公告)日：2018-08-28

申请号：US15062692

申请日：2016-03-07

Applicant: CANON ANELVA CORPORATION

Inventor： Yasushi Kamiya ,  Einstein Noel Abarra ,  Yuta Konno

IPC: H01J37/302 ,  H01J37/305 ,  G05B15/02

CPC classification number: H01J37/302 ,  G05B15/02 ,  H01J37/3053 ,  H01J2237/0044 ,  H01J2237/043 ,  H01J2237/334

Abstract: A computer-readable recording medium encoded with a computer program for executing an ion etching method of etching a substrate arranged on a substrate holder using an ion beam etching apparatus. The computer program includes a decremental control program having a command according to which the first step is executed; and an incremental control program having a command according to which the second step is executed.

公开(公告)号：US20180040453A1

公开(公告)日：2018-02-08

申请号：US15665839

申请日：2017-08-01

Applicant: NuFlare Technology, Inc.

Inventor： Tsubasa NANAO ,  Yukitaka Shimizu

IPC: H01J37/09 ,  H01J37/304 ,  H01J37/20 ,  H01J37/317 ,  H01J37/04

CPC classification number: H01J37/09 ,  H01J37/045 ,  H01J37/20 ,  H01J37/304 ,  H01J37/3177 ,  H01J2237/043 ,  H01J2237/153 ,  H01J2237/24475 ,  H01J2237/30472

Abstract: In one embodiment, a multi charged particle beam writing apparatus includes an emitter that emits a charged particle beam, an aperture plate in which a plurality of openings are formed and that forms multiple beams by allowing the charged particle beam to pass through the plurality of openings, a blanking plate provided with a plurality of blankers that each perform blanking deflection on a corresponding beam included in the multiple beams, a stage on which a substrate irradiated with the multiple beams, a detector that detects a reflection charged particle from the substrate, feature amount calculation circuitry that calculates a feature amount of an aperture image based on a detection value of the detector, and aberration correction circuitry that corrects aberration of the charged particle beam based on the feature amount.

公开(公告)号：US20160336141A1

公开(公告)日：2016-11-17

申请号：US15145398

申请日：2016-05-03

Applicant: NuFlare Technology, Inc.

Inventor： Haruyuki NOMURA

IPC: H01J37/14 ,  H01J37/317

CPC classification number: H01J37/14 ,  H01J37/063 ,  H01J37/09 ,  H01J37/3174 ,  H01J2237/043 ,  H01J2237/0451 ,  H01J2237/0458 ,  H01J2237/0653

Abstract: A charged particle beam writing apparatus includes a limiting aperture member at the downstream side of the emission source, arranged such that its height position can be selectively adjusted, according to condition, to be one of the n-th height position (n being an integer of 1 or more) based on the n-th condition depending on at least one of the height position of the emission source and an emission current value, and the (n+m)th height position (m being an integer of 1 or more) based on the (n+m)th condition depending on at least one of the height position of the emission source and the emission current value, and a shaping aperture member at the downstream side of the electron lens and the limiting aperture member to shape the charged particle beam by letting a part of the charged particle beam pass through a second opening.

Abstract translation: 带电粒子束写入装置包括在发射源的下游侧的限制孔径构件，其布置成使得其高度位置可以根据条件被选择性地调节为第n高度位置之一（n为整数） 基于根据发光源的高度位置和发射电流值中的至少一个的第n个条件，并且第（n + m）个高度位置（m是1或更大的整数） ）基于取决于发射源的高度位置和发射电流值中的至少一个的第（n + m）条件，以及在电子透镜的下游侧的成形孔构件和限制孔径构件 带电粒子束通过使一部分带电粒子束通过第二个开口。

公开(公告)号：US09401261B2

公开(公告)日：2016-07-26

申请号：US14852699

申请日：2015-09-14

Applicant: NuFlare Technology, Inc.

Inventor： Yasuyuki Taneda ,  Yoshiro Yamanaka

IPC: H01J37/30 ,  B01J19/08 ,  H01J37/317 ,  H01J37/04 ,  H01J37/147

CPC classification number: H01J37/3002 ,  B01J19/087 ,  B01J2219/0801 ,  B01J2219/085 ,  B01J2219/0869 ,  B01J2219/0875 ,  C01B13/10 ,  H01J37/045 ,  H01J37/147 ,  H01J37/3174 ,  H01J2237/006 ,  H01J2237/043 ,  H01J2237/15

Abstract: An ozone supplying apparatus according to an embodiment of the present invention is an ozone gas supplying apparatus which supplies an ozone gas to a vacuum apparatus. The ozone supplying apparatus includes an ozone generator configured to generate the ozone gas, a first flow controller configured to control a flow rate of the ozone gas generated by the ozone generator, a second flow controller configured to control a flow rate of the ozone gas supplied to the vacuum apparatus, and a main pipe provided on a secondary side of the first flow controller and on a primary side of the second flow controller, with the ozone gas being introduced into the main pipe at such a flow rate that an internal pressure of the main pipe is controlled to be lower than atmospheric pressure by the first flow controller.

Abstract translation: 根据本发明的实施方式的臭氧供给装置是向真空装置供给臭氧气体的臭氧气体供给装置。 所述臭氧供给装置具备构成为产生所述臭氧气体的臭氧发生器，构成为控制由所述臭氧发生器产生的臭氧气体的流量的第一流量控制器，构成为控制供给的臭氧气体的流量的第二流量控制器 以及设置在第一流量控制器的次级侧和第二流量控制器的初级侧上的主管，其中臭氧气体以这样的流量被引入到主管中， 主管由第一流量控制器控制为低于大气压力。

公开(公告)号：US20160064179A1

公开(公告)日：2016-03-03

申请号：US14838907

申请日：2015-08-28

Applicant: NuFlare Technology, Inc.

Inventor： Hiroshi YAMASHITA ,  Ryoichi YOSHIKAWA ,  Kazuhiro CHIBA ,  Hiroshi MATSUMOTO

IPC: H01J37/04

CPC classification number: H01J37/045 ,  H01J37/1471 ,  H01J37/20 ,  H01J37/3026 ,  H01J37/3177 ,  H01J2237/043 ,  H01J2237/0435 ,  H01J2237/20292 ,  H01J2237/30483 ,  H01J2237/3175

Abstract: A blanking device for multi-beams includes arrayed plural separate blanking systems, each performing blanking control switching a corresponding beam of multi charged particle beams between a beam ON state and a beam OFF state and each including a first electrode, a first potential applying mechanism applying two different potentials selectively to the first electrode for the blanking control, and a second electrode performing blanking deflection of the corresponding beam, the second electrode being grounded and paired with the first electrode, and a potential change mechanism changing a potential of the second electrode from a ground potential to another potential, wherein when a potential of the first electrode included in one of the separate blanking systems is fixed to the ground potential, the potential change mechanism changes the potential of the second electrode corresponding to the first electrode fixed to the ground potential, from the ground potential to the another potential.

Abstract translation: 用于多光束的消隐装置包括排列的多个单独的消隐系统，每个消隐控制系统执行消隐控制，以在光束接通状态和光束关闭状态之间切换相应的多带电粒子束束，并且每个包括第一电极，第一电位施加机构 选择性地与用于消隐控制的第一电极相对应的两个不同的电位，以及执行相应光束的消隐偏转的第二电极，第二电极与第一电极接地并配对;以及电位改变机构，改变第二电极的电位 将地电位转换为另一电势，其中当包括在一个分离的消隐系统中的第一电极的电位固定到接地电位时，电位改变机构改变对应于固定到地面的第一电极的第二电极的电位 潜力，从地面潜力到另一个潜力 。