公开(公告)号：US20170357161A1

公开(公告)日：2017-12-14

申请号：US15688262

申请日：2017-08-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Cornelius Maria ROPS ,  Nicolaas Rudolf Kemper ,  Michel Riepen

IPC: G03F7/20

CPC classification number: G03F7/70341

Abstract: An immersion lithographic apparatus is disclosed that includes a fluid handling system configured to confine immersion liquid to a localized space between a final element of a projection system and a substrate and/or table and a gas supplying device configured to supply gas with a solubility in immersion liquid of greater than 5×10−3 mol/kg at 20° C. and 1 atm total pressure to an area adjacent the space.

公开(公告)号：US20170219939A1

公开(公告)日：2017-08-03

申请号：US15328376

申请日：2015-06-26

Applicant: ASML Netherlands B.V.

Inventor： Theodorus Wilhelmus POLET ,  Johannes Jacobus BASELMANS ,  Willem Jan BOUMAN ,  Han Henricus Aldegonda LEMPENS ,  Theodorus Marinus MODDERMAN ,  Cornelius Maria ROPS ,  Bart SMEETS ,  Koen STEFFENS ,  Ronald VAN DER HAM

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/7095

Abstract: An immersion lithographic apparatus includes a projection system. The projection system is configured to project a patterned radiation beam through an immersion liquid onto a target portion of a substrate. An external surface of the projection system includes a first surface. The first surface has a non-planar shape. An element is attached to the first surface and positioned so that at least a portion of the element contacts the immersion liquid in use. The element includes a closed loop of continuously integral material in a preformed state and conforms to the non-planar shape of the first surface.

公开(公告)号：US20170108781A1

公开(公告)日：2017-04-20

申请号：US15317386

申请日：2015-05-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Aart Adrianus VAN BEUZEKOM ,  Jozef Augustinus Maria ALBERTI ,  Hubert Marie SEGERS ,  Ronald VAN DER HAM ,  Francis FAHRNI ,  Ruud OLIESLAGERS ,  Gerben PIETERSE ,  Cornelius Maria ROPS ,  Pepijn VAN DEN EIJNDEN ,  Paul VAN DONGEN ,  Bas WILLEMS

IPC: G03F7/20

CPC classification number: G03F7/7075 ,  G03F7/70341 ,  G03F7/70991 ,  H01L21/52 ,  H01L21/67034 ,  H01L21/6704 ,  H01L21/67178 ,  H01L21/67207 ,  H01L21/67225

Abstract: A lithographic apparatus includes a substrate table, a post-exposure handling module, a substrate handling robot and a drying station. The substrate table is configured to support a substrate for an exposure process. The post-exposure handling module is configured to handle the substrate post-exposure. The substrate handling robot is configured to transfer the substrate from the substrate table along a substrate unloading path into the post-exposure handling module. The drying station is configured to actively remove liquid from a surface of the substrate. The drying station is located in the substrate unloading path. The drying station is located in the post-exposure handling module. The post-exposure handling module may be a substrate handler.

公开(公告)号：US20150309421A1

公开(公告)日：2015-10-29

申请号：US14712671

申请日：2015-05-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Rogier Hendrikus Magdalena CORTIE ,  Michel RIEPEN ,  Cornelius Maria ROPS

IPC: G03F7/20

CPC classification number: G03F7/70483 ,  G03F7/70341

Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the meniscus pinning feature; and a gas recovery opening radially outward of the plurality of gas supply openings in a linear array.

Abstract translation: 一种用于光刻设备的流体处理结构，所述流体处理结构在从被配置为将浸没流体包含在流体处理结构外部的区域的空间的边界处具有：弯液面锁定特征，以阻止浸没流体在径向向外 方向从空间; 线性阵列中的多个气体供应开口，其至少部分地围绕半月板钉扎特征并且径向向外; 以及以多个气体供给开口径向向外的线性阵列的气体回收开口。

公开(公告)号：US20230418165A1

公开(公告)日：2023-12-28

申请号：US18252776

申请日：2021-10-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Cornelius Maria ROPS ,  Erik, Henricus Egidius, Catharina EUMMELEN ,  Giovanni, Luca GATTOBIGIO ,  Christianus, Wilhelmus Johannes BERENDSEN

IPC: G03F7/00

CPC classification number: G03F7/70341

Abstract: Disclosed herein is a fluid handling system for a lithographic apparatus, wherein the fluid handling system is configured to confine immersion liquid to a liquid confinement space between a part of a projection system and a surface of a substrate in the lithographic apparatus whereby a radiation beam projected from the projection system can irradiate the surface of the substrate by passing through the immersion liquid, the fluid handling system comprising: a damper arranged between a first extraction member and a second extraction member both configured to extract fluid; wherein the damper is configured to support a meniscus of the immersion liquid between a surface of the damper and the surface of the substrate.

公开(公告)号：US20230259037A1

公开(公告)日：2023-08-17

申请号：US18015522

申请日：2021-06-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Cornelius Maria ROPS ,  Christianus Wilhelmus Johannes BERENDSEN ,  Erik Henricus Egidius Catharina EUMMELEN ,  Dagmar Antoinette WISMEIJER

IPC: G03F7/20 ,  B06B1/06

CPC classification number: G03F7/70341 ,  B06B1/0644

Abstract: A lithographic apparatus has a substrate holder configured to hold a substrate and a projection system configured to project a radiation beam onto the substrate held by the substrate holder. There is also a fluid handling system configured to confine immersion liquid to a space between a part of the projection system and a surface of the substrate so that the radiation beam can irradiate the surface of the substrate by passing through the immersion liquid. An excitation device is provided to generate surface acoustic waves in the substrate and propagating toward the immersion liquid.

公开(公告)号：US20210088912A1

公开(公告)日：2021-03-25

申请号：US17112278

申请日：2020-12-04

Applicant: ASML NETHERLANDS B.V.

Inventor： Cornelius Maria ROPS ,  Walter Theodorus Matheus STALS ,  David BESSEMS ,  Giovanni Luca GATTOBIGIO ,  Victor Manuel BLANCO CARBALLO ,  Erik Henricus Egidius Catharina EUMMELEN ,  Ronald VAN DER HAM ,  Frederik Antonius VAN DER ZANDEN ,  Wilhelmus Antonius WERNAART

IPC: G03F7/20 ,  B01D19/00 ,  G03B27/52

Abstract: A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure CO2 gas so as to provide a substantially pure CO2 gas environment adjacent to, and radially outward of, the space.

公开(公告)号：US20200166851A1

公开(公告)日：2020-05-28

申请号：US16778635

申请日：2020-01-31

Applicant: ASML Netherlands B.V.

Inventor： Cornelius Maria ROPS ,  Walter Theodorus Matheus STALS ,  David BESSEMS ,  Giovanni Luca GATTOBIGIO ,  Victor Manuel BLANCO CARBALLO ,  Erik Henricus Egidius Catharina EUMMELEN ,  Ronald VAN DER HAM ,  Frederik Antonius VAN DER ZANDEN ,  Wilhelmus Antonius WERNAART

IPC: G03F7/20 ,  B01D19/00 ,  G03B27/52

Abstract: A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure CO2 gas so as to provide a substantially pure CO2 gas environment adjacent to, and radially outward of, the space.

公开(公告)号：US20200150545A1

公开(公告)日：2020-05-14

申请号：US16604324

申请日：2018-03-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Giovanni Luca GATTOBIGIO ,  Nirupam BANERJEE ,  Johan Franciscus Maria BECKERS ,  Erik Henricus Egidius Catharina EUMMELEN ,  Ronald Frank KOX ,  Theodoras Wilhelmus POLET ,  Cornelius Maria ROPS ,  Mike Paulus Johannes VAN GILS ,  Wouterus Jozephus Johannes VAN SLUISVELD ,  Rik VANGHELUWE

IPC: G03F7/20

Abstract: A method of performance testing working parameters of a fluid handing structure in an immersion lithographic apparatus, the method including: placing a test substrate having an upper surface with a first portion with a resist defining the upper surface and a second portion with a material different from the resist defining the rest of the upper surface on a table in the immersion lithographic apparatus, confining liquid on a region of an upper surface of the table and/or the upper surface of the test substrate by operating the fluid handing structure using the associated working parameters, moving the table such that the region moves from the second portion to the first portion, and detecting change to and/or residue on the first portion as a result of liquid being left behind on the first portion during the moving.

公开(公告)号：US20160103398A1

公开(公告)日：2016-04-14

申请号：US14975481

申请日：2015-12-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Rogier Hendrikus Magdalena CORTIE ,  Nicolaas TEN KATE ,  Niek Jacobus Johannes ROSET ,  Michel RIEPEN ,  Henricus Jozef CASTELIJNS ,  Cornelius Maria ROPS ,  Jim Vincent OVERKAMP

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341

Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; and a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the one or more meniscus pinning features, wherein the plurality of gas supply openings in a linear array are of a similar or the same size.