Quartz glass substrate and process for its production
    163.
    发明授权
    Quartz glass substrate and process for its production 失效
    石英玻璃基板及其生产工艺

    公开(公告)号:US07592063B2

    公开(公告)日:2009-09-22

    申请号:US11514997

    申请日:2006-09-05

    Abstract: For a substrate having fine convexoconcave patterns on its surface, the dimensions of the convexoconcave patterns in a vertical direction of a quartz glass substrate are controlled to be uniform with extreme accuracy and over the entire substrate surface. The quartz glass substrate is made to have a fictive temperature distribution of at most 40° C. and a halogen concentration of less than 400 ppm, and the etching rate of the surface of the quartz glass substrate is made uniform, whereby the dimensions of the convexoconcave patterns in a vertical direction of the quartz glass substrate are controlled to be uniform with good accuracy and over the entire substrate surface.

    Abstract translation: 对于在其表面上具有细凹凸图案的基板,石英玻璃基板的垂直方向上的凸凹图案的尺寸被控制为以极高的精度和整个基板表面均匀。 使石英玻璃基板具有至多40℃的假想温度分布和小于400ppm的卤素浓度,并且使石英玻璃基板的表面的蚀刻速率均匀,由此, 在石英玻璃基板的垂直方向上的凸凹图案被控制为具有良好的精度和整个基板表面的均匀。

    Optical component of quartz glass, method for producing said component, and method for exposing a substrate
    164.
    发明授权
    Optical component of quartz glass, method for producing said component, and method for exposing a substrate 有权
    石英玻璃的光学部件,所述部件的制造方法以及曝光基板的方法

    公开(公告)号:US07501367B2

    公开(公告)日:2009-03-10

    申请号:US11403267

    申请日:2006-04-13

    Abstract: To provide an optical component of quartz glass for use in a projection lens system for immersion lithography with an operating wavelength below 250 nm, which is optimized for use with linearly polarized UV laser radiation and particularly with respect to compaction and birefringence induced by anisotropic density change, it is suggested according to the invention that the quartz glass should show the combination of several properties: particularly a glass structure essentially without oxygen defects, a mean content of hydroxyl groups of less than 60 wt ppm, a mean content of fluorine of less than 10 wt ppm, a mean content of chlorine of less than 1 wt ppm. A method for producing such an optical component comprises the following method steps: producing and drying an SiO2 soot body under reducing conditions and treating the dried soot body before or during vitrification with a reagent reacting with oxygen defects of the quartz glass structure.

    Abstract translation: 提供用于投影透镜系统的石英玻璃的光学部件,用于工作波长低于250nm的浸没式光刻,其被优化用于线偏振UV激光辐射,特别是关于由各向异性密度变化引起的压实和双折射 根据本发明,建议石英玻璃应显示几种性能的组合:特别是基本上没有氧缺陷的玻璃结构,羟基的平均含量小于60重量ppm,氟的平均含量小于 10重量ppm,氯的平均含量小于1重量ppm。 一种制造这种光学元件的方法包括以下方法步骤:在还原条件下制备和干燥SiO 2烟炱体,并在玻璃化之前或期间用与石英玻璃结构的氧缺陷反应的试剂处理干燥的烟炱体。

    Optical component of quartz glass, method for producing said component, and method for exposing a substrate
    167.
    发明申请
    Optical component of quartz glass, method for producing said component, and method for exposing a substrate 有权
    石英玻璃的光学部件,所述部件的制造方法以及曝光基板的方法

    公开(公告)号:US20060234848A1

    公开(公告)日:2006-10-19

    申请号:US11403267

    申请日:2006-04-13

    Abstract: To provide an optical component of quartz glass for use in a projection lens system for immersion lithography with an operating wavelength below 250 nm, which is optimized for use with linearly polarized UV laser radiation and particularly with respect to compaction and birefringence induced by anisotropic density change, it is suggested according to the invention that the quartz glass should show the combination of several properties: particularly a glass structure essentially without oxygen defects, a mean content of hydroxyl groups of less than 60 wt ppm, a mean content of fluorine of less than 10 wt ppm, a mean content of chlorine of less than 1 wt ppm. A method for producing such an optical component comprises the following method steps: producing and drying an SiO2 soot body under reducing conditions and treating the dried soot body before or during vitrification with a reagent reacting with oxygen defects of the quartz glass structure.

    Abstract translation: 提供用于投影透镜系统的石英玻璃的光学部件,用于工作波长低于250nm的浸没式光刻,其被优化用于线偏振UV激光辐射,特别是关于由各向异性密度变化引起的压实和双折射 根据本发明,建议石英玻璃应显示几种性能的组合:特别是基本上没有氧缺陷的玻璃结构,羟基的平均含量小于60重量ppm,氟的平均含量小于 10重量ppm,氯的平均含量小于1重量ppm。 制造这种光学部件的方法包括以下步骤:在还原条件下制备和干燥SiO 2烟炱体,并在玻璃化之前或期间用与氧缺陷反应的试剂处理干燥的烟炱体 石英玻璃结构。

    Quartz glass member and projection aligner
    168.
    发明授权
    Quartz glass member and projection aligner 有权
    石英玻璃构件和投影对准器

    公开(公告)号:US06835683B2

    公开(公告)日:2004-12-28

    申请号:US10311233

    申请日:2002-12-17

    Abstract: A silica glass member of the present invention is one wherein when a composition thereof is expressed by SiOx, x is not less than 1.85 nor more than 1.95, wherein a concentration of hydrogen molecules included therein is not less than 1×1016 molecules/cm3 nor more than 5×1018 molecules/cm3, and wherein a difference A−B between an absorption coefficient A immediately before an end of irradiation with 1×104 pulses of ArF excimer laser light in an average one-pulse energy density of 2 mJ/cm2 and a second absorption coefficient B at 600 seconds after a stop of the irradiation with the ArF excimer laser light is not more than 0.002 cm−1. When this silica glass member is applied to an illumination optical system and/or a projection optical system in projection exposure apparatus, it becomes feasible to implement uniform exposure while reducing variation in illuminance on a reticle surface and in an exposure area on a wafer.

    Abstract translation: 本发明的石英玻璃构件是当其组成由SiO x表示时,x不小于1.85或不大于1.95,其中包含的氢分子的浓度不小于1×10 16分子/ cm <3>不超过5×10 18分子/ cm 3,并且其中在照射结束之前的吸收系数A与平均单脉冲中的1×10 4个ArF准分子激光脉冲之间的差AB 用ArF准分子激光照射停止600秒后的能量密度为2mJ / cm 2,第二吸收系数B为0.002cm -1以下。 当将该石英玻璃构件应用于投影曝光装置中的照明光学系统和/或投影光学系统时,可以实现均匀曝光,同时减小掩模版面和晶片上的曝光区域中的照度变化。

Patent Agency Ranking