Abstract:
본 발명은 디스플레이, 반도체, 태양전지 등 공정챔버내 부품들의 처짐에 따른 변형을 실시간으로 측정할 수 있는 검사 장치에 관한 것이다. 본 발명에 따른 처짐 감지 장치에 따르면, 시간이 지남에 따라 처짐 현상이 발생하는 부품들을 실시간으로 모니터하여, 부품의 변형으로 발생되는 각종 공정이슈들을 사전에 방지할 수 있는 효과가 있다.
Abstract:
본 발명은 반도체 제조 공정에 있어서 화학 증착법에 이용되는 전구체의 증기압을 실시간으로 측정하기 위한 측정 시스템 및 방법에 관한 것이다. 본 발명에 따른 반도체 제조공정을 위한 전구체의 실시간 증기압 측정 시스템에 의하면, 온도변화에 따른 전구체의 석출 및 전구체의 미소 탈기에 따른 압력 변화의 가능성을 현저하게 줄임으로써 보다 정확한 증기압을 실시간으로 측정할 수 있는 특징이 있다. 이에 따라 획득되는 증기압 관련 열역학적 데이터는 화학 증착법을 사용하는 반도체 제조공정 등에서 유용하게 활용할 수 있다.
Abstract:
PURPOSE: A particle beam mass spectroscopy is provided to improve the productivity and yield by monitoring the nano particles. CONSTITUTION: An aerodynamic lens(10) forms a particle beam by accelerating the gas flow. An electron gun(30) forms charged particle beam by ionizing the particle beam and accelerating thermoelectron. A deflector(40) refracts the charged particle beam by the kinetic energy to charge ratio. A sensor(50) measures current by the charged particle beam. A magnetic field generating unit creates restriction magnet field for restricting thermoelectron.
Abstract:
PURPOSE: A surface contaminant preventing device, which is protected from the particles and by-products generated in a vacuum process, is provided to increase the reliability of equipment or sensor by easily analyzing the particles and by-products. CONSTITUTION: A surface contaminant preventing device comprises a sound wave generator(70) and a wedge unit(80). The sound wave generator is installed in the outside of a beam emitting zone of an emitting window(40) and a beam incident zone of an incidence window(30). The lower-part of the wedge unit is contacted with the beam emitting zone of an emitting window and the beam incident zone of an incidence window.
Abstract:
본 발명은 산화아연 나노와이어에 전이금속을 도핑하는 방법에 관한 것으로, 상세하게는 a) 기판 상부에 아연박막을 형성시키는 단계; b) 아연박막이 형성된 기판을 아연염, 환원제 및 전이금속염을 함유하는 수용액에 침지하는 단계; 및 c) 상기 수용액에 초음파를 가하여 상기 아연박막 상에 전이금속이 도핑된 산화아연 나노와이어를 생성 및 성장시키는 단계;를 포함하는 특징이 있다. 초음파, 공동효과, 산화아연, 나노와이어, 불순물, 전이금속, 도핑
Abstract:
PURPOSE: A method for evaluating plasma resistance using arc is provided to evaluate the durability of a component by applying arc to a chamber and measuring emitted particles from the coating layer of a component. CONSTITUTION: The specimen of a coating component and an optical emission spectroscopy(OES) are arranged in a chamber(P1). Plasma is generated in the chamber in order to apply arc to the specimen of the coating component(P2). Particles are emitted from the specimen by the arc. The OES analyzes the particles in order to quantify the peak size of aluminum or oxygen component(P3). Based on the analysis data, plasma resistance is evaluated(P4).
Abstract:
A method for measuring the size distribution of particle and a recording medium storing a program to implement the method are provided to accurately and successively measure the size distribution of the particle includes in aerosol. A method for measuring the size distribution of particle comprises: a step of passing purifier and aerosol through a DMA(differential mobility analyzer)(S30); a step of measuring the discharge voltage and inner pressure of the DMA(S40); a step of separating the particle included in the aerosol to a specific collection of particles of m(S50); a step of getting an electrical mobility centroid of a DMA transfer function belonging to a K particle collection(S70); a step of estimating the electrical mobility distribution of the particle charged at the charging step(S80); a step of estimating the total particle number concentration of the separated K particle collections(S90); a step of estimating the electrical mobility distribution of the particle before the charging step(S120); and a step of measuring the size distribution of the particle included in the aerosol(S130).
Abstract:
A structure for diagnosis system of reaction process is provided to easily control the incident window of the analytical laboratory and temperature of the emergent window according to the temperature of by-product. The by-product is stored in the analytical laboratory(4130). The incident window(4131) and emergent window(4122) are installed at the analytical laboratory. The light ray is delivered to the analytical laboratory through the incident window and emergent window. The first gas receiver(4110) is formed in the outer side surface of the analytical laboratory. The first gas receiver is connected with the second gas receiver. The receiving part incident window(4111) is installed at the first gas receiver. The light ray is delivered to the first gas receiver through the receiving part incident window. The receiving part emergent window is installed at the second gas receiver.
Abstract:
A liquid level measuring apparatus with a disturbance prevention device is provided to reduce a defect rate of products by surely measuring the level of liquid chemicals in real time while the chemicals are filled in a container. A liquid level measuring apparatus includes a container(200), a liquid level measuring unit, an A/D converter, a controller, an alarm, and a disturbance prevention device(1000). The container contains the liquid chemicals for use in a chemical deposition process. The liquid level measuring unit includes an ultrasonic sensor(510). The ultrasonic sensor is arranged on the bottom of the container for measuring the level of the liquid chemicals. The A/D converter is connected to the liquid level measuring unit and converts analog signals to digital signals. The controller is connected to the A/D converter and checks whether the level of the liquid chemicals is lower than the standard. The alarm is connected to the controller and operates when the level of the liquid chemicals is lower than the standard. The disturbance prevention device prevents disturbance of the liquid chemicals in the container while the liquid chemicals is compensated through a supply pipe(310).
Abstract:
A liquid level measuring apparatus is provided to reduce a defect rate of products by surely measuring the level of liquid chemicals while the chemicals are filled in a container. A liquid level measuring apparatus includes a container(200), a liquid level measuring unit, an A/D converter, a controller, an alarm, and a sub liquid level measuring unit. The container contains the liquid chemicals for use in a chemical deposition process. The liquid level measuring unit includes an ultrasonic sensor(510). The ultrasonic sensor is arranged on the bottom of the container for measuring the level of the liquid chemicals. The A/D converter is connected with the liquid level measuring unit and converts analog signals to digital signals. The controller is connected to the A/D converter and checks whether the level of the liquid chemicals is lower than the standard or not. The alarm is connected to the controller and operates when the level of the liquid chemicals is lower than the standard. The sub liquid level measuring unit is installed to allow the liquid level measuring unit to accurately measure the level despite disturbance of the liquid chemicals.