公开(公告)号：US07994083B2

公开(公告)日：2011-08-09

申请号：US11521683

申请日：2006-09-15

Applicant: Brian Lee Harper ,  Kenneth Edward Hrdina ,  John Edward LaSala

Inventor： Brian Lee Harper ,  Kenneth Edward Hrdina ,  John Edward LaSala

IPC: C03C3/06 ,  C03B19/01 ,  C03B19/09 ,  C03B19/06 ,  C03B19/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/54 ,  G03F7/708 ,  Y10S501/905

Abstract: Disclosed are methods for hydrogen loading silica glass and silica glass comprising loaded H2. The methods can lead to H2 gradient in the glass material. Alternatively, the method may involve the use of varying H2 partial pressure of H2 in the atmosphere. Both can result in expedited hydrogen loading process.

Abstract translation: 公开了负载二氧化硅玻璃和含有负载H2的石英玻璃的氢的方法。 这些方法可能导致玻璃材料中的H2梯度。 或者，该方法可以涉及在大气中使用H 2的变化的H 2分压。 两者都可以产生加速氢气加载过程。

公开(公告)号：US07964522B2

公开(公告)日：2011-06-21

申请号：US11891984

申请日：2007-08-14

Applicant: Lisa Anne Moore ,  Charlene Marie Smith

Inventor： Lisa Anne Moore ,  Charlene Marie Smith

IPC: C03C3/06 ,  C03C3/112 ,  C03B19/06 ,  C03B15/00 ,  C03B32/00 ,  C03B17/00

CPC classification number: C03B19/1461 ,  C03B19/12 ,  C03B19/14 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/061 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/22 ,  C03C2201/40 ,  C03C2201/50 ,  Y02P40/57

Abstract: An F-doped silica glass, a process for making the glass, an optical member comprising the glass, and an optical system comprising such optical member. The glass material comprises 0.1-5000 ppm by weight of fluorine. The glass material according to certain embodiments of the present invention has low polarization-induced birefringence, low LIWFD and low induced absorption at 193 nm.

Abstract translation: F掺杂石英玻璃，制造玻璃的方法，包括玻璃的光学构件和包括这种光学构件的光学系统。 玻璃材料包含0.1-5000ppm重量的氟。 根据本发明的某些实施方案的玻璃材料在193nm处具有低偏振诱发双折射，低LIWFD和低诱导吸收。

公开(公告)号：US07749930B2

公开(公告)日：2010-07-06

申请号：US11630405

申请日：2006-03-30

Applicant: Juergen Weber ,  Tobias Pogge ,  Martin Trommer ,  Bodo Kuehn ,  Ulrich Kirst ,  Waltraud Werdecker

Inventor： Juergen Weber ,  Tobias Pogge ,  Martin Trommer ,  Bodo Kuehn ,  Ulrich Kirst ,  Waltraud Werdecker

IPC: C03C3/06 ,  C03C3/04 ,  C03C15/00 ,  C03B19/00 ,  C03B21/00 ,  C03B32/00 ,  C03B25/00

CPC classification number: C03C3/06 ,  C03B19/06 ,  C03B19/09 ,  C03B32/00 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/24 ,  C03B2201/32 ,  C03C15/00 ,  C03C19/00 ,  C03C23/0025 ,  C03C23/006 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2201/32 ,  C03C2201/50 ,  C03C2203/54 ,  C30B25/12 ,  C30B31/14 ,  C30B35/00 ,  Y02P40/57

Abstract: An ideal quartz glass for a wafer jig for use in an environment having an etching effect is distinguished by both high purity and high resistance to dry etching. To indicate a quartz glass that substantially fulfills these requirements, it is suggested according to the invention that the quartz glass is doped with nitrogen at least in a near-surface area, has a mean content of metastable hydroxyl groups of less than 30 wt ppm and that its fictive temperature is below 1250° C. and its viscosity is at least 1013 dPa·s at a temperature of 1200° C. An economic method for producing such a quartz glass comprises the following method steps: melting an SiO2 raw material to obtain a quartz glass blank, the SiO2 raw material or the quartz glass blank being subjected to a dehydration measure, heating the SiO2 raw material or the quartz glass blank to a nitriding temperature in the range between 1050° C. and 1850° C. in an ammonia-containing atmosphere, a temperature treatment by means of which the quartz glass of the quartz glass blank is set to a fictive temperature of 1250° C. or less, and a surface treatment of the quartz glass blank with formation of the quartz glass jig.

Abstract translation: 用于具有蚀刻效果的环境中的晶片夹具的理想石英玻璃的特征在于高纯度和高耐干蚀刻性。 为了表明基本满足这些要求的石英玻璃，根据本发明提出，石英玻璃至少在近表面积中掺杂氮，其平均含量小于30重量ppm， 其虚拟温度低于1250℃，在1200℃的温度下其粘度至少为1013dPa·s。制备这种石英玻璃的经济方法包括以下方法步骤：将SiO 2原料熔化得到 将石英玻璃坯料，SiO 2原料或石英玻璃坯料进行脱水处理，将SiO2原料或石英玻璃坯料加热至1050℃〜1850℃的氮化温度， 含有氨的气氛，将石英玻璃坯料的石英玻璃设定为1250℃以下的假想温度的温度处理，以及格式化的石英玻璃坯料的表面处理 在石英玻璃夹具上。

公开(公告)号：US20100109509A1

公开(公告)日：2010-05-06

申请号：US12595605

申请日：2008-04-28

Applicant: Tetsuji Ueda ,  Michinari Ohuchi ,  Hiroyuki Nishimura ,  Akira Fujinoki ,  Masahiro Nakatsuka ,  Hidetsugu Yoshida

Inventor： Tetsuji Ueda ,  Michinari Ohuchi ,  Hiroyuki Nishimura ,  Akira Fujinoki ,  Masahiro Nakatsuka ,  Hidetsugu Yoshida

IPC: H01J17/16 ,  B05D3/02 ,  C03C3/04

CPC classification number: C03B19/1438 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/23 ,  C03B2201/40 ,  C03C3/06 ,  C03C4/0071 ,  C03C4/085 ,  C03C4/12 ,  C03C23/0095 ,  C03C2201/23 ,  C03C2201/40 ,  C03C2203/44

Abstract: It is an object of the present invention to provide a copper-containing silica glass which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength of 400 nm or less, and which is excellent in long term stability even in the high output use.The copper-containing silica glass is made to have copper of from 5 wtppm to 200 wtppm, which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength ranging from 160 nm to 400 nm, and in which an internal transmittance per 2.5 mm thickness at a wavelength of 530 nm is 95% or more.

Abstract translation: 本发明的目的是提供一种在400nm以下的紫外线照射下发射波长范围为520nm〜580nm的荧光的含铜石英玻璃，其为 即使在高产量使用方面，长期稳定性也优异。 含铜二氧化硅玻璃被制成具有5重量ppm至200重量ppm的铜，其在波长范围为160nm至400nm的紫外线照射下发射波长范围为520nm至580nm的峰值的荧光 nm，并且其中在波长530nm处每2.5mm厚的内部透射率为95％以上。

公开(公告)号：US07524780B2

公开(公告)日：2009-04-28

申请号：US11046435

申请日：2005-01-28

Applicant: Laura J. Ball ,  Bruno P. M. Baney ,  Dana C. Bookbinder ,  Keith L. House ,  Rostislav R. Khrapko ,  Lisa A. Moore ,  Susan L. Schiefelbein

Inventor： Laura J. Ball ,  Bruno P. M. Baney ,  Dana C. Bookbinder ,  Keith L. House ,  Rostislav R. Khrapko ,  Lisa A. Moore ,  Susan L. Schiefelbein

IPC: C03C13/04 ,  C03C3/076 ,  C03C3/06

CPC classification number: C03C3/06 ,  C03B37/01211 ,  C03B37/01228 ,  C03B37/01426 ,  C03B37/01807 ,  C03B37/01861 ,  C03B37/01892 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/28 ,  C03B2201/31 ,  C03B2201/32 ,  C03B2201/50 ,  C03B2201/54 ,  C03B2203/26 ,  C03B2207/30 ,  C03B2207/90 ,  C03C25/602 ,  C03C25/607 ,  C03C25/68 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2201/50 ,  C03C2203/50 ,  G02B6/02

Abstract: A method of forming an alkali metal oxide-doped optical fiber by diffusing an alkali metal into a surface of a glass article is disclosed. The silica glass article may be in the form of a tube or a rod, or a collection of tubes or rods. The silica glass article containing the alkali metal, and impurities that may have been unintentionally diffused into the glass article, is etched to a depth sufficient to remove the impurities. The silica glass article may be further processed to form a complete optical fiber preform. The preform, when drawn into an optical fiber, exhibits a low attenuation.

Abstract translation: 公开了一种通过将碱金属扩散到玻璃制品的表面中形成掺杂碱金属氧化物的光纤的方法。 石英玻璃制品可以是管或棒的形式，或者是管或棒的集合。 含有碱金属的二氧化硅玻璃制品和可能已经无意地扩散到玻璃制品中的杂质被蚀刻到足以除去杂质的深度。 石英玻璃制品可以进一步加工以形成完整的光纤预型件。 当预成型件被拉入光纤时，表现出低的衰减。

公开(公告)号：US20080287279A1

公开(公告)日：2008-11-20

申请号：US12151172

申请日：2008-05-05

Applicant: Dana Craig Bookbinder ,  Richard Michael Fiacco ,  Kenneth Edward Hrdina ,  Rostislav Radievich Khrapko

Inventor： Dana Craig Bookbinder ,  Richard Michael Fiacco ,  Kenneth Edward Hrdina ,  Rostislav Radievich Khrapko

IPC: C03C3/04 ,  C03B29/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/21 ,  C03B2201/22 ,  C03B2201/23 ,  C03B2201/31 ,  C03C2201/22 ,  C03C2201/23 ,  C03C2203/54

Abstract: A fused silica glass and a fused silica article having a combined concentration of at least one of OH and OD of up to about 50 ppm. The fused silica glass is formed by drying a fused silica soot blank or preform in an inert atmosphere containing a drying agent, followed by removal of residual drying agent from the dried soot blank by heating the dried soot blank in an atmosphere comprising an inert gas and of oxygen.

Abstract translation: 熔融石英玻璃和熔融二氧化硅制品，其具有高达约50ppm的OH和OD中的至少一种的组合浓度。 熔融二氧化硅玻璃通过在含有干燥剂的惰性气氛中干燥熔融二氧化硅烟灰坯料或预型体而形成，然后通过在包含惰性气体的气氛中加热干燥的烟灰坯料从干燥的烟灰坯中除去残留的干燥剂， 的氧气。

公开(公告)号：US20080132402A1

公开(公告)日：2008-06-05

申请号：US11616716

申请日：2006-12-27

Applicant: TOMOHIRO WATANABE ,  Taihei Mukaide ,  Hidenosuke Itoh

Inventor： TOMOHIRO WATANABE ,  Taihei Mukaide ,  Hidenosuke Itoh

IPC: C03C3/083

CPC classification number: C03C4/0085 ,  C03B19/1438 ,  C03B2201/07 ,  C03B2201/23 ,  C03C3/085 ,  Y10T428/261

Abstract: An optical glass that contains Si, Al, Mg, and O is provided. The optical glass contains Si in an amount of 40% or more and 60% or less, in cation percent, Al in an amount of 10% or more and 35% or less, in cation percent, and Mg in an amount of 20% or more and 35% or less, in cation percent. In the optical glass, the total amount of Si, Al, and Mg is 99.5% or more, in cation percent. Furthermore, the optical glass contains Fe and Na each in an amount of 0.01 wtppm or less and has a transmittance to a light having a wavelength of 248 nm of 40% or more at a thickness of 5 mm.

Abstract translation: 提供含有Si，Al，Mg和O的光学玻璃。 光学玻璃的阳离子含量为40％以上且60％以下的Si，阳离子％为10％以上且35％以下的Al，20质量％的Mg， 以上且35％以下，以阳离子％计。 在光学玻璃中，Si，Al，Mg的总量为99.5％以上。 此外，光学玻璃含有0.01重量ppm以下的Fe和Na，并且对于厚度为5mm的波长为248nm的光的透射率为40％以上。

公开(公告)号：US20080131691A1

公开(公告)日：2008-06-05

申请号：US11932024

申请日：2007-10-31

Applicant: Tomohiro Watanabe ,  Taihei Mukaide ,  Hidenosuke Itoh

Inventor： Tomohiro Watanabe ,  Taihei Mukaide ,  Hidenosuke Itoh

IPC: B32B17/00

CPC classification number: C03C4/0085 ,  C03B19/1438 ,  C03B2201/07 ,  C03B2201/23 ,  C03C3/085 ,  Y10T428/261

Abstract: An optical glass that contains Si, Al, Mg, and O is provided. The optical glass contains Si in an amount of 40% or more and 60% or less, in cation percent, Al in an amount of 10% or more and 35% or less, in cation percent, and Mg in an amount of 20% or more and 35% or less, in cation percent. In the optical glass, the total amount of Si, Al, and Mg is 99.5% or more, in cation percent. Furthermore, the optical glass contains Fe and Na each in an amount of 0.01 wtppm or less and has a transmittance to a light having a wavelength of 248 nm of 40% or more at a thickness of 5 mm.

公开(公告)号：US20070272685A1

公开(公告)日：2007-11-29

申请号：US11578393

申请日：2005-04-05

Applicant: Andreas Schreiber ,  Bodo Kuehn ,  Franz-Josef Schilling ,  Erich Arnold ,  Hans-Dieter Witzke

Inventor： Andreas Schreiber ,  Bodo Kuehn ,  Franz-Josef Schilling ,  Erich Arnold ,  Hans-Dieter Witzke

IPC: H01J61/38

CPC classification number: C03B19/01 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/23 ,  C03C3/06

Abstract: In a known method, a quartz glass component is produced for a UV radiation source by melting SiO2-containing grain. Starting therefrom, to indicate an inexpensive method by means of which a quartz glass component is obtained that is characterized by high radiation resistance, it is suggested according to the invention that synthetically produced quartz crystals are molten to obtain a pre-product which consists of quartz glass containing hydroxyl groups in a number greater than the number of SiH groups, and that for the elimination of SiH groups the pre-product is subjected to an annealing treatment at a temperature of at least 850° C., whereby the quartz glass component is obtained. In the quartz glass component of the invention, the quartz glass is molten from synthetically produced quartz crystals, and it has a content of SiH groups of less than 5×1017 molecules/cm3.

Abstract translation: 在已知的方法中，通过熔化含SiO 2的晶粒来生产用于UV辐射源的石英玻璃组分。 从其开始，为了表明一种廉价的方法，通过该方法获得了以高耐辐射性为特征的石英玻璃组分，根据本发明提出，将合成的石英晶体熔融以获得由石英组成的预制品 含有数量大于SiH基数的羟基的玻璃，并且为了除去SiH基，将前产物在至少850℃的温度下进行退火处理，由此石英玻璃成分为 获得。 在本发明的石英玻璃组分中，石英玻璃从合成产生的石英晶体熔化，并且其SiH基含量小于5×10 17分子/ cm 3 / >。

公开(公告)号：US20070105703A1

公开(公告)日：2007-05-10

申请号：US11348956

申请日：2006-02-06

Applicant: Dana Bookbinder ,  Richard Fiacco

Inventor： Dana Bookbinder ,  Richard Fiacco

IPC: C03B8/00 ,  C03B19/06

CPC classification number: C03B19/12 ,  C03B19/1415 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/21 ,  C03B2201/22 ,  C03B2201/23 ,  C03B2201/32 ,  C03B2201/42 ,  C03B2201/58 ,  C03B2207/30 ,  C03B2207/38

Abstract: What is disclosed includes OD-doped synthetic silica glass capable of being used in optical elements for use in lithography below about 300 nm. OD-doped synthetic silica glass was found to have significantly lower polarization-induced birefringence value than non-OD-doped silica glass with comparable concentration of OH. Also disclosed are processes for making OD-dopes synthetic silica glasses, optical member comprising such glasses, and lithographic systems comprising such optical member. The glass is particularly suitable for immersion lithographic systems due to the exceptionally low polarization-induced birefringence values at about 193 nm.

Abstract translation: 公开的内容包括能够用于低于约300nm的光刻中的光学元件的OD掺杂合成石英玻璃。 发现OD掺杂的合成二氧化硅玻璃具有比具有相当浓度的OH的非OD掺杂的石英玻璃具有显着更低的偏振诱导双折射值。 还公开了制备OD-掺杂合成二氧化硅玻璃，包括这种玻璃的光学部件以及包括这种光学部件的光刻系统的方法。 由于在约193nm处极度低的偏振诱发双折射值，该玻璃特别适用于浸没式光刻系统。