公开(公告)号：KR1020020008685A

公开(公告)日：2002-01-31

申请号：KR1020000042687

申请日：2000-07-25

Applicant: 삼성전자주식회사

Inventor： 이옥선 ,  김혁기

IPC: H01L21/304

Abstract: PURPOSE: An apparatus for aligning a wafer flat zone is provided to remove particles by using a particle removal portion. CONSTITUTION: A cassette has a slut for loading a multitude of wafer(W). The wafers are inserted vertically into the slut. A roller(22) is installed at a lower portion of the cassette in order to align a wafer flat zone. The roller(22) is contacted with a side of the wafer. The wafer is rotates and the wafer flat zone is aligned when the roller(22) is rotated. A roller drive portion(24) is connected with the roller(22) in order to rotate the roller(22). A particle removal portion(26) is used for removing particles from a surface of the roller(22). The particle removal portion(26) is formed with a brush for removing the particles, a vacuum absorption hole for absorbing the particles, and a fixing portion for fixing the brush, and the vacuum absorption hole.

Abstract translation: 目的：提供一种用于对准晶片平坦区域的装置，以通过使用颗粒去除部分去除颗粒。 构成：盒带有用于装载大量晶片（W）的。器。 将晶片垂直插入sl。。 辊子（22）安装在盒的下部，以对准晶片平坦区域。 辊（22）与晶片的一侧接触。 当辊（22）旋转时，晶片旋转并且晶片平坦区域对准。 辊驱动部分（24）与辊（22）连接以便使辊（22）旋转。 颗粒去除部分（26）用于从辊（22）的表面去除颗粒。 颗粒去除部分（26）由用于除去颗粒的刷子，用于吸收颗粒的真空吸收孔以及用于固定刷子的固定部分和真空吸收孔形成。

公开(公告)号：KR1020010086857A

公开(公告)日：2001-09-15

申请号：KR1020000010780

申请日：2000-03-03

Applicant: 삼성전자주식회사

Inventor： 김혁기 ,  이옥선 ,  한윤수

IPC: H01L21/68

Abstract: PURPOSE: A wafer storage box is to prevent contamination of a wafer due to particles by reducing friction of a box material and a cassette material generated at a contact surface of the box and the cassette. CONSTITUTION: A wafer storage box(200) comprises a body(210) of plastic material and a low oscillating stub. The low oscillating stub consists of a central stub(230) and an outer stub(240) and is inserted into a hole(H) formed at a bottom surface(220) of the body and closely engaged with the bottom surface. The hole is formed to pass through the bottom surface of the body. A round projection is provided at a central stub to support a recess formed at a bottom surface of a cassette. The low oscillating stub is made of a friction resistant material and is engaged with the hole in an adhesive manner or in a non-adhesive manner. The stub is an insertion type stub or a welding adhesion type stub. The term of low oscillating means that when the cassette containing the wafer is mounted to the box or when the box is moved to a place at which a semiconductor process is accomplished, particles are rarely generated.

Abstract translation: 目的：晶圆储存盒是为了防止由于颗粒而导致的晶片污染，因为盒材料和在盒子和盒的接触表面产生的盒材料的摩擦减小。 构成：晶片存储盒（200）包括塑料材料的本体（210）和低振荡短截线。 低摆动短截线由中心短截线（230）和外短截线（240）组成，并插入形成在本体的底面（220）的孔（H），并与底面紧密接合。 孔形成为穿过身体的底表面。 圆形突起设置在中心短柱处以支撑形成在盒的底表面处的凹部。 低振荡短截线由耐摩擦材料制成，并以粘合方式或以非粘合方式与孔接合。 短截线为插入型短截线或焊接附着型短截线。 低振荡的术语意味着当将包含晶片的盒子安装到盒子上时或者当盒子移动到完成半导体工艺的地方时，很少会产生颗粒。

公开(公告)号：KR1019990053808A

公开(公告)日：1999-07-15

申请号：KR1019970073509

申请日：1997-12-24

Applicant: 삼성전자주식회사

Inventor： 임창수 ,  김혁기 ,  김수련 ,  김일경

IPC: B32B5/26 ,  A41D13/00 ,  D06N7/00

Abstract: 반도체 클린룸용 방진원단으로서, 편직물로 된 기저층, 상기 기저층위에 점접착되며 무공(無空)타입의 고흡수성 폴리우레탄 수지필름으로 된 중간층, 상기 중간층위에 접착되며 경사 또는 위사 방향의 소정 간격으로 도전사가 배열된 폴리에스테르 고밀도 직물로 이루어진 외피층의 3층 구조로 구성되어 인체에서 발생되는 수분 등의 미세한 파티클에 대한 차폐 기능이 우수하고 착용감이 뛰어난 반도체 클린룸용 방진원단이 개시되어 있다.

公开(公告)号：KR1020150124743A

公开(公告)日：2015-11-06

申请号：KR1020140051677

申请日：2014-04-29

Applicant: 삼성전자주식회사

Inventor： 조현호 ,  김혁기 ,  남정훈

IPC: H01L21/673 ,  B65D85/38

CPC classification number: H01L21/67383 ,  H01L21/67379

Abstract: 서로마주보는제1측바디부및 제2측바디부, 상기제1측및 제2측바디부들의상부와연결된상부바디부, 상기제1측및 제2측바디부들의일측단부와연결된후면바디부, 및상기제1측및 제2측바디부들의하부와연결되며, 상기제1측및 제2측바디부들, 상기상부바디부및 후면바디부와함께내부공간을한정하는하부바디부를포함하는쉘 바디부; 상기상부바디부와상기제1측바디부사이의엣지영역상에배치되며상기하부바디부로부터상기상부바디부방향으로돌출된제1 핸들부; 상기상부바디부와상기제2측바디부사이의엣지영역상에배치되며상기하부바디부로부터상기상부바디부방향으로돌출된제2 핸들부; 상기내부공간에의해노출되는상기제1측바디부의제1 내측벽에배치된제1 슬롯부; 및상기내부공간에의해노출되는상기제2측바디부의제2 내측벽에배치된제2 슬롯부를포함하되, 상기제1 및제2 핸들부들의각각은상기쉘 바디부에결합되는서브핸들부및 상기서브핸들부상의메인핸들부를포함하고, 상기제1 및제2 슬롯부들의각각은복수의개별슬롯가이드및 상기개별슬롯가이드상의복수의서포터들을포함하고, 상기각각의서포터들은쉘 바디부의웨이퍼출입부로부터상기쉘 바디부의상기후면바디부방향으로갈수록높아지는경사진면을갖는웨이퍼수납장치가제공된다.

Abstract translation: 提供了一种晶片接收装置，包括：壳主体部分，包括彼此面对的第一侧主体部分和第二侧主体部分，上主体部分连接到第一侧和第二侧体的上部 部分，连接到第一侧和第二侧身体部分的一侧的端部的后表面体部分，以及连接到第一侧和第二侧身体部分的下部的下主体部分， 内部空间与第一侧和第二侧主体部分，上主体部分和后表面主体部分一起; 第一手柄部，其布置在所述上​​身部和所述第一侧身部之间的边缘区域的顶部，并且从所述下身部朝向所述上身部突出; 第二手柄部，布置在上身部和第二侧身部之间的边缘区域的顶部，并且从下身部朝向上身部突出; 第一槽部，其布置在由所述内部空间暴露的所述第一侧主体部分的所述第一内侧壁上; 以及布置在由内部空间暴露的第二侧体部的第二内侧壁上的第二槽部。 第一和第二手柄部分中的每一个包括：与壳体部分组合的副手柄部分; 以及在副把手部分的顶部上的主把手部分。 第一和第二槽部分中的每一个包括：多个独立的狭槽引导件; 和多个支持者在单个插槽指南的顶部。 每个支撑体具有从壳体部分的晶片入口部分朝向壳体部分的后表面主体部分变得更高的倾斜表面。

公开(公告)号：KR1020110103830A

公开(公告)日：2011-09-21

申请号：KR1020100115102

申请日：2010-11-18

Applicant: 삼성전자주식회사

Inventor： 나혁주 ,  김현준 ,  이건형 ,  김혁기 ,  김기두

IPC: H01L21/673 ,  H01L21/67 ,  B65D85/38 ,  H01L21/68

CPC classification number: H01L21/6732 ,  B65D85/38 ,  H01L21/67242 ,  H01L21/67248 ,  H01L21/68

Abstract: 본 발명은 기판 이송 용기, 가스 퍼지 모니터링 툴, 그리고 이들을 구비한 반도체 제조 설비를 개시한다. 기판 이송 용기의 내부에는 분자상 오염 물질, 온/습도, 파티클, 차압을 감지 부재들이 배치되고, 감지 부재들의 검출 신호는 기판 이송 용기의 외벽에 배치된 무선 송신기를 통해 외부로 실시간으로 송출된다. 그리고, 가스 퍼지 모니터링 툴은 기판 이송 용기로 퍼지 가스를 공급하는 스토커의 퍼지 유닛들의 정상 가동 여부를 모니터링한다.

公开(公告)号：KR100481307B1

公开(公告)日：2005-04-07

申请号：KR1020010069426

申请日：2001-11-08

Applicant: 삼성전자주식회사

Inventor： 함동석 ,  이건형 ,  김혁기 ,  박경호

IPC: H01L21/68

CPC classification number: H01L21/67396 ,  H01L21/67775 ,  Y10S414/137 ,  Y10S414/14

Abstract: 본 발명은 반도체 제조 설비에서 웨이퍼를 담은 카세트가 놓여지는 카세트 테이블(cassette table)에 관한 것이다. 본 발명의 카세트 테이블은 탑 플레이트(top plate)와 상기 탑 플레이트 상에 설치되고, 웨이퍼를 담은 상기 카세트(cassette)를 지지하는 카세트 지지부 및 상기 카세트에 대전된 정전기를 방출하기 위한 방전 수단을 구비한다.

Abstract translation: 其上支撑有晶片盒的盒式台面允许静电从盒中排出，因此形成设置在盒中的晶片。 盒式桌子包括顶板，安装在顶板上并支撑盒的盒式支架。 盒式支架的至少一部分由允许静电通过其排出到地面的材料制成。

公开(公告)号：KR1020040077008A

公开(公告)日：2004-09-04

申请号：KR1020030012372

申请日：2003-02-27

Applicant: 삼성전자주식회사

Inventor： 남태영 ,  김상용 ,  김혁기

IPC: H01L21/68

Abstract: PURPOSE: A carrier holder for cleaning a carrier is provided to clean a FOSB(Front Opening Shipping Box) by using an existing FOUP(Front Open Unified Pod) apparatus. CONSTITUTION: The first lateral part(140) is installed at a base part(120). The first lateral part is opposite to one side of a carrier. The second lateral part(160) is installed at the base part. The second lateral part is opposite to the other side of the carrier. A cover part(190) is connected to an upper part of the first lateral part and is coupled to or decoupled from the second lateral part. An insertion part(180) is inserted into the inside of the carrier. The carrier is formed with a FOUP or a FOSB. The insertion part has the predetermined height enough for coupling the cover part to the second lateral part.

Abstract translation: 目的：提供用于清洁承运人的承运人保持架，以便使用现有的FOUP（前开式统一荚）装置清洁FOSB（前开式装运箱）。 构成：第一侧部（140）安装在基部（120）处。 第一侧面部分与载体的一侧相对。 第二侧部（160）安装在基部。 第二横向部分与载体的另一侧相对。 盖部分（190）连接到第一横向部分的上部，并且与第二横向部分联接或与第二侧部分离开。 插入部分（180）插入到载体的内部。 载体由FOUP或FOSB形成。 插入部具有足够的预定高度，用于将盖部分耦合到第二侧部。

公开(公告)号：KR1020040064326A

公开(公告)日：2004-07-19

申请号：KR1020030001542

申请日：2003-01-10

Applicant: 삼성전자주식회사

Inventor： 김혁기 ,  김기두 ,  안요한

IPC: H01L21/68

Abstract: PURPOSE: A substrate processing apparatus capable of controlling contamination of a substrate transfer module is provided to reduce an interval of recovery time in an initial operation and improve efficiency of etching equipment by installing gate valves in the upper, lower, and side surfaces of a cover attached to the outside of a substrate transfer chamber. CONSTITUTION: A plurality of substrates are received in a receptacle. A transfer chamber provides a space for transferring the substrates. A substrate transfer unit transfers the substrates in the receptacle to a substrate processing part for performing a predetermined process on the substrate, disposed in the substrate transfer chamber(514). A load port(518a,518b) supports the receptacle, disposed in the outside of the substrate transfer chamber. A cover has a gas circulation path that circulates the purge gas supplied to the substrate transfer chamber and re-supplies the circulated purge gas to the substrate transfer chamber, attached to the substrate transfer chamber in a way that the cover surrounds the outer surface of the substrate transfer chamber.

Abstract translation: 目的：提供一种能够控制基板转印模块的污染的基板处理装置，以减少初始操作中的恢复时间的间隔，并且通过在盖的上，下和侧表面中安装闸阀来提高蚀刻设备的效率 连接到基板传送室的外部。 构成：多个基板被容纳在容器中。 传送室提供用于传送基板的空间。 衬底转移单元将容器中的衬底转移到衬底处理部分，用于在衬底传送室（514）中设置在衬底上进行预定处理。 负载端口（518a，518b）支撑设置在基板传送室外侧的插座。 盖具有气体循环路径，其循环供给到基板传送室的吹扫气体，并且将循环的净化气体重新供给到基板传送室，所述基板传送室以覆盖物的外表面的方式附着到基板传送室 底物转移室。

公开(公告)号：KR1020030038021A

公开(公告)日：2003-05-16

申请号：KR1020010069426

申请日：2001-11-08

Applicant: 삼성전자주식회사

Inventor： 함동석 ,  이건형 ,  김혁기 ,  박경호

IPC: H01L21/68

CPC classification number: H01L21/67396 ,  H01L21/67775 ,  Y10S414/137 ,  Y10S414/14

Abstract: PURPOSE: A cassette table for semiconductor device manufacturing equipment is provided to be capable of discharging static electricity induced on a cassette while reducing the impact of the cassette by using a discharge part made of conductive material. CONSTITUTION: A cassette table(200) for loading a wafer cassette(120) is provided with a top plate(210), a cassette support part(220) installed on the top plate(210) for supporting the wafer cassette(120), and a ground wire(170). The cassette support part(220) further comprises a plurality of guide blocks(222) for guiding the wafer cassette(120) to the predetermined portion of the top plate(210), and a plurality of pads(224) for loading the wafer cassette(120). Preferably, at least one of the guide blocks(222) or the pads(224) is used for a discharge part made of conductive material in order to discharge static electricity induced on the wafer cassette(120). Preferably the discharge part is made of poly ether ether ketone and carbon fiber.

Abstract translation: 目的：提供一种用于半导体器件制造设备的盒式工作台，以便能够通过使用由导电材料制成的放电部件来减少盒子的冲击，从而释放在盒上引起的静电。 构造：用于装载晶片盒（120）的盒式台（200）设置有顶板（210），安装在用于支撑晶片盒（120）的顶板（210）上的盒支撑部分（220） 和地线（170）。 盒支撑部分（220）还包括用于将晶片盒（120）引导到顶板（210）的预定部分的多个引导块（222），以及多个用于将晶片盒 （120）。 优选地，导电块（222）或焊盘（224）中的至少一个用于由导电材料制成的放电部件，以便放电在晶片盒（120）上引起的静电。 优选地，排出部分由聚醚醚酮和碳纤维制成。

公开(公告)号：KR1020020075055A

公开(公告)日：2002-10-04

申请号：KR1020010015224

申请日：2001-03-23

Applicant: 삼성전자주식회사

Inventor： 김혁기 ,  남태영

IPC: H01L21/304

Abstract: PURPOSE: A wafer cleaning apparatus and a wafer cleaning method are provided to be capable of cleaning simultaneously surface and side portions of a wafer. CONSTITUTION: A rotation axis(20) has a planarized plane for attaching a wafer(W). A first cleaner supply part(22) supplies a cleaning solution to the surface of the wafer(W). A first brush(24) is located spaced apart from the surface of the wafer(W). A second cleaner supply part(30) supplies the cleaning solution into the side of the wafer. A second brush(26) is located spaced apart from the side of the wafer(W). The first and second brushes(24,26) are connected to an operating unit.

Abstract translation: 目的：提供晶片清洁装置和晶片清洗方法，以便能够同时清洗晶片的表面和侧面部分。 构成：旋转轴（20）具有用于附接晶片（W）的平面化平面。 第一清洁剂供应部件（22）将清洁溶液供应到晶片（W）的表面。 第一刷（24）与晶片（W）的表面间隔开。 第二清洁剂供应部件（30）将清洁溶液供应到晶片的侧面。 第二刷（26）与晶片（W）的侧面间隔开。 第一和第二刷子（24,26）连接到操作单元。