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公开(公告)号：KR1020090127195A
公开(公告)日：2009-12-09
申请号：KR1020097024229
申请日：2007-02-07
Applicant: 도쿄엘렉트론가부시키가이샤
CPC classification number: H05B3/145 , H01L21/67103 , H05B3/143 , H05B3/283 , H05B2203/002 , H05B2203/003 , H05B2203/014 , H05B2203/016 , H05B2203/037
Abstract: Provided is a planar heater having a substantially uniform heating temperature with a carbon wire heat generating body. The inner region and the outer region have different in-plane arrangement densities of carbon wire heat generating bodies (CW). A power supply terminal section having a connecting line for carrying electricity to a heat generating body (CW) is arranged at the center portion on the rear side of a silica glass board-like body. The connecting wire of the inner carbon wire heat generating body is connected at the center portion of the silica glass board-like body, the connecting lines (3a, 3b) of the outer carbon wire heat generating body are extended to the outer regions from the center portion of the silica glass board-like body, without crossing the inner carbon wire heat generating body (CW), and are connected with the outer carbon wire heat generating body (CW).
Abstract translation: 本发明提供一种具有与碳丝发热体基本均匀的加热温度的平面加热器。 内部区域和外部区域具有不同的碳线发热体的面内排列密度（CW）。 在石英玻璃板状体的后侧的中央部配置具有用于向发热体（CW）传送电力的连接线的电源端子部。 内碳丝发热体的连接线在石英玻璃板状体的中心部分连接，外部碳线发热体的连接线（3a，3b）从外部碳线发热体延伸到外部区域 石墨玻璃板状体的中心部分，不与内碳丝发热体（CW）交叉，并与外碳丝发热体（CW）连接。
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公开(公告)号：KR100749378B1
公开(公告)日：2007-08-14
申请号：KR1020067003016
申请日：2005-02-08
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/205
CPC classification number: C23C16/4486 , C23C16/34 , C23C16/401 , C23C16/405
Abstract: 본 발명의 성막 장치는 액상 원료를 공급하는 원료 공급부와, 액상 원료를 기화하여 원료 가스를 생성하는 기화기와, 원료 가스를 도입하여 피처리 기판상에 박막을 형성하는 성막실을 갖는 성막 장치이다. 상기 기화기는, 원료 공급부로부터 공급된 액상 원료를 분사하는 분무 노즐과, 분무 노즐가 개구하는 일단부 및 폐쇄된 타단부를 갖고, 분무 노즐로부터 분사된 미스트 형상의 액상 원료를 기화하여 원료 가스를 생성하는 기화실과, 기화실을 가열하는 히터와, 분무 노즐의 근방에 있어서 기화실로 개구하고, 기화실로부터 원료 가스를 도출하는 도출구를 구비한다. 상기 기화실의 폐쇄된 타단부는 분무 노즐로부터 분사된 액상 원료가 기화하기 위해 충분한 거리만큼 분무 노즐로부터 떨어져 있다.
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公开(公告)号：KR1020060086375A
公开(公告)日：2006-07-31
申请号：KR1020067008748
申请日：2004-10-22
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/205 , H01L21/31
CPC classification number: C23C16/45565
Abstract: A shower head for supplying a raw material gas and a support gas for film formation into the treatment container of a film-forming device, comprising a shower head body with a gas injection surface (8). A first diffusion chamber (60) receiving and diffusing the raw material gas and second diffusion chambers (62) receiving and diffusing the support gas are formed in the shower head body. Raw material gas injection ports (10A) communicating with the first diffusion chamber and first support gas injection ports (10B) communicating with the second diffusion chambers are formed in the gas injection surface. Each of the first support gas injection ports (10B) is formed in a ring shape surrounding each of the raw material gas injection ports (10A) in proximity to each other.
Abstract translation: 一种用于将原料气体和用于成膜的支撑气体供应到成膜装置的处理容器中的喷头，包括具有气体注入表面（8）的喷淋头本体。 接收和扩散原料气体的第一扩散室（60）和接收和扩散支撑气体的第二扩散室（62）形成在淋浴头本体中。 在气体喷射表面中形成有与第一扩散室连通的原料气体注入口（10A）和与第二扩散室连通的第一支撑气体注入口（10B）。 每个第一支撑气体注入口（10B）形成为围绕彼此靠近的原料气体注入口（10A）的环状。
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公开(公告)号：KR1020060032658A
公开(公告)日：2006-04-17
申请号：KR1020067003016
申请日：2005-02-08
Applicant: 도쿄엘렉트론가부시키가이샤
IPC: H01L21/205
CPC classification number: C23C16/4486 , C23C16/34 , C23C16/401 , C23C16/405
Abstract: Disclosed is a film-forming apparatus comprising a raw material supply unit for supplying a liquid raw material, a vaporizer for producing a raw material gas by vaporizing the liquid raw material, and a film-forming chamber wherein a thin film is formed on a substrate to be processed by introducing the raw material gas thereinto. The vaporizer comprises a spray nozzle for spraying the liquid raw material supplied from the raw material supply unit, a vaporizing chamber having an end portion to which the spray nozzle has an opening and the other closed end portion for producing a raw material gas by vaporizing the liquid raw material sprayed thereinto in the form of mist by the spray nozzle, a heater for heating the vaporizing chamber, and an outlet having an opening to the vaporizing chamber near the spray nozzle for letting the raw material gas out from the vaporizing chamber. The closed end portion of the vaporizing chamber is distant enough from the spray nozzle to enable vaporization of the liquid raw material sprayed thereinto through the spray nozzle.
Abstract translation: 公开了一种成膜设备，包括用于供应液体原料的原料供应单元，用于通过蒸发液体原料来生产原料气体的蒸发器，以及在基板上形成薄膜的成膜室 通过将原料气体引入其中进行处理。 蒸发器包括用于喷射从原料供应单元供应的液体原料的喷嘴，具有喷嘴具有开口的端部的蒸发室，以及用于通过汽化所述喷嘴的气体生成原料气体的另一封闭端部 液体原料以喷雾喷雾形成雾状，用于加热汽化室的加热器，以及在喷嘴附近具有通向蒸发室的开口的出口，用于使原料气体从蒸发室排出。 蒸发室的封闭端部与喷嘴相距足够远，能够喷射喷射的液体原料蒸发。
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