公开(公告)号：US20180081278A1

公开(公告)日：2018-03-22

申请号：US15789702

申请日：2017-10-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Andrey Alexandrovich NIKIPELOV ,  Olav Waldemar Vladimir FRIJNS ,  Gosse Charles DE VRIES ,  Erik Roelof LOOPSTRA ,  Vadim Yevgenyevich BANINE ,  Pieter Willem Herman DE JAGER ,  Rilpho Ludovicus DONKER ,  Han-Kwang NIENHUYS ,  Borgert KRUIZINGA ,  Wouter Joep ENGELEN ,  Otger Jan LUITEN ,  Johannes Antonius Gerardus AKKERMANS ,  Leonardus Adrianus Gerardus GRIMMINCK ,  Vladimir LITVINENKO

IPC: G03F7/20 ,  G01J1/04

CPC classification number: G03F7/70033 ,  G01J1/0407 ,  G01J1/0418 ,  G01J1/26 ,  G01J1/429 ,  G02B1/06 ,  G02B5/205 ,  G02B26/023 ,  G03F7/70008 ,  G03F7/7055 ,  G03F7/70558 ,  G03F7/7085 ,  G21K1/10 ,  H01S3/005 ,  H01S3/0085 ,  H01S3/0903 ,  H05H7/04

Abstract: A method of patterning lithographic substrates, the method comprising using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.

公开(公告)号：US20240411233A1

公开(公告)日：2024-12-12

申请号：US18699358

申请日：2022-10-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Gosse Charles DE VRIES ,  Sjoerd Nicolaas Lambertus DONDERS ,  Franciscus Johannes Joseph JANSSEN ,  Evgenia KURGANOVA ,  Abraham Jan WOLF ,  Ties Jan Willem BAKKER ,  Volker Dirk HILDENBRAND ,  Paul Alexander VERMEULEN ,  Michael ENGEL ,  Bernardus Antonius Johannes LUTTIKHUIS ,  Ronald VAN DER HAM ,  Jeroen Peterus Johannes VAN LIPZIG

IPC: G03F7/00 ,  G03F1/62

Abstract: A lithographic apparatus includes: an illumination system configured to condition a radiation beam; a support structure constructed to support a reticle and pellicle assembly for receipt of the radiation beam conditioned by the illumination system; a substrate table constructed to support a substrate; a projection system configured to receive the radiation beam from the reticle-pellicle assembly and to project it onto the substrate; and a heating system configured to heat a pellicle of the reticle-pellicle assembly supported by the support structure. A method for using a reticle-pellicle assembly including: illuminating the reticle-pellicle assembly with a radiation beam so as to form a patterned image on a substrate; and heating the pellicle of the reticle-pellicle assembly using a separate heat source.

公开(公告)号：US20230290665A1

公开(公告)日：2023-09-14

申请号：US18024042

申请日：2021-08-10

Applicant: ASML NETHERLANDS B.V.

Inventor： Gosse Charles DE VRIES ,  Dennis Dominic VAN DER VOORT

IPC: H01L21/683 ,  H01L21/687

CPC classification number: H01L21/6835 ,  H01L21/68757

Abstract: A base plate configured to be attached to a semiconductor substrate, wherein the base plate is configured to remain attached to the semiconductor substrate during a sequence of processing steps performed on the semiconductor substrate, and the base plate is made from a material having a Young's modulus larger than 300 GPa.

公开(公告)号：US20160301180A1

公开(公告)日：2016-10-13

申请号：US15035674

申请日：2014-11-27

Applicant: ASML NETHERLANDS B.V.

Inventor： Andrey Alexandrovich NIKIPELOV ,  Vadim Yevgenyevich BANINE ,  Pieter Willem Herman DE JAGER ,  Gosse Charles DE VRIES ,  Olav Waldemar Vladimir FRIJNS ,  Leonardus Adrianus Gerardus GRIMMINCK ,  Andelko KATALENIC ,  Johannes Antonius Gerardus AKKERMANS ,  Erik LOOPSTRA ,  Wouter Joep ENGELEN ,  Petrus Rutgerus BARTRAIJ ,  Teis Johan COENEN ,  Wilhelmus Patrick Elisabeth Maria OP 'T ROOT

IPC: H01S3/09 ,  H05H7/08 ,  H01J1/34

CPC classification number: H01S3/0903 ,  H01J1/34 ,  H05H7/08 ,  H05H2007/084

Abstract: An injector arrangement for providing an electron beam. The injector arrangement comprises a first injector for providing electron bunches, and a second injector for providing electrons bunches. The injector arrangement is operable in a first mode in which the electron beam comprises electron bunches provided by the first injector only and a second mode in which the electron beam comprises electron bunches provided by the second injector only.

Abstract translation: 一种用于提供电子束的喷射装置。 喷射器装置包括用于提供电子束的第一喷射器和用于提供电子束的第二喷射器。 喷射器装置可以在第一模式中操作，其中电子束包括仅由第一注射器提供的电子束和第二模式，其中电子束包括仅由第二注射器提供的电子束。