公开(公告)号：JPH0387711A

公开(公告)日：1991-04-12

申请号：JP11135789

申请日：1989-04-28

Applicant: CANON KK

Inventor： HOSHINO OSAMU ,  SHIMODA ISAMU

IPC: G02B26/10 ,  B41J2/44 ,  G02B7/28 ,  G03G15/04

Abstract: PURPOSE:To obtain high picture quality by detecting the convergence state of a spot, converged on an irradiated body such as a photosensitive body, directly. CONSTITUTION:Scanning light 10 is reflected by a reflecting layer 7b and the reflected light reaches a spot detector 8, whose output varies, but if the photosensitive layer 7 of a drum 6 shifts in the direction of the optical axis or the scanning light 10 moves in the direction of the optical axis owing to disturbance, the generation time of the output of the spot detector 8 varies. This is utilized to detect the convergence state of the scanning light 10 on the photosensitive layer 7 directly and the convergence state is optimized according to the detection signal. Consequently, an image of high resolution is obtained.

公开(公告)号：JPH0338610A

公开(公告)日：1991-02-19

申请号：JP17339589

申请日：1989-07-05

Applicant: CANON KK

Inventor： MINOURA KAZUO ,  SHIMODA ISAMU

IPC: G02B26/10

Abstract: PURPOSE:To control the position shift of a beam spot on a scanned surface by providing a means which detects the position shift of the beam spot on the scanned surface of a photosensitive body, a document where character image information is recorded, etc., in a direction perpendicular to the scanning surface of luminous flux. CONSTITUTION:A spot position detector 7 detects the scanning direction of the laser spot and the shift in its position. Namely, when the laser spot is made to scan in the order of positions S1, S2, and S3 with time, how the difference DELTAI between electric outputs Ia and Ib generated by photoelectric converters 10a and 10b varies with time is detected. The spot position is scanned by operating a control circuit 9 so that the DELTAI based upon the output of a spot position detector 7 is invariably zero. A method which moves a cylindrical lens which has power only in the scanning direction or subscanning direction in the direction of the optical axis is employed for the spot position control by a spot position control system.

公开(公告)号：JPH0281457A

公开(公告)日：1990-03-22

申请号：JP23014688

申请日：1988-09-16

Applicant: CANON KK

Inventor： TANAKA YUTAKA ,  IWAMOTO KAZUNORI ,  MIZUSAWA NOBUTOSHI ,  UDA KOJI ,  KARIYA SADAO ,  SHIMODA ISAMU

IPC: H01L21/683 ,  G03F7/20 ,  H01L21/027

Abstract: PURPOSE:To facilitate keeping on holding held objects during service interruption by a method wherein a vacuum pump equipped with an electric source for service interruption is provided to constitute a system in valves provided on pipings for attracting the held objects can maintain the state before the service interruption even after the service interruption occurs and, further, and accumulator chamber is provided. CONSTITUTION:In an X-ray aligner, for instance, an X-ray is introduced into a stage storing chamber 1 by a mirror cylinder 8. Irradiated objects, i.e., a mask 6 and a wafer 5, are held by a mask chuck 3 and a wafer chuck 4 respectively and, further, the chuck 4 is fixed to a stage 9 and enclosed and stored in the storing chamber 1. A wafer hand 10 which carries the wafer 5 in and out is provided in the storing chamber 1. The mask 6 is held by the chuck 3 mechanically and the wafer 5 on the chuck 4 and the wafer hand 10 is held by a vacuum attracting force and, further, the chuck 4 and the wafer hand 10 are connected to an oil rotary pump 15 through pipings 11 and 12 in which valves 13 and 14 and an accumulator chamber 35 are provided. An electric source 16 and an electric source 17 for service interruption are connected to the oil rotary pump 15 through an electric source changer 37 and, moreover, a vacuum pump 19 is connected to the storing chamber 1.

公开(公告)号：JPH0277809A

公开(公告)日：1990-03-16

申请号：JP22838888

申请日：1988-09-14

Applicant: CANON KK

Inventor： KAWAKAMI EIGO ,  TANAKA YUTAKA ,  UDA KOJI ,  KARIYA TAKUO ,  SHIMODA ISAMU ,  UZAWA SHUNICHI

IPC: G05D16/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/677

Abstract: PURPOSE:To measure and control chamber pressure with high accuracy without using any expensive absolute pressure gauge by controlling a main chamber according to absolute pressure and a subordinate chamber according to the pressure difference from the main chamber. CONSTITUTION:This controller is equipped with the main gas chamber CO, at least one of subordinate gas chambers C1 and C2 linked with the main gas chamber CO through individual partition valves GV1 and GV2 and differential gauges G1 and G2, a pressure control means 10 which measures the pressure in the main gas chamber CO and controls the pressure to specific pressure, and a partition valve control means 20 which controls the opening and closing of the partition valves GV1 and GV2. Then the main chamber CO is controlled according to the absolute pressure and the subordinate chambers C1 and C2 are controlled according to the differential pressure. Consequently, the need to use many expensive absolute pressure sensors is eliminated and high-accuracy pressure control is carried out.

公开(公告)号：JPH0273618A

公开(公告)日：1990-03-13

申请号：JP22471388

申请日：1988-09-09

Applicant: CANON KK

Inventor： MIZUSAWA NOBUTOSHI ,  EBINUMA RYUICHI ,  KARIYA TAKUO ,  SHIMODA ISAMU ,  UZAWA SHUNICHI

IPC: G03F9/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To reduce in size an aligner and to improve its reliability by integrally mounting a blade for limiting an exposure beam at an alignment unit for detecting the deviation of a wafer and an alignment mark on a mask. CONSTITUTION:An alignment unit AAU is secured to a supporting member SPT, an alignment beam ABM is emitted to an alignment mark AMK on a mask MSK, and a deviation of the mark AMK on a wafer is detected. A blade BLD is secured to a predetermined position of a member PST through an arm ARM. Thus, the unit AAU and the blade BLD are integrally moved when an exposure beam EXB is exposed, and moving positioning means exclusive for the blade BLD is eliminated. Accordingly, an aligner can be reduced in size, and its reliability is improved.

公开(公告)号：JPH0273212A

公开(公告)日：1990-03-13

申请号：JP22573188

申请日：1988-09-08

Applicant: CANON KK

Inventor： MINOURA KAZUO ,  SHIMODA ISAMU

IPC: G02B26/10 ,  H04N1/04 ,  H04N1/113 ,  H04N1/23

Abstract: PURPOSE:To easily detect and correct a focal shift by scanning a light beam from a light source on plural detecting parts through a deflector and a lens system, and comparing or calculating signals obtained from said plural detecting parts. CONSTITUTION:An opening plate 11 is placed in a position being in a mirror image relation to a laser beam scanning line (broken line) on the photosensitive body surface 6, that is, in a position being optically equivalent to the photosensitive body surface with regard to a light source, and in case of scanning while changing a position of a laser beam waist by moving a lens system 2 for moving a focal position, as for an output signal I, an output pattern is varied such as S1, S2 and S3 against time (t). That is, as a result of scanning on a spot detector 8 by changing the beam waist position at every detecting part, an output pattern whose center intensity becomes the largest or an output pattern whose half-amplitude level becomes the smallest appears. Therefore, the lens system 2 for moving a focal position is operated by a control part 10 so as to obtain a beam waist position against its pattern.

公开(公告)号：JPH0268919A

公开(公告)日：1990-03-08

申请号：JP22048888

申请日：1988-09-05

Applicant: CANON KK

Inventor： UDA KOJI ,  TANAKA YUTAKA ,  MORI TETSUZO ,  SHIMODA ISAMU ,  UZAWA SHUNICHI

IPC: H05H13/04 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To prevent differential pressure from applying to a beryllium window even though the vacuum break of a port takes place; besides, make this approach keep other exposure devices from being damaged by exchanging abnormal signals regarding an exposure system through communication means which connect mutual control measures. CONSTITUTION:A SOR exposure system is equipped with: a SOR ring as well as a SOR ring control means for controlling the SOR ring; one or more of exposure devices 15 which performs exposure according to a SOR light generated by the SOR ring. In a SOR exposure system where intervals between at least two or more of control means such as the SOR ring as well as exposure device control means are connected by communication means 5, abnormal signals regarding the exposure system are exchanged by the communication means 5. For example, signals which detect the leakage of the vacuum line of the exposure system and output signals generated by the seismometers are used as the abnormal signals. Further, a beryllium window 20 is mounted at a SOR light incident port of the above exposure devices 15 and an emergency cutout valve 21 is disposed at the SOR light incident side in the vicinity of the berylluim window.

公开(公告)号：JPS6486427A

公开(公告)日：1989-03-31

申请号：JP2487287

申请日：1987-02-06

Applicant: CANON KK

Inventor： OKUNUKI MASAHIKO ,  SUZUKI AKIRA ,  SHIMODA ISAMU ,  KANEKO TETSUYA ,  TSUKAMOTO TAKEO ,  TAKEDA TOSHIHIKO ,  YONEHARA TAKAO ,  ICHIKAWA TAKESHI

IPC: H01J9/02 ,  C30B29/06 ,  H01J1/30 ,  H01J1/304 ,  H01L21/205

Abstract: PURPOSE:To keep off any form variations in an electrode and simultaneously aim at improvement in the performance by manufacturing plural numbers of electrodes with a pointed part each with a monocrystal. CONSTITUTION:An oxidation substrate 1 of SiO2 or the like processed by means of photoetching or the like, forming a plurality of cylindrical recesses 2 and setting up them in line, and a groove is installed between these recesses of each line, then a nucleus formation base 3 of Si, Si3N4 or the like is formed in each bottom surface of respective recesses 2 turning to a sedimentary surface. Next, centering on a single nucleus formed in the nucleus formation base 3, a monocrystal of Mo, W, Si or the like is made to grow up, thereby forming an electrode 4 of a rotator in the desired size with a conical pointed part. Afterward, each of electrodes is connected in common by electrode wiring. Finally, a metal plate 5 or a drawer electrode, where plural number of openings are installed in line by etching, is stuck to the oxidation substrate 1 so as to accord both centers of the opening and the recess 2 with each other.

公开(公告)号：JPS63269528A

公开(公告)日：1988-11-07

申请号：JP10303587

申请日：1987-04-28

Applicant: CANON KK

Inventor： OKUNUKI MASAHIKO ,  SHIMODA ISAMU ,  MIYAWAKI MAMORU ,  TSUKAMOTO TAKEO ,  SUZUKI AKIRA ,  KANEKO TETSUYA ,  TAKEDA TOSHIHIKO ,  SEKI MITSUAKI

IPC: H01J37/06 ,  G11B9/10 ,  H01J37/305 ,  H01L21/027 ,  H01L21/30 ,  H01L21/66

Abstract: PURPOSE:To realize a miniaturized and highly accurate device by a method wherein a vacuum isolation wall is installed at a charged particle beam generation source and a means to control a charged particle beam is installed at the isolation wall and/or a charged particle is detected so that plural electron sources or the like can be formed integrally on a single substrate. CONSTITUTION:While each EB source is deflected by its X-direction deflecting electrodes X11, X22 in an X-direction and a drawing operation is executed in the X- direction within a range to be covered by a deflection on the basis of the drawing information from memories MU, M1, a wafer WF and head MB are continuously shifted relatively in a Y-direction. By this setup, all picture elements in the Y-direction in a 1/2 region are drawn. An EB emission head where two or more EB generation sources ES1, ES2 are installed as a unit EB generation source constitutes a number of chambers by using parts V1-V3 or the like; a degree of vacuum is lowered in order of a first chamber-a third third chamber; a vacuum chuck VC for suction of the wafer WF can be used. During this process, sensors S11, S12 are attached to the rear surface of the part V1 or the like. If a part to mount a focusing lens FC and a deflecting electrode AD is constituted to be of multiple chamber structure and the degree of vacuum is lowered in regular order, an EP exposure operation can be executed in the air.

公开(公告)号：JPS63269526A

公开(公告)日：1988-11-07

申请号：JP10303087

申请日：1987-04-28

Applicant: CANON KK

Inventor： OKUNUKI MASAHIKO ,  SHIMODA ISAMU ,  MIYAWAKI MAMORU ,  TSUKAMOTO TAKEO ,  SUZUKI AKIRA ,  KANEKO TETSUYA ,  TAKEDA TOSHIHIKO ,  SEKI MITSUAKI

IPC: H01J37/06 ,  G11B9/10 ,  H01J37/305 ,  H01L21/027 ,  H01L21/30 ,  H01L21/66

Abstract: PURPOSE:To increase a processing speed by a method wherein plural multiple charged particle beam elements where plural charged particle beam generation sources are installed are arranged in rows and these charged particle generation sources are actuat ed on the basis of data of a pattern. CONSTITUTION:An alignment mark MM is formed in a head MB1; this mark is aligned with a wafer alignment mark WMR; after that, a drawing operation is first executed on all chips in one chip row in a Y-direction situated under the head MB1. After that, the head is shifted intermittently to other chip rows, and an alignment operation and the drawing operation are executed in the same manner. A head MB2 first detects a mark SM formed on a wafer stage by using a sensor S1 and executes a prealignment operation. Then, a diviation amount is measured by using marks M1, M2 and sensors S2, S3 in the state. An exposure operation is executed while the diviation amount is corrected on the basis of the drawing information from a memory by using an X deflecting electrode and a Y deflecting electrode or either of these. The exposure operation is executed while the head or a wafer is shifted continuously. When a plural of individual substrates where plural charged beam generation sources are installed are arranged in rows in this manner, it is possible to increase processing speed.