Abstract:
PROBLEM TO BE SOLVED: To facilitate manufacturing of an element structure including a capacitive element.SOLUTION: The element structure includes: a first substrate BS1 including a first support layer 100 and a first movable beam 800a which has one end supported on the first support layer and has a space formed around the other end; and a second substrate BS2 including a second support layer 200 and a first fixed electrode 900a formed on the second support layer and is disposed so as to face the first substrate. A first movable electrode is formed on the first movable beam 800a, and the first fixed electrode and the first movable electrode are disposed so as to face each other with a space therebetween.
Abstract:
PROBLEM TO BE SOLVED: To mount a micro electro-mechanical system (MEMS) with a moved sensing axis on an IRSPCB in a sealed IC type package processed by a standard SMT attachment and an assembly process. SOLUTION: An attaching device 10 for an MEMS sensor die 28 includes a bracket provided with a die attaching face plane 30 and an interface plane 22 substantially planar and directed orthogonally each other, an electric signal carrier coupled between a die attaching face plane part and the interface plane and for carrying electric, grounding and operation signals, and an electric interface pad 24 attached directly to a printed circuit board PCB. COPYRIGHT: (C)2007,JPO&INPIT
Abstract:
A semiconductor dynamic quantity sensor, for example, an acceleration sensor is formed on a SOI substrate having an activation layer and a supporting layer with an oxide film interposed therebetween. A structure for the sensor is formed in the activation layer. An opening is formed in the supporting layer and the oxide film to expose the structure. In this sensor, stress layer is formed in the activation layer at a side contacting the oxide film. The stress layer is removed at a region facing the opening to prevent the structure from cambering.
Abstract:
In accordance with one embodiment, a single chip combination inertial and pressure sensor device includes a substrate, an inertial sensor including a movable sensing structure movably supported above the substrate, and a first fixed electrode positioned adjacent to the movable sensing structure, and a pressure sensor including a gap formed in the sensor at a location directly above the movable sensing structure, and a flexible membrane formed in a cap layer of the device, the flexible membrane defining a boundary of the gap and configured to flex toward and away from the gap in response to a variation in pressure above the flexible membrane.
Abstract:
A system and method for providing a MEMS sensor are disclosed. In a first aspect, the system is a MEMS sensor that comprises a substrate, an anchor region coupled to the substrate, at least one support arm coupled to the anchor region, at least two guiding arms coupled to and moving relative to the at least one support arm, a plurality of sensing elements disposed on the at least two guiding arms to measure motion of the at least two guiding arms relative to the substrate, and a proof mass system comprising at least one mass coupled to each of the at least two guiding arms by a set of springs. The proof mass system is disposed outside the anchor region, the at least one support arm, the at least two guiding arms, the set of springs, and the plurality of sensing elements.
Abstract:
A sensor device comprises a device structure (22) and a cap coupled with the device structure to produce a cavity in which components of the sensor device are located. The device structure includes a substrate (28,136,232) and a movable element (30,124,138,194,230) spaced apart from a surface (32,140) of the substrate. A port (34,142,234) extends through the substrate underlying the movable element. A sense element is spaced apart from the movable element and is displaced away from the port. The movable element and the sense element (40,42,146,148,150,152,190,244,246) form an inertial sensor to sense a motion stimulus as movement of the movable element relative to the sense element. An additional sense element (44,155,204,206,208,210,237) together with a diaphragm spans across the port. The movable element and the additional sense element form a pressure sensor for sensing a pressure stimulus from an external environment (84) as movement of the additional sense element together with the diaphragm relative to the movable element.
Abstract:
A method for fabricating a thermally isolated microelectromechanical system (MEMS) structure is provided. The method includes processing a first wafer of a first material with a glass wafer to form a composite substrate including at least one sacrificial structure of the first material and glass; forming a MEMS device in a second material; forming at least one temperature sensing element on at least one of: the composite substrate; and the MEMS device; and etching away the at least one sacrificial structure of the first material in the composite substrate to form at least one thermally isolating glass flexure. The MEMS device is thermally isolated on a thermal isolation stage by the at least one thermally isolating glass flexure. The at least one temperature sensing element in on a respective at least one of: the thermal isolation stage; and the MEMS device.
Abstract:
The invention relates to a micro-electromechanical device used as a force sensor, comprising a mobile mass connected to at least one securing zone by means of springs or deformable elements, and means for detecting the movement of the mobile mass, the mobile mass having an outer frame and an inner body, the outer frame and the inner body being connected by at least two flexible portions forming integral decoupling springs on two separate sides of the outer frame.
Abstract:
A system and method for providing a MEMS device with integrated electronics are disclosed. The MEMS device comprises an integrated circuit substrate and a MEMS subassembly coupled to the integrated circuit substrate. The integrated circuit substrate includes at least one circuit coupled to at least one fixed electrode. The MEMS subassembly includes at least one standoff formed by a lithographic process, a flexible plate with a top surface and a bottom surface, and a MEMS electrode coupled to the flexible plate and electrically coupled to the at least one standoff. A force acting on the flexible plate causes a change in a gap between the MEMS electrode and the at least one fixed electrode.