公开(公告)号：US09932261B2

公开(公告)日：2018-04-03

申请号：US15297534

申请日：2016-10-19

Applicant: Corning Incorporated

Inventor： Sezhian Annamalai ,  Steven Bruce Dawes ,  Carlos Alberto Duran ,  Kenneth Edward Hrdina ,  William Rogers Rosch ,  Bryan Ray Wheaton

IPC: C03C3/06 ,  C03C3/089 ,  C03B25/02 ,  C03C4/00 ,  C03B19/14

CPC classification number: C03C3/089 ,  C03B19/14 ,  C03B25/02 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/10 ,  C03B2201/42 ,  C03C3/06 ,  C03C4/00 ,  C03C23/007 ,  C03C2201/10 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/54

Abstract: A doped silica-titania (“DST”) glass article that includes a glass article having a glass composition comprising a silica-titania base glass containing titania at 7 to 14 wt. % and a balance of silica, and a dopant selected from the group consisting of (a) F at 0.7 to 1.5 wt. %, (b) B2O3 at 1.5 to 5 wt. %, (c) OH at 1000 to 3000 ppm, and (d) B2O3 at 0.5 to 2.5 wt. % and OH at 100 to 1400 ppm. The glass article has an expansivity slope of less than about 1.3 ppb/K2 at 20° C. For DST glass articles doped with F or B2O3, the OH level can be held to less than 10 ppm, or less than 100 ppm, respectively. In many aspects, the DST glass articles are substantially free of titania in crystalline form.

公开(公告)号：US20160200620A1

公开(公告)日：2016-07-14

申请号：US14916608

申请日：2014-09-11

Applicant: HERAEUS QUARZGLAS GMBH & CO. KG

Inventor： Stefan OCHS

IPC: C03B19/06 ,  C03C3/06 ,  C03B25/02

CPC classification number: C03B19/06 ,  C03B25/02 ,  C03B37/01413 ,  C03B37/01446 ,  C03B2201/075 ,  C03B2201/40 ,  C03C3/06 ,  C03C2203/00

Abstract: A method for producing a blank of iron-doped silica glass with high silicic acid content for use as heat protection glass is provided. The method involves: (a) producing an iron-doped SiO2 soot body which contains iron in a first oxidation state Fe3+ by flame hydrolysis of a silicon-containing and an iron-containing starting substance, (b) drying the soot body to obtain a mean hydroxyl group content of less than 10 ppm by weight, and (c) vitrifying the soot body under a reducing atmosphere that is suitable for at least partially reducing the iron from the first oxidation state Fe3+ to a second, lower oxidation state Fe2+. A blank is obtained having an iron content between 0.1 and 1% by weight which exhibits an internal transmission of at most 40% in the infrared wavelength range and an internal transmission of at least 85% in the visible spectral range.

Abstract translation: 本发明提供一种用于制造具有高硅酸含量的掺铁石英玻璃的坯料作为保温玻璃的方法。 该方法包括：（a）通过含硅和含铁起始物质的火焰水解生产含有第一氧化态Fe 3+的铁的掺铁SiO 2烟灰体，（b）干燥烟灰体以获得 平均羟基含量小于10重量ppm，和（c）在适于将铁从第一氧化态Fe 3+至少部分还原为第二次氧化态Fe2 +的还原气氛下使烟灰体玻璃化。 获得的铁含量为0.1至1重量％的空白，其在红外波长范围内具有至多40％的内部透光率，在可见光谱范围内内透光率至少为85％。

公开(公告)号：US20150097304A1

公开(公告)日：2015-04-09

申请号：US14570340

申请日：2014-12-15

Applicant: Asahi Glass Company, Limited

Inventor： Akio KOIKE ,  Junko Miyasaka ,  Hiroshi Nakanishi

IPC: B29D11/00 ,  B29C59/00 ,  B29C59/02

CPC classification number: B29D11/00769 ,  B24B9/10 ,  B29C59/002 ,  B29C59/026 ,  C03B19/14 ,  C03B19/1453 ,  C03B2201/075 ,  C03B2201/42 ,  C03C3/06 ,  C03C19/00 ,  C03C2201/42 ,  C03C2204/08 ,  G03F7/0002 ,  Y10T428/24355

Abstract: The present invention relates to a TiO2-containing quartz glass substrate for an imprint mold having a main surface and a side surface, in which the side surface has an arithmetic average roughness (Ra) of 1 nm or less, and the side surface has a root mean square (MSFR_rms) of concaves and convexes in the wavelength region of from 10 μm to 1 mm being 10 nm or less.

Abstract translation: 本发明涉及一种用于压印模具的含TiO 2石英玻璃基板，其具有主表面和侧表面，其中侧表面的算术平均粗糙度（Ra）为1nm或更小，并且侧表面具有 在10μm至1mm的波长范围内的凹凸的平均均方根（MSFR_rms）为10nm以下。

公开(公告)号：US08546283B2

公开(公告)日：2013-10-01

申请号：US13531928

申请日：2012-06-25

Applicant: Junko Miyasaka ,  Akio Koike ,  Tomonori Ogawa

Inventor： Junko Miyasaka ,  Akio Koike ,  Tomonori Ogawa

IPC: C03C3/06 ,  C03C3/076 ,  C03C3/112

CPC classification number: C03C3/06 ,  B82Y10/00 ,  B82Y40/00 ,  C03B19/1415 ,  C03B19/1453 ,  C03B19/1461 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/42 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/44 ,  C03C2203/54 ,  G02B5/0891 ,  G03F1/24

Abstract: The present invention relates to a substrate for EUV lithography optical member, comprising a silica glass containing TiO2, in which the substrate has two opposite surfaces, and the substrate has temperatures at which a coefficient of linear thermal expansion (CTE) is 0 ppb/° C. (Cross-Over Temperature: COT), and in which the two opposite surfaces have difference in the COTs of 5° C. or more.

Abstract translation: 本发明涉及一种用于EUV光刻光学部件的基板，其包括含有二氧化钛的二氧化硅玻璃，其中该基板具有两个相对的表面，该基板具有线性热膨胀系数（CTE）为0ppb /°的温度 C.（交叉温度：COT），其中两个相对表面的COT值在5℃以上有差异。

公开(公告)号：US20130116108A1

公开(公告)日：2013-05-09

申请号：US13540204

申请日：2012-07-02

Applicant: Nathan J. Cassingham ,  Ben Matthew Gauthier ,  Martin Panchula ,  Robert Stephen Pavlik ,  Yan Zhou ,  Konstantin S. Zuyev

Inventor： Nathan J. Cassingham ,  Ben Matthew Gauthier ,  Martin Panchula ,  Robert Stephen Pavlik ,  Yan Zhou ,  Konstantin S. Zuyev

IPC: C03C3/06

CPC classification number: C03C1/02 ,  C03B1/00 ,  C03B2201/075 ,  C03B2201/08 ,  C03B2201/23 ,  C03B2201/24 ,  C03B2201/31 ,  C03B2201/32 ,  C03B2201/34 ,  C03B2201/50 ,  C03B2201/54 ,  C03C3/06 ,  C03C2201/08 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2201/31 ,  C03C2201/32 ,  C03C2201/34 ,  C03C2201/40 ,  C03C2201/50

Abstract: The invention relates to a silica glass compound having improved physical and chemical properties. In one embodiment, the present invention relates to a silica glass having a desirable brittleness in combination with a desirable density while still yielding a glass composition having a desired hardness and desired strength relative to other glasses. In another embodiment, the present invention relates to a silica glass composition that contains at least about 85 mole percent silicon dioxide and up to about 15 mole percent of one or more dopants selected from F, B, N, Al, Ge, one or more alkali metals (e.g., Li, Na, K, etc.), one or more alkaline earth metals (e.g., Mg, Ca, Sr, Ba, etc.), one or more transition metals (e.g., Ti, Zn, Y, Zr, Hf, etc.), one or more lanthanides (e.g., Ce, etc.), or combinations of any two or more thereof.

Abstract translation: 本发明涉及具有改善的物理和化学性质的二氧化硅玻璃化合物。 在一个实施方案中，本发明涉及具有期望的脆性以及所需密度的二氧化硅玻璃，同时仍然产生相对于其它玻璃具有所需硬度和所需强度的玻璃组合物。 在另一个实施方案中，本发明涉及二氧化硅玻璃组合物，其含有至少约85摩尔％的二氧化硅和至多约15摩尔％的选自F，B，N，Al，Ge的一种或多种掺杂剂，一种或多种 碱金属（如Li，Na，K等），一种或多种碱土金属（如Mg，Ca，Sr，Ba等），一种或多种过渡金属（如Ti，Zn，Y， Zr，Hf等），一种或多种镧系元素（例如Ce等），或其任何两种或多种的组合。

公开(公告)号：US20120264584A1

公开(公告)日：2012-10-18

申请号：US13531928

申请日：2012-06-25

Applicant: Junko Miyasaka ,  Akio Koike ,  Tomonori Ogawa

Inventor： Junko Miyasaka ,  Akio Koike ,  Tomonori Ogawa

IPC: C03C3/04

CPC classification number: C03C3/06 ,  B82Y10/00 ,  B82Y40/00 ,  C03B19/1415 ,  C03B19/1453 ,  C03B19/1461 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/42 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/44 ,  C03C2203/54 ,  G02B5/0891 ,  G03F1/24

Abstract: The present invention relates to a substrate for EUV lithography optical member, comprising a silica glass containing TiO2, in which the substrate has two opposite surfaces, and the substrate has temperatures at which a coefficient of linear thermal expansion (CTE) is 0 ppb/° C. (Cross-Over Temperature: COT), and in which the two opposite surfaces have difference in the COTs of 5° C. or more.

Abstract translation: 本发明涉及一种用于EUV光刻光学部件的基板，其包括含有二氧化钛的二氧化硅玻璃，其中该基板具有两个相对的表面，该基板具有线性热膨胀系数（CTE）为0ppb /°的温度 C.（交叉温度：COT），其中两个相对表面的COT值在5℃以上有差异。

公开(公告)号：US07980098B2

公开(公告)日：2011-07-19

申请号：US12148338

申请日：2008-04-18

Applicant: Bodo Kuehn ,  Steffen Kaiser ,  Denis Kassube ,  Kerstin Merget

Inventor： Bodo Kuehn ,  Steffen Kaiser ,  Denis Kassube ,  Kerstin Merget

IPC: C03B25/00 ,  C03B27/00 ,  C03B27/012

CPC classification number: C03B25/02 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/075 ,  C03B2201/21 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/42 ,  C03C2203/52 ,  Y02P40/57

Abstract: To optimize an optical component of synthetic quartz glass, in the case of which a quartz glass blank is subjected to a multistage annealing treatment, with respect to compaction and central birefringence, the present invention suggests a method comprising the following steps: (a) a first treatment phase during which the quartz glass blank is treated in an upper temperature range between 1130° C. and 1240° C., (b) cooling the quartz glass blank at a first-higher-mean cooling rate to a quenching temperature below 1100° C., a fictive temperature with a high mean value of 1100° C. or more being reached in the quartz glass, (c) a second treatment phase which comprises cooling of the quartz glass blank at a second-lower-mean cooling rate, and in which the quartz glass blank is treated in a lower temperature range between 950° C. and 1100° C. such that a fictive temperature is reached in the quartz glass with a low mean value which is at least 50° C. lower than the high mean value of the fictive temperature according to method step (b).

Abstract translation: 为了优化合成石英玻璃的光学部件，在石英玻璃坯料进行多段退火处理的情况下，关于压实和中心双折射，本发明提出了一种方法，包括以下步骤：（a） 第一处理阶段，其中在1130℃和1240℃之间的较高温度范围内处理石英玻璃坯料，（b）以第一高平均冷却速率将石英玻璃坯料冷却至低于1100℃的淬火温度 在石英玻璃中达到1100℃或更高平均值的假想温度，（c）第二处理阶段，其包括以第二低平均冷却速度冷却石英玻璃坯料 ，其中在950℃至1100℃的较低温度范围内处理石英玻璃坯料，使得石英玻璃中具有低至少50℃的低平均值的假想温度降低 比平均值高 根据方法步骤（b）的假想温度。

公开(公告)号：US07637126B2

公开(公告)日：2009-12-29

申请号：US10582117

申请日：2004-11-30

Applicant: Rainer Koeppler ,  Bodo Kuehn ,  Waltraud Werdecker ,  Ulrich Kirst ,  Walter Lehmann

Inventor： Rainer Koeppler ,  Bodo Kuehn ,  Waltraud Werdecker ,  Ulrich Kirst ,  Walter Lehmann

IPC: C03B37/075

CPC classification number: C03C4/0071 ,  C03B19/06 ,  C03B19/063 ,  C03B19/066 ,  C03B19/1005 ,  C03B19/1065 ,  C03B19/108 ,  C03B19/1095 ,  C03B20/00 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/34 ,  C03C1/026 ,  C03C3/06 ,  C03C2201/23 ,  C03C2201/3411 ,  C03C2201/3435 ,  C03C2201/3488 ,  C03C2201/36 ,  C03C2203/22 ,  C03C2203/30 ,  C03C2203/44 ,  C03C2203/52

Abstract: The invention relates to a method for the economic production of a blank for a component made from laser-active quartz glass in any form or dimension. The method comprises the following method steps: a) preparation of a dispersion with a solids content of at least 40 wt. %, comprising SiO2 nanopowder and doping agents, including a cation of the rare earth metals and transition metals in a fluid, b) granulation by agitation of the dispersion, with removal of moisture to form a doped SiO2 granulate of spherical porous granular particles with a moisture content of less than 35 wt. % and a density of at least 0.95 g/cm3, c) drying and purification of the SiO2 granulate, by heating to a temperature of at least 1000° C. to form doped porous SiO2 grains with an OH content of less than 10 ppm and d) sintering or fusing the doped SiO2 grains in a reducing atmosphere to give the blank made from doped quartz glass.

Abstract translation: 本发明涉及一种用于经济地生产用于由任何形式或尺寸的激光 - 活性石英玻璃制成的部件的坯料的方法。 该方法包括以下方法步骤：a）制备固体含量为至少40wt。 ％，包括SiO 2纳米粉末和掺杂剂，其包括流体中的稀土金属和过渡金属的阳离子，b）通过搅拌分散体制粒，除去水分以形成掺杂的SiO 2颗粒的球形多孔颗粒，其具有 含水量小于35wt。 ％和密度至少为0.95g / cm 3，c）通过加热到至少1000℃的温度来干燥和纯化SiO 2颗粒，以形成OH含量低于10ppm的掺杂多孔SiO 2颗粒，以及 d）在还原气氛中烧结或熔融掺杂的SiO 2晶粒，得到由掺杂的石英玻璃制成的坯料。

公开(公告)号：US20090203511A1

公开(公告)日：2009-08-13

申请号：US12420443

申请日：2009-04-08

Applicant: Dana Craig Bookbinder ,  Richard Michael Fiacco ,  Kenneth Edward Hrdina ,  Lisa Anne Moore ,  Susan Lee Schiefelbein

Inventor： Dana Craig Bookbinder ,  Richard Michael Fiacco ,  Kenneth Edward Hrdina ,  Lisa Anne Moore ,  Susan Lee Schiefelbein

IPC: C03C3/04 ,  C03B19/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2207/32 ,  C03C2201/21 ,  C03C2201/23

Abstract: Disclosed is a synthetic silica glass optical material having high resistance to optical damage by ultraviolet radiation in the ultraviolet wavelength range, particularly in the wavelength less than about 250 nm and particularly, exhibiting a low laser induced wavefront distortion; specifically a laser induced wavefront distortion, measured at 633 nm, of between about −1.0 and 1.0 nm/cm when subjected to 10 billion pulses of a laser operating at approximately 193 nm and at a fluence of approximately 70 μJ/cm2. The synthetic silica glass optical material of the present invention comprises OH concentration levels of less than about 600 ppm, preferably less than 200 ppm, and H2 concentration levels less than about 5.0×1017 molecules/cm3′ and preferably less than about 2.0×1017 molecules/cm3.

Abstract translation: 公开了一种合成石英玻璃光学材料，其特征在于波长小于约250nm，特别是具有低激光诱导波前失真的紫外线波长范围内具有高抗紫外线辐射的光学损伤， 具体地，在经受约193nm处的激光器操作的100亿脉冲和大约70μJ/ cm 2的能量密度下，在633nm处测量的激光感应波前失真在约-1.0和1.0nm / cm之间。 本发明的合成石英玻璃光学材料包含小于约600ppm，优选小于200ppm的OH浓度水平和小于约5.0×10 17分子/ cm 3'，优选小于约2.0×10 17分子/ cm 3的H 2浓度水平 。

公开(公告)号：US07506522B2

公开(公告)日：2009-03-24

申请号：US11148764

申请日：2005-06-08

Applicant: Daniel Joseph Bleaking ,  Dana C. Bookbinder ,  Richard M. Fiacco ,  Kenneth E. Hrdina ,  Pushkar Tandon ,  John E. Maxon ,  Kimberly Ann Wilbert

Inventor： Daniel Joseph Bleaking ,  Dana C. Bookbinder ,  Richard M. Fiacco ,  Kenneth E. Hrdina ,  Pushkar Tandon ,  John E. Maxon ,  Kimberly Ann Wilbert

IPC: C03B20/00 ,  C03C3/06

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23

Abstract: Disclosed are high purity synthetic silica glass material having a high OH concentration homogeneity in a plane perpendicular to the optical axis, and process of making the same. The glass has high refractive index homogeneity. The glass can have high internal transmission of at least 99.65%/cm at 193 nm. The process does not require a post-sintering homogenization step. The controlling factors for high compositional homogeneity, thus high refractive index homogeneity, include high initial local soot density uniformity in the soot preform and slow sintering, notably isothermal treatment during consolidation.

Abstract translation: 公开了在垂直于光轴的平面中具有高OH浓度均匀性的高纯度合成石英玻璃材料及其制备方法。 玻璃具有高折射率均匀性。 该玻璃在193nm处可以具有至少99.65％/ cm的高内部透射率。 该方法不需要后烧结均质化步骤。 组合均匀性高，因此具有高折射率均匀性的控制因素包括烟灰预制件中的初始局部烟灰密度均匀性和缓慢烧结，特别是固结期间的等温处理。