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    BEAM CONDITIONING SYSTEM
    11.
    发明申请
    BEAM CONDITIONING SYSTEM 审中-公开
    光束调节系统

    公开(公告)号：WO2004114325A2

    公开(公告)日：2004-12-29

    申请号：PCT/US2004/018494

    申请日：2004-06-10

    Applicant: OSMIC, INC.

    Inventor： VERMAN, Boris ,  HARADA, Jimpei

    IPC: G21K1/00

    CPC classification number: G21K1/062 ,  B82Y10/00 ,  G21K1/06 ,  G21K2201/061 ,  G21K2201/062 ,  G21K2201/064

    Abstract: The present invention provides an x-ray beam conditioning system with a Kirkpatrick-Baez diffractive optic including two optical elements, of which one of the optical elements is a crystal. The elements are arranged in a side-by-side configuration. The crystal can be a perfect crystal. One or both diffractive elements can be mosaic crystals. One element can be a multilayer optic. For example, the multilayer optic can be an elliptical mirror or a parabolic mirror with graded d-spacing. The graded d-spacing can be either lateral grading or dept grading, or both.

    Abstract translation: 本发明提供一种具有Kirkpatrick-Baez衍射光学元件的x射线束调节系统，其包括两个光学元件，其中一个光学元件是晶体。 元件排列成并排配置。 水晶可以是一个完美的水晶。 一个或两个衍射元件可以是镶嵌晶体。 一个元件可以是多层光学元件。 例如，多层光学器件可以是具有梯度d间距的椭圆镜或抛物面镜。 分级d间距可以是横向分级或部分分级，或两者。

    PROTECTIVE LAYER FOR MULTILAYERS EXPOSED TO HARD X-RAYS
    12.
    发明申请
    PROTECTIVE LAYER FOR MULTILAYERS EXPOSED TO HARD X-RAYS 审中-公开
    多层暴露于硬X射线的保护层

    公开(公告)号：WO2003060924A1

    公开(公告)日：2003-07-24

    申请号：PCT/US2002/034995

    申请日：2002-10-31

    Applicant: OSMIC, INC.

    Inventor： VERMAN, Boris ,  JOENSEN, Karsten ,  PLATONOV, Yuriy ,  SESHADRI, Srivatsan

    IPC: G21K1/06

    CPC classification number: B82Y10/00 ,  G21K1/062

    Abstract: An optical element for diffracting x-rays that includes a substrate (4), a diffraction structure (6) applied to the substrate, the diffraction structure including an exterior surface facing away from the substrate and the diffraction structure capable of diffracting x-rays and a protective layer (14) applied to the exterior surface.

    Abstract translation: 一种用于衍射X射线的光学元件，包括基板（4），施加到基板的衍射结构（6），衍射结构包括背离基板的外表面和能够衍射X射线的衍射结构， 施加到外表面的保护层（14）。

    X-RAY LENS SYSTEM
    14.
    发明申请
    X-RAY LENS SYSTEM 审中-公开
    X射线透镜系统

    公开(公告)号：WO0062306A2

    公开(公告)日：2000-10-19

    申请号：PCT/US0009170

    申请日：2000-04-07

    Applicant: OSMIC INC

    Inventor： VERMAN BORIS ,  JIANG LICAI ,  BONGLEA KIM ,  JOENSEN KARSTEN DAN

    IPC: G21K1/06 ,  G21K5/02 ,  G21K

    CPC classification number: G21K1/06 ,  A61N2005/1091 ,  A61N2005/1095

    Abstract: A modular x-ray lens system for use in directing x-rays comprising a radiation source which generates x-rays and a lens system which directs the x-rays, wherein the x-ray lens system may be configured to focus x-rays to a focal point and vary the intensity of said focal point.

    Abstract translation: 一种用于引导x射线的模块化X射线透镜系统，包括产生x射线的辐射源和引导x射线的透镜系统，其中x射线透镜系统可被配置为将x射线聚焦到 焦点并改变所述焦点的强度。

    TWO-DIMENSIONAL SMALL ANGLE X-RAY SCATTERING CAMERA
    15.
    发明申请
    TWO-DIMENSIONAL SMALL ANGLE X-RAY SCATTERING CAMERA 审中-公开
    二维小角度X射线散射相机

    公开(公告)号：WO2006130182A1

    公开(公告)日：2006-12-07

    申请号：PCT/US2006/000290

    申请日：2006-01-04

    Applicant: OSMIC, INC. ,  JIANG, Licai

    Inventor： JIANG, Licai

    IPC: G01N23/201 ,  G21K1/02

    CPC classification number: G21K1/04 ,  G01N23/20008 ,  G01N23/201

    Abstract: A two-dimensional x-ray scattering camera includes a source, an optic, a detector, and a pair of collimating blocks. The source emits x-ray beams that are reflected by the optic towards a sample. The detector detects scattering from the sample, the pair of collimating blocks is positioned between the optic and the detector to collimate the beam. A bottom surface of one block is substantially parallel a top surface of the other block, and the blocks are rotatable relative to the beam about a pivot. The system forms a two- dimensional beam that is symmetric about the primary beam axis at the detector position, regardless how the beam is collimated by the collimating blocks. The system therefore eliminates smearing and can be used for anisotropic small angle scattering at high resolution and low Q min .

    Abstract translation: 二维X射线散射照相机包括光源，光学元件，检测器和一对准直块。 源发射由光学器件朝向样品反射的x射线束。 检测器检测来自样品的散射，该对准直块位于光学元件和检测器之间以准直该光束。 一个块的底表面基本上平行于另一个块的顶表面，并且块可围绕枢轴相对于梁旋转。 该系统形成在检测器位置处关于主波束轴对称的二维波束，而不管射束如何被准直块准直。 因此，该系统消除了污迹，并且可以用于高分辨率和低Q分钟的各向异性小角度散射。

    X-RAY OPTICAL SYSTEM WITH ADJUSTABLE CONVERGENCE
    19.
    发明申请
    X-RAY OPTICAL SYSTEM WITH ADJUSTABLE CONVERGENCE 审中-公开
    具有可调整的X射线光学系统

    公开(公告)号：WO2004079754A1

    公开(公告)日：2004-09-16

    申请号：PCT/US2004/005603

    申请日：2004-02-26

    Applicant: OSMIC, INC.

    Inventor： VERMAN, Boris ,  JIANG, Licai

    IPC: G21K1/06

    CPC classification number: G21K1/06 ,  G21K1/04

    Abstract: An x-ray optical device includes an optic and an adjustable aperture that selectively occludes a portion of an x-ray beam. The adjustable aperture may be positioned between the optic and a sample and may be integrated with the optic or located in close proximity to the optic. The adjustable aperture enables a user to easily and effectively adjust the convergence of the x-rays. In doing so, the flux and resolution of the x-ray optical device can be optimized by using an optic having the maximum convergence allowed for all potential measurements, and then selecting a convergence for a particular measurement by adjusting the aperture.

    Abstract translation: X射线光学装置包括光学元件和可选择的孔，其选择性地遮挡X射线束的一部分。 可调整孔径可以位于光学元件和样品之间，并且可以与光学元件集成或者位于光学元件附近。 可调孔径使用户能够容易且有效地调节x射线的收敛。 在这样做时，可以通过使用具有对于所有潜在测量允许的最大收敛的光学器件，然后通过调节光圈来选择用于特定测量的会聚来优化X射线光学器件的通量和分辨率。

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