公开(公告)号：US08618516B2

公开(公告)日：2013-12-31

申请号：US13294380

申请日：2011-11-11

Applicant: Hirohito Ito

Inventor： Hirohito Ito

IPC: H01J37/147

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/26 ,  H01J37/3177 ,  H01J2237/304 ,  H01J2237/31766

Abstract: A charged-particle beam exposure apparatus which includes a deflector that deflects a charged-particle beam, and a stage mechanism that drives a substrate, and draws a pattern on the substrate while scanning the charged-particle beam in a main-scanning direction by the deflector and scanning the substrate in a sub-scanning direction by the stage mechanism. The apparatus includes a blanker unit configured to control irradiation and unirradiation of the substrate with the charged-particle beam, and a controller configured to control the deflector to deflect the charged-particle beam in the sub-scanning direction by an amount of driving of the substrate in the sub-scanning direction by the stage mechanism during a period of time from stop of drawing on the substrate until restart thereof when the drawing on the substrate is stopped and then restarted while the substrate is driven in the sub-scanning direction by the stage mechanism.

公开(公告)号：US20130320226A1

公开(公告)日：2013-12-05

申请号：US13905067

申请日：2013-05-29

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Ralph Pulwey ,  Josef Biberger

IPC: H01J3/26

CPC classification number: H01J37/3026 ,  H01J3/26 ,  H01J37/302 ,  H01J37/3023 ,  H01J37/3056 ,  H01J37/3174 ,  H01J2237/1536 ,  H01J2237/30483 ,  H01J2237/30488

Abstract: A method of scanning a surface of an object using a particle beam comprises: determining a surface portion of the surface of the object, wherein the surface portion is to be scanned; determining initial positions of a set of raster points within the surface portion; changing the positions of at least some raster points of the set of raster points; and then scanning the surface portion by directing the particle beam to the positions of the raster points.

Abstract translation: 使用粒子束扫描物体的表面的方法包括：确定物体表面的表面部分，其中表面部分被扫描; 确定所述表面部分内的一组光栅点的初始位置; 改变该组光栅点的至少一些光栅点的位置; 然后通过将粒子束引导到光栅点的位置来扫描表面部分。

公开(公告)号：US08586941B2

公开(公告)日：2013-11-19

申请号：US13722201

申请日：2012-12-20

Applicant: Hisashi Harada ,  Takaaki Iwata

Inventor： Hisashi Harada ,  Takaaki Iwata

IPC: H01J1/50

CPC classification number: H01J3/22 ,  A61N5/1042 ,  A61N5/1043 ,  A61N5/1077 ,  A61N5/1078 ,  A61N2005/1087 ,  H01J3/26

Abstract: A particle beam therapy system is provided with high irradiation flexibility that can reduce the amount of irradiation onto normal tissue. There are provided (i) a scanning electromagnet that performs scanning and outputting in such a way that a supplied charged particle beam is formed in a three-dimensional irradiation shape based on a treatment plan and (ii) deflection electromagnets that switch the orbits for the charged particle beam in such a way that the charged particle beam with which scanning and outputting are performed by the scanning electromagnet reaches an isocenter through a single beam orbit selected from a plurality of beam orbits established between the isocenter and the scanning electromagnet. The distance between the scanning electromagnet and the isocenter is made long.

Abstract translation: 粒子束治疗系统具有高照射灵活性，可以减少对正常组织的照射量。 提供（i）扫描电磁体，其以这样的方式执行扫描和输出，即基于治疗计划以三维照射形状形成所提供的带电粒子束;以及（ii）转换电磁铁， 带电粒子束，使得由扫描电磁体执行扫描和输出的带电粒子束通过从在等角点和扫描电磁体之间建立的多个光束轨道中选择的单光束轨道到达等角点。 扫描电磁铁与等角点之间的距离很长。

公开(公告)号：US20130187060A1

公开(公告)日：2013-07-25

申请号：US13737867

申请日：2013-01-09

Applicant: Yves Jongen

Inventor： Yves Jongen

IPC: H01J3/26 ,  A61N5/10

CPC classification number: H01J3/26 ,  A61N5/01 ,  A61N5/10 ,  A61N5/1077 ,  A61N5/1081 ,  A61N2005/1087 ,  G21K1/093

Abstract: The present invention relates to a particle therapy apparatus used for radiation therapy. More particularly, this invention relates to a compact isocentric gantry for delivering particle beams perpendicularly to a rotation axis of the gantry . The gantry comprises three dipole magnets. The angle of the last dipole magnet is smaller than 90° and a most preferred bending angle for this last dipole magnet is 60°.

Abstract translation: 本发明涉及用于放射治疗的颗粒治疗装置。 更具体地，本发明涉及一种用于沿垂直于台架的旋转轴线输送颗粒束的紧凑型等中心台架。 龙门架包括三个偶极子磁体。 最后的偶极子磁体的角度小于90°，​​最后的偶极子磁体的最佳弯曲角度为60°。

公开(公告)号：US20130105703A1

公开(公告)日：2013-05-02

申请号：US13722201

申请日：2012-12-20

Applicant: Hisashi HARADA ,  Takaaki IWATA

Inventor： Hisashi HARADA ,  Takaaki IWATA

IPC: H01J3/22 ,  H01J3/26

CPC classification number: H01J3/22 ,  A61N5/1042 ,  A61N5/1043 ,  A61N5/1077 ,  A61N5/1078 ,  A61N2005/1087 ,  H01J3/26

Abstract: The objective is to obtain a particle beam therapy system, the irradiation flexibility of which is high and that can reduce the amount of irradiation onto a normal tissue.There are provided a scanning electromagnet 2 that performs scanning and outputting in such a way that a supplied charged particle beam Bec is formed in a three-dimensional irradiation shape based on a treatment plan; and deflection electromagnets 4 and 5 that switch the orbits for the charged particle beam Bec in such a way that the charged particle beam Bec with which scanning and outputting are performed by the scanning electromagnet 2 reaches an isocenter C through a single beam orbit selected from a plurality of beam orbits 7a, 7b, and 7c established between the isocenter C and the scanning electromagnet 2. The distance between the scanning electromagnet and the isocenter is made long.

Abstract translation: 目的是获得粒子束治疗系统，其照射灵活性高，并且可以减少照射到正常组织上的量。 设置扫描电磁体2，其以这样的方式执行扫描和输出，即基于处理计划将供给的带电粒子束Bec形成为三维照射形状; 以及用于使带电粒子束Bec的轨道切换的偏转电磁体4和5使得由扫描电磁体2执行扫描和输出的带电粒子束Bec通过选自以下的单个光束轨道到达等角点C. 在等角点C和扫描电磁体2之间建立的多个光束轨道7a，7b和7c。使扫描电磁体与等角点之间的距离变长。

公开(公告)号：US20120256098A1

公开(公告)日：2012-10-11

申请号：US13251174

申请日：2011-09-30

Applicant: Josef Biberger ,  Ralph Pulwey ,  Andreas Adolf

Inventor： Josef Biberger ,  Ralph Pulwey ,  Andreas Adolf

IPC: H01J3/14

CPC classification number: H01J3/26 ,  H01J3/14 ,  H01J37/1477 ,  H01J37/28 ,  H01J37/317 ,  H01J2237/303 ,  H01J2237/31749

Abstract: An ion beam system comprises a voltage supply system 7 and at least one beam deflector 39 having at least one first deflection electrode 51a, 51b, 51c and plural second deflection electrodes 52a, 52b, 52c, wherein the voltage supply system is configured to supply different adjustable deflection voltages to the plural second deflection electrodes such that electric deflection fields between the plural second deflection electrodes and the opposite at least one first deflection electrode have a common orientation.The system has a high kinetic energy mode in which a distribution of the electric deflection field has a greater width, a low kinetic energy mode in which a distribution of the electric deflection field has a smaller width.

Abstract translation: 离子束系统包括电压供应系统7和至少一个具有至少一个第一偏转电极51a，51b，51c和多个第二偏转电极52a，52b，52c的光束偏转器39，其中电压供应系统被配置为提供不同的 可变偏转电压到多个第二偏转电极，使得多个第二偏转电极和相对的至少一个第一偏转电极之间的电偏转场具有共同的取向。 该系统具有高动能模式，其中电偏转场的分布具有较大的宽度，其中电偏转场的分布具有较小宽度的低动能模式。

公开(公告)号：US08044351B2

公开(公告)日：2011-10-25

申请号：US11915679

申请日：2006-05-29

Applicant: Ho Seob Kim ,  Byeng Jin Kim

Inventor： Ho Seob Kim ,  Byeng Jin Kim

IPC: G21K5/04

CPC classification number: H01J3/18 ,  H01J3/26 ,  H01J37/12 ,  H01J2237/0492 ,  H01J2237/1205

Abstract: The present invention relates to an electron column including an electron emission source and lenses, and, more particularly, to an electron column having a structure that can facilitate the alignment and assembly of an electron emission source and lenses. The electron column having an electron emission source and a lens unit according to the present invention is characterized in that the lens unit includes two or more lens layers and performs both a source lens function and a focusing function. Furthermore, the electron column is characterized in that the lens unit includes one or more deflector-type lens layers and additionally performs a deflector function.

Abstract translation: 本发明涉及包括电子发射源和透镜的电子柱，更具体地说，涉及具有能够促进电子发射源和透镜的对准和组装的结构的电子柱。 具有根据本发明的电子发射源和透镜单元的电子柱的特征在于，透镜单元包括两个或更多个透镜层，并且执行源透镜功能和聚焦功能。 此外，电子柱的特征在于，透镜单元包括一个或多个偏转器型透镜层，并且另外执行偏转器功能。

公开(公告)号：US06797963B2

公开(公告)日：2004-09-28

申请号：US10617703

申请日：2003-07-14

Applicant: Sang Kuk Choi ,  Dae Yong Kim ,  Dong Yel Kang

Inventor： Sang Kuk Choi ,  Dae Yong Kim ,  Dong Yel Kang

IPC: H01J4942

CPC classification number: H01J9/02 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/26 ,  H01J37/1477 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/1516 ,  H01J2237/31793

Abstract: The present invention relates to a deflector of a micro-column electron beam apparatus and method for fabricating the same, which forms a seed metal layer and a mask layer on both sides of a substrate, and exposes some of the seed metal layer on which deflecting plates, wirings and pads are to be formed by lithography process using a predetermined mask. The wirings and pads are formed by plating metal on the exposed portion, and some of the metal layer is also exposed on which the deflecting plates are to be formed using a predetermined mask, and then the metal is plated with desired thickness, thereby the deflecting plates are completed. Therefore, by forming plurality of deflecting plates on both sides of the substrate at the same time through plating process, alignment between the deflecting plates formed on both sides of the substrate can be exactly made, and by fabricating a deflector integrated with the substrate and deflecting plates in a batch process, productivity and reproducibility is improved. In addition, since the deflecting plates, wirings and pads are directly formed on the substrate, structural safety is improved and thereby durability is also improved.

公开(公告)号：US5955849A

公开(公告)日：1999-09-21

申请号：US201963

申请日：1994-02-25

Applicant: Cha-Mei Tang ,  Antonio C. Ting ,  Thomas A. Swyden

Inventor： Cha-Mei Tang ,  Antonio C. Ting ,  Thomas A. Swyden

IPC: G21K1/087 ,  H01J3/02 ,  H01J3/26 ,  H01J23/06 ,  H01J29/48 ,  H01J35/06 ,  H03F3/56 ,  G09G1/04 ,  H01J29/70

CPC classification number: G21K1/087 ,  H01J23/06 ,  H01J29/481 ,  H01J3/022 ,  H01J3/26 ,  H01J35/065 ,  H03F3/56

Abstract: A field emitter for producing an electron beam includes at least one cold cathode unit. Each of the cold cathode units includes an emitter cone having an emitter tip and a gate spaced apart from the emitter tip for extracting electrons from the emitter tip in a propagation direction upon application of a positive dc voltage on the gate with respect to the emitter tip. The gate forms a gate cavity for propagation of the extracted electrons therethrough. Each of the cold cathode units further includes at least one lens electrode disposed further in the propagation direction from the emitter tip than the gate, the at least one lens electrode forming at least one lens cavity for propagation of the extracted electrons therethrough. The at least one lens electrode is for focusing the extracted electrons in part of the gate cavity, part of the at least one lens cavity, and part of the region therebetween.

Abstract translation: 用于产生电子束的场致发射体包括至少一个冷阴极单元。 每个冷阴极单元包括发射极锥体，发射极尖端和与发射极尖端间隔开的栅极，用于在栅极上相对于发射极尖端施加正直流电压时沿传播方向从发射极尖端提取电子 。 栅极形成用于通过其提取的电子的传播的栅极腔。 每个冷阴极单元还包括至少一个透镜电极，该透镜电极在发射极尖端的传播方向上比栅极进一步设置，所述至少一个透镜电极形成至少一个透镜腔，用于传播所提取的电子。 所述至少一个透镜电极用于将提取的电子聚焦在所述栅极空腔的一部分中，所述至少一个透镜腔的一部分以及其间的区域的一部分。

公开(公告)号：US09824850B2

公开(公告)日：2017-11-21

申请号：US14605985

申请日：2015-01-26

Applicant: Advanced Ion Beam Technology, Inc.

Inventor： Nicholas White ,  Zhimin Wan ,  Erik Collart

IPC: H01J37/05 ,  H01J3/04 ,  H01J3/26 ,  H01J37/317 ,  H01J37/147 ,  H01J37/30

CPC classification number: H01J37/05 ,  H01J3/04 ,  H01J3/26 ,  H01J37/1472 ,  H01J37/3007 ,  H01J37/3171 ,  H01J2237/04756 ,  H01J2237/053 ,  H01J2237/057 ,  H01J2237/151 ,  H01J2237/303 ,  H01J2237/31701

Abstract: A deceleration apparatus capable of decelerating a short spot beam or a tall ribbon beam is disclosed. In either case, effects tending to degrade the shape of the beam profile are controlled. Caps to shield the ion beam from external potentials are provided. Electrodes whose position and potentials are adjustable are provided, on opposite sides of the beam, to ensure that the shape of the decelerating and deflecting electric fields does not significantly deviate from the optimum shape, even in the presence of the significant space-charge of high current low-energy beams of heavy ions.