Abstract:
A method of forming a doped silica-titania glass is provided. The method includes blending batch materials comprising silica, titania, and at least one dopant. The method also includes heating the batch materials to form a glass melt. The method further includes consolidating the glass melt to form a glass article, and annealing the glass article.
Abstract:
A single mode optical fiber having a core made from silica and less than or equal to about 6.5 weight% germania and having a maximum relative refractive index Δ 1ΜΑΧ . The optical fiber also has an inner cladding surrounding the core and having a minimum relative refractive index Δ 2ΜΙΝ · A difference between a softening point of the core and a softening point of the inner cladding is less than or equal to about 20 °C, and Δ 1ΜΑΧ > Δ 2ΜΑΧ . The single mode optical fiber may also have an outer cladding surrounding the inner cladding made from silica or SiON. The outer cladding has a maximum relative refractive index Δ 3ΜΑΧ , and Δ 3ΜΑΧ > Δ 2ΜΙΝ . A method for manufacturing an optical fiber includes providing a preform to a first furnace, the preform, drawing the optical fiber from the preform, and cooling the drawn optical fiber in a second furnace.
Abstract:
The invention relates to an optical component made of synthetic quartz glass for use in an ArF excimer laser lithography process with an applied wavelength of 193 nm, comprising a glass structure substantially free of oxygen defect sites, a hydrogen content ranging from 0.1 x 1016 molecules/cm3 to 1.0 x 1018 molecules/cm3, an SiH group content of less than 2 x 1017 molecules/cm3, and a hydroxyl group content ranging from 0.1 to 100 wt. ppm, said glass structure having a fictive temperature of less than 1070 °C. The aim of the invention is to allow a reliable prediction of the compacting behavior when using UV laser radiation with the applied wavelength on the basis of a measurement of the compacting behavior using a measured wavelength of 633 nm. This is achieved by an optical component design in which the component undergoes a laser-induced change in the refractive index in response to irradiation by means of a radiation with a wavelength of 193 nm using 5x109 pulses with a pulse width of 125 ns and a respective energy density of 500 µJ/cm2 at a pulse repetition frequency of 2000 Hz, said change totaling a first measured value M193nm when measured using the applied wavelength of 193 nm and totaling a second measured value M633nm when measured using a measured wavelength of 633 nm, wherein M193nm/M633nm
Abstract:
The present invention is to provide a TiO 2 -SiO 2 glass having suitable thermal expansion properties as an optical member of an exposure tool for EUVL. The present invention relates to a TiO 2 -containing silica glass having a temperature, at which a coefficient of thermal expansion is 0 ppb/°C, falling within the range of 23 } 4 °C and a temperature width, in which a coefficient of thermal expansion is 0 } 5 ppb/°C, of 5 °C or more.
Abstract:
Es wird ein Verfahren angegeben, das die wirtschaftliche Herstellung von dotiertem Quarzglas ermöglicht, insbesondere von laseraktivem Quarzglas, das hinsichtlich der Homogenität der Dotierstoffverteilung verbessert ist, indem eine Suspension bereitgestellt wird, die SiO 2 -Teilchen sowie eine Ausgangsverbindung für mindestens einen Dotierstoff in einer wässrigen Flüssigkeit enthält, die Flüssigkeit unter Bildung eines dotierten Zwischenprodukts, das Teilchen des Dotierstoffs oder Teilchen einer Vorläufersubstanz des Dotierstoffs enthält, entfernt wird, und aus dem dotierten Zwischenprodukt durch Sintern das dotierte Quarzglas gebildet wird, wobei mindestens ein Teil der Teilchen des Dotierstoffs oder der Teilchen der Vorläufersubstanz desselben in der Suspension als Präzipitat einer pH-Wertgesteuerten Fällungsreaktion der Ausgangsverbindung erzeugt wird.
Abstract:
The present invention is to provide a synthetic quartz glass body having a high light transmittance. The present invention provides a synthetic quartz glass body having pores in a surface part thereof.
Abstract:
Disclosed are high purity synthetic silica glass material having a high OH concentration homogeneity in a plane perpendicular to the optical axis, and process of making the same. The glass has high refractive index homogeneity. The glass can have high internal transmission of at least 99.65%/cm at 193 nm. The process does not require a post-sintering homogenization step. The controlling factors for high compositional homogeneity, thus high refractive index homogeneity, include high initial local soot density uniformity in the soot preform and slow sintering, notably isothermal treatment during consolidation.